Patent US824315A successfully refreshed from Google Patents.
Patent EP0108189A2 successfully refreshed from Google Patents.
EP0108189A2
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EP
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A method for etching polyimides
Assignee: International Business Machines Corp
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Filing: 1983-06-10
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Granted: —
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Expires: 2003-06-10
Abstract
Abstract A method is described for photoetching poyimides efficiently, and without the need for any chemical development steps. At least 1000 ANGSTROM of the polyimide are removed by irradiation of the polyimide with ultraviolet radiation having wavelengths less than 220 nm. To enhance the process, the power density of the radiation is greater than about 60 mJ/cm<2>. The presence of an atmosphere containing oxygen enhances the etch rate, although photoetching will occur in other atmospheres.
Inventors
- 👤 Samuel Emil Blum
- 👤 Karen Lynne Holloway
- 👤 Rangaswamy Srinivasan
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 21:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
34 words
A method for etching polyimides characterised in that the method comprises photoetching said polyimide to a depth of at least 1000A by irradiating the polyimide with UV radiation having wavelenths less than 220 nm.
Claim 2
Independent Claim
34 words
A method for etching polyimides characterised in that the method comprises photoetching said polyimide to a depth of at least 1000A by irradiating the polyimide with UV radiation having wavelenths less than 220 nm.
Claim 3
Dependent Claim
20 words
A method as claimed in claim 1, in which said radiation is directed through a mask before striking the polyimide.
Claim 4
Independent Claim
20 words
A method as claimed in claims 1 or 2, in which said polyimide is a layer located on a substrate.
Claim 5
Independent Claim
27 words
A method of as claimed in any one of claims 1 to 3, in which said photoetching occurs until said polyimide is etched completely to said substrate.
Claim 6
Independent Claim
21 words
A method as claimed in any one of the preceding claims, in which said photoetching occurs in an atmosphere including oxygen.
Claim 7
Independent Claim
33 words
A method as claimed in any one of the preceding claims, in which said UV radiation is produced by a laser providing output UV radiation having intensities greater than 60 mJ/cm 2 .
Claim 8
Dependent Claim
23 words
A method as claimed in claim 6, in which said laser is an argon fluoride laser producing an output at 193 nm wavelength.
Claim 9
Dependent Claim
17 words
A method as claimed in claim 6 or 7, in which said radiation is applied as pulses.
Claim 10
Dependent Claim
16 words
A method as claimed in claim 6 or 7, in which said radiation is applied continuously.
Claim 11
Independent Claim
25 words
A method as claimed in any one of claims 1 to 5, in which said UV radiation is produced by a low pressure mercury lamp.
References Cited (Backward Citations)
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