Patent EP0102450B1 successfully refreshed from Google Patents.
EP0102450B1
Expired / Lapsed
EP
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Resist compositions
Assignee: International Business Machines Corp
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Filing: 1983-05-02
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Granted: 1991-09-04
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Expires: 2003-05-02
Abstract
No abstract record available.
Inventors
- 👤 Hiroshi Ito
- 👤 Carlton Grant Willson
- 👤 Jean M. J. Frechet
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-27 23:46
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/016; G03F7/021; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/109; Y10S430/111; Y10S430/114; Y10S430/115
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
50 words
A positive working and negative working resist composition comprising: a a polymer having recurrent acid labile pendant groups and a photoinitiator which generates an acid upon exposure to radiation characterised in that the acid labile pendant groups are tertiary butyl esters of carboxylic acids or tertiary butyl carbonates of phenols.
Claim 2
Dependent Claim
29 words
A resist composition according to Claim 1 wherein the photoinitiator is taken from the group consisting of aryldiazonium salts, unsubstituted and symmetrically or unsymmetrically substituted diaryliodonium or triarylsulfonium salts.
Claim 3
Dependent Claim
30 words
A resist composition as claimed in claim 2, wherein the photoinitiator is selected from the group consisting of unsubstituted diaryliodonium salts, symmetrically substituted diaryliodonium salts, or unsymmetrically substituted diaryliodonium salts.
Claim 4
Dependent Claim
30 words
A resist composition as claimed in claim 2, wherein the photoinitiator is selected from the group consisting of unsubstituted triarylsulfonium salts, symmetrically substituted triarylsulfonium salts, or unsymmetrically substituted triarylsulfonium salts.
Claim 5
Dependent Claim
27 words
A resist composition as claimed in any one of claims 1 to 4 which also contains a sensitizer that absorbs radiation and transfers energy to the photoinitiator.
Claim 6
Dependent Claim
25 words
A resist composition as claimed in any one of claims 1 to 4 wherein the acid labile pendant groups are tert-butyl esters of carboxylic acids.
Claim 7
Dependent Claim
23 words
A resist composition as claimed in any one of claims 1 to 4 wherein the acid labile pendant groups are tert-butylcarbonates of phenols.
Claim 8
Dependent Claim
55 words
A resist composition as claimed in claim 1 wherein the polymer is a poly (tert-butyloxycarbonyloxy-α-alkylstyrene) or a copolymer thereof, a poly (p-tert-butyloxycarbonyloxy-α-methylstyrene) or a copolymer thereof, a poly (tert-butyloxycarbonyloxystyrene) or copolymer thereof, a poly (p-tert-butyloxycarbonyloxy-styrene) or a copolymer thereof, a poly (tert-butyl vinylbenzoate) or a copolymer thereof, or a poly (tert-butylmethacrylate) or a copolymer thereof.
Claim 9
Dependent Claim
21 words
A resist composition as claimed in claim 5 wherein the sensitizer is a dye, a polycyclic aromatic compound, pyrene or perylene.
References Cited (Backward Citations)
No citation records indexed.
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