Developer compositions for photoresists

Claim 1

An aqueous metal ion containing developer composition comprising one or more metal ion alkali compounds and one or more quaternary surfactant compounds having the formula: wherein R comprises a saturated or unsaturated, straight or branched hydrocarbon chain having from 6 to 20 carbons and from 0 to 3 oxygens, provided that each oxygen is separated from another by at least one carbon atom and optionally, said chain being substituted with one or more alkoxy groups wherein each alkoxy group has from 1 to 5 carbons; R 2 and R 3 are the same or different and each comprises alkyl of from 1 to 3 carbons or (R 0) H, wherein R 5 is alkylene of from 1 to 3 carbons and n is an integer of from 1 to 20; or R 2 and R 3 together comprise cycloaliphatic hydrocarbon of from 2 to 8 carbons with from 0 to 2 heteroatoms selected from 0, N and S, provided that each heteroatom is separated from another and from the quaternary nitrogen by at least one carbon; or R 2 and R 3 together comprise a cycloaromatic hydrocarbon of from 2 to 8 carbons with from 0 to 2 nitrogen heteroatoms, provided that each nitrogen atom is separated from another and from the quaternary nitrogen by at least one carbon: R4 comprises a saturated or unsaturated, straight or branched chain hydrocarbon having from 1 to 10 carbon atoms, (R 5 O) n H as defined above; phenalkyl, wherein the alkyl moiety has from 0 to 3 carbons; or wherein m is an integer of from 1 to 4, R 2 and R 3 are as defined above, and R 6 is a saturated or unsaturated, straight or branched chain hydrocarbon having from 1 to 10 carbon atoms, or (R 5 O) n H as defined above, or phenalkyl, having an alkyl group of from 0 to 3 carbon atoms; and X comprises halo, hydroxy, or silicate, or the corresponding amino oxide of said quaternary ammonium compound; said alkali compound and surfactant being present in an amount sufficient to provide effective development of an imaged photoresist.