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EP0090669A2 Expired / Lapsed EP ⏱️ 0.0 years remaining

Electromagnetic radiation detector

Assignee: Honeywell Inc
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Filing: 1983-03-31
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Granted: —
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Expires: 2003-03-31
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Abstract

Abstract The electromagnetic radiation sensitive detector comprises a substrate (10), a first layer (12) on the substrate of radiation sensitive semiconductor material of a given conductivity type and having a first energy bandgap, at least one ohmic contact (16) providing electrical communication with the first layer, and a second layer (14) of semiconductor material of the same conductivity type as the first layer but having an energy bandgap greater than that of the first layer, the second layer being located on the first layer (12) beneath the or each contact (16) to which minority carriers are attracted from the first layer to enhance the responsivity of the detector.

Inventors

  • 👤 David K. Arch
  • 👤 Walter M. Dr. Scott
  • 👤 Darryl Lyle Smith
  • 👤 Leonard R. Weisberg
  • 👤 Roland A. Wood

Bibliographic Details

Application Number —
Jurisdiction EP
Data Source google_patents
Last Synchronized 2026-11-05 22:32
CPC Classifications
H; H10; H10F; H10F77/00; H10F77/10; H10F77/12; H10F77/124; H10F77/1248; H10D; H10D64/00; H10D64/01; H10D64/011; H10F30/00; H10F30/10; H10F30/20; H10F30/21; H10F30/22; H10F30/222; H10F77/123; H10F77/1237

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 99 words
A semiconductor device comprising a substrate; a first layer on said substrate of electromagnetic radiation sensitive semiconductor material of a given conductivity type and having a first energy bandgap; and at least one ohmic contact for providing electrical communication with said first layer; characterized by a second layer (14) of semiconductor material of the same conductivity type as said first layer but having a second energy bandgap greater than said first energy bandgap,said second layer being located on said first layer (12) beneath the or each ohmic contact (16) to which minority carriers are attracted from said first layer.
Claim 2
Dependent Claim 99 words
A semiconductor device comprising a substrate; a first layer on said substrate of electromagnetic radiation sensitive semiconductor material of a given conductivity type and having a first energy bandgap; and at least one ohmic contact for providing electrical communication with said first layer; characterized by a second layer (14) of semiconductor material of the same conductivity type as said first layer but having a second energy bandgap greater than said first energy bandgap,said second layer being located on said first layer (12) beneath the or each ohmic contact (16) to which minority carriers are attracted from said first layer.
Claim 3
Dependent Claim 57 words
The semiconductor device according to Claim 1, characterized in that said first layer (12) of semiconductor material is Hg 1-x Cd x Te, x being a number between 0.1, and 0.4; and in that said second layer of semiconductor material is Hg 1-y Cd y Te, y being a number greater than x but less than unity.
Claim 4
Dependent Claim 17 words
The semiconductor device according to Claim 2, characterized in that y exceeds x by at least 0.01.
Claim 5
Dependent Claim 21 words
The semiconductor device according to any of Claims 1, 2 or 3, characterized in that said semiconductor material is of n-type.
Claim 6
Dependent Claim 30 words
The semiconductor device of Claim 1, characterized in that said semiconductor material is In.Sb, InAs x Sb 1-x , In x Ga 1-x Sb or Pb 1-x Sn x Te.
Claim 7
Dependent Claim 50 words
A semiconductor device according to Claim 2 or 3, characterized in that said layer of Hg 1-x Cd x Te has a thickness from 5x10 cm to 15-10 cm and said layer of Hg 1-y Cd y Te has a thickness from 10 -4 cm to 10 -3 cm .
Claim 8
Dependent Claim 20 words
The semiconductor device according to any of the preceding Claims, characterized in that the ohmic contact material is of indium.
Claim 9
Dependent Claim 22 words
The semiconductor device according to any one of the preceding Claims, characterized in that the semiconductor material is produced by epitaxial formation.

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