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EP0110258A1 Expired / Lapsed EP ⏱️ 0.0 years remaining

A method for the preparation of a polyvinyl chloride resin shaped article with metallized surface

Assignee: Shin-Etsu Chemical Co Ltd
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Filing: 1983-11-17
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Granted: —
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Expires: 2003-11-17
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Abstract

Abstract The surface of the shaped article is first exposed to low temperature plasma generated in an atmosphere containing a vapor of a specified organosilicon compound before the metallizing treatment in a dry process such as vacuum vapor deposition, ion plating and the like.

Inventors

  • 👤 Susumu Shin-Etsu Kagaku Kougyou Ueno
  • 👤 Hirokazu C/O Renshi-Ryo 50-3 Nomura

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-01 18:17
CPC Classifications
C; C08; C08J; C08J7/00; C08J7/12; C08J7/123; C23; C23C; C23C14/00; C23C14/02; C23C14/021; C23C14/022; C08J2327/00; C08J2327/02; C08J2327/04; C08J2327/06

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 101 words
A method for the preparation of a shaped article of a flexible or semi-rigid polyvinyl chloride resin with a metallized surface which comprises the steps of: (a) subjecting the surface of a shaped article of a flexible or semi-rigid polyvinyl chloride resin to exposure to low temperature plasma generated in an atmosphere containing a vapor of an organosilicon compound under a pressure in the range from 0.001 to 10 Torr to deposit a polymerized layer of the organosilicon compound on the surface; and (b) metallizing the surface of the shaped article thus coated with the polymerized layer of the organosilicon compound.
Claim 2
Independent Claim 101 words
A method for the preparation of a shaped article of a flexible or semi-rigid polyvinyl chloride resin with a metallized surface which comprises the steps of: (a) subjecting the surface of a shaped article of a flexible or semi-rigid polyvinyl chloride resin to exposure to low temperature plasma generated in an atmosphere containing a vapor of an organosilicon compound under a pressure in the range from 0.001 to 10 Torr to deposit a polymerized layer of the organosilicon compound on the surface; and (b) metallizing the surface of the shaped article thus coated with the polymerized layer of the organosilicon compound.
Claim 3
Dependent Claim 84 words
The method as claimed in claim 1 wherein the organosilicon compound is an organosilane represented by the general formula R a H b SiX 4-a-b , in which R is a substituted or unsubstituted monovalent hydrocarbon group, X is a halogen atom or an alkoxy group, the suffix a is a number of zero, 1, 2 or 3 and the suffix b is a number of zero or 1 with the proviso that a+b does not exceed 3, or a partial hydrolysis-condensation product thereof.
Claim 4
Dependent Claim 30 words
The method as claimed in claim 1 wherein the step (a) is preceded by a low temperature plasma treatment of the shaped article in an atmosphere of an inorganic gas.
Claim 5
Dependent Claim 41 words
The method as claimed in claim 3 wherein the inorganic gas is selected from the class consisting of helium, neon, argon, nitrogen, oxygen, air, nitrous oxide, nitrogen monoxide, nitric oxide, carbon monoxide, carbon dioxide, bromine cyanide, sulfur dioxide and hydrogen sulfide.
Claim 6
Dependent Claim 23 words
The method as claimed in claim 1 wherein the polymerized layer of the organosilicon compound has a thickness of at least 5 nm.
Claim 7
Dependent Claim 16 words
The method as claimed in claim 1 wherein the metallizing is performed in a dry process.

References Cited (Backward Citations)

US2993806A Cited
GB1310464A Cited
US4247600A Cited
EP0057835A1 Cited

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