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Method and device for the production of a uniform plasma having a large volume, a high density and a low electron temperature

Assignee: Centre National de la Recherche Scientifique
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Filing: 1984-06-14
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Granted: —
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Expires: 2004-06-14
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Abstract

Abstract Translated from French Production de plasmas. Le procédé selon l'invention est caractérisé en ce qu'on: procède, par ondes hyperfréquences, à l'excitation d'un milieu gazeux dans une enceinte, maintient ce plasma dans l'enceinte au moins par confinement magnétique multipolaire, met en oeuvre des moyens propres à entretenir dans l'enceinte une pression absolue comprise entre 10<-><5> et 10<->¹ Torrs. Application à la microélectronique. Plasma production. The method according to the invention is characterized in that: proceeds, by microwave waves, to excite a gaseous medium in an enclosure, maintains this plasma in the enclosure at least by multipolar magnetic confinement, implements means suitable for maintaining in the enclosure an absolute pressure of between 10 <-> <5> and 10 <-> ¹ Torrs. Application to microelectronics.

Inventors

  • 👤 Yves Arnal
  • 👤 Jacques Pelletier
  • 👤 Claude Pomot

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-10-29 17:25
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32192; C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/511; C23C8/00; C23C8/06; C23C8/36; H01J37/32431; H01J37/32623; H01J37/3266; H01J37/32688; H01J37/32697; H05; H05H; H05H1/00; H05H1/02; H05H1/10; H05H1/11; Y; Y02; Y02E; Y02E30/00; Y02E30/10

Claims Analysis

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References Cited (Backward Citations)

US3643123A Cited
GB2069230A Cited
GB2076587A Cited
FR2512623A1 Cited

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