Method for the production of semiconductor lasers
Abstract
Abstract A method for the production of semiconductor lasers comprises: (a) forming a substrate (10) having a striped portion (20) on its face, said striped portion being formed into a mesa (11), (b) forming a current blocking layer on each of said striped portion (21) and the remaining face of said substrate (2), (c) eliminating said current blocking layer (21) only on said striped portion (20) together with the latter thereby allowing electric current to flow through the substrate and form said striped portion into a terrace (110) or a groove, as a whole, and (d) successively laminating crystal growth layers (3, 4, 5 and 6) for laser operation on the whole face of the substrate in strict conformity with said terrace or groove on the face of said substrate, thereby attaining stabilization of the transverse mode of laser oscillation.
Inventors
- 👤 Toshiro Hayakawa
- 👤 Nobuyuki Miyauchi
- 👤 Seiki Yano
- 👤 Takahiro Suyama
Bibliographic Details
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