Patent EP0083078A2 successfully refreshed from Google Patents.
EP0083078A2
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EP
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Photosensitive resin composition and method for forming fine patterns with said composition
Assignee: Hitachi Ltd
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Filing: 1982-12-23
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Granted: —
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Expires: 2002-12-23
Abstract
Abstract Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after developement and a method for forming fine patterns with said composition. Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (I): wherein X is -N 3 or -SO 2 N 3 , Y is R 1 is a lower alkylene such as -CH 2 CH 2 -. -CH 2 CH 2 CH 2 -, or -CH 2 CH 2 OCH 2 CH 2 CH 2 -, a hydroxyalkylene or an aminoalkylene such as and Z is -R 2 , -OR 3 , (wherein R 4 and R 5 are lower alkyl or hydrogen, R 2 and R 6- R 8 are lower alkyl groups, R 3 is hydrogen, a lower alkyl group or (̵CH 2 CH 2 O)̵ n R 9 wherein n is an integer of 3 or less and R 9 is hydrogen or a lower alkyl group).
Inventors
- 👤 Fumio Kataoka
- 👤 Fusaji Shoji
- 👤 Hitoshi Yokono
- 👤 Daisuke Makino
- 👤 Shigeru Koibuchi
- 👤 Asao Isobe
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-06 13:55
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/72; G03F; G03F7/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/128
Claims Analysis
Total Claims: 24
Claim 1
Independent Claim
131 words
A photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): wherein X is -N 3 or -SO 2 N 3 , Y is -NH-, -0-, R 1 is a lower alkylene, a hydroxyalkylene or an aminoalkylene and Z is -R - , -OR - , R 2 and (wherein/R 6 /-R 8 are lower alkyl groups, R 4 and R 5 are lower alkyl or hydrogen, R 3 is hydrogen, a lower alkyl group or (̵ CH 2 CH 2 O )̵ n R 9 wherein n is an integer of 3 or less and R 9 is hydrogen or a lower alkyl group) .
Claim 2
Dependent Claim
131 words
A photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): wherein X is -N 3 or -SO 2 N 3 , Y is -NH-, -0-, R 1 is a lower alkylene, a hydroxyalkylene or an aminoalkylene and Z is -R - , -OR - , R 2 and (wherein/R 6 /-R 8 are lower alkyl groups, R 4 and R 5 are lower alkyl or hydrogen, R 3 is hydrogen, a lower alkyl group or (̵ CH 2 CH 2 O )̵ n R 9 wherein n is an integer of 3 or less and R 9 is hydrogen or a lower alkyl group) .
Claim 3
Dependent Claim
129 words
A photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): wherein X is -N 3 or -SO 2 N 3 , Y is R 1 is a lower alkylene, a hydroxy- xyalkylene or an aminoalkylene and Z is -R 2 , - OR 3 , Rand (wherein/R 6 -R 8 are lower alkyl groups, R 4 and R 5 are lower alkyl or hydrogen, R 3 is hydrogen, a lower alkyl group or (̵ CH 2 CH 2 0 )̵ n R 9 wherein n is an integer of 3 or less and R 9 is hydrogen or a lower alkyl group) .
Claim 4
Dependent Claim
129 words
A photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): wherein X is -N 3 or -SO 2 N 3 , Y is R 1 is a lower alkylene, a hydroxy- xyalkylene or an aminoalkylene and Z is -R 2 , - OR 3 , Rand (wherein/R 6 -R 8 are lower alkyl groups, R 4 and R 5 are lower alkyl or hydrogen, R 3 is hydrogen, a lower alkyl group or (̵ CH 2 CH 2 0 )̵ n R 9 wherein n is an integer of 3 or less and R 9 is hydrogen or a lower alkyl group) .
Claim 5
Dependent Claim
92 words
A liquid photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): [wherein X is -N 3 , Y is R 1 is -CH 2 CH 2 -, -CH2CH2CH2-, -CH 2 CH 2 OCH 2 CH 2 CH 2 - or and Z is -OH, -NH 2 , -N(CH 3 ) 2 , -N(C 2 H 5 ) 2 or -N(C 3 H 7 ) 2 .
Claim 6
Dependent Claim
92 words
A liquid photosensitive resin composition which comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): [wherein X is -N 3 , Y is R 1 is -CH 2 CH 2 -, -CH2CH2CH2-, -CH 2 CH 2 OCH 2 CH 2 CH 2 - or and Z is -OH, -NH 2 , -N(CH 3 ) 2 , -N(C 2 H 5 ) 2 or -N(C 3 H 7 ) 2 .
Claim 7
Dependent Claim
14 words
A photosensitive resin composition according to claim 1, to which a solvent is added.
Claim 8
Dependent Claim
14 words
A photosensitive resin composition according to claim 2, to which a solvent is added.
Claim 9
Dependent Claim
14 words
A photosensitive resin composition according to claim 3, to which a solvent is added.
Claim 10
Dependent Claim
57 words
A photosensitive resin composition according to claim 1 wherein the compound represented by the general formula (1) is at least one selected from 2-(N,N-dimethylamino)ethyl para-azidobenzoate, 2-(N,N-dimethylamino)ethyl meta-azidobenzoate, 3-(N,N-dimethylamino)propyl para-azidobenzoate, 3-(N,N-dimethylamino)propyl meta-azidobenzoate, 2-hydroxyethyl para-azidobenzoate, 2-hydroxyethyl meta-azidobenzoate, N,N-dimethyl-N'-para-azido- benzoylethylenediamine, N,N-dimethyl-N'-meta-azido- benzoylethylene diamine, N,N-dimethyl-N'-para;azidobenzoyl- propylenediamine, N,N-dimethyl-N'-meta-azidobenzoylpropylene- diamine, para-azidophenyl 2-(N,N-dimethylamino)ethyl ketone, meta-azidophenyla-(N,N-dimethylamino)ethyl ketone, 2-(N,N-dimethylamino)ethyl para-sulfonylazidobenzoate and 2-(N, N - dimethylamino)ethyl meta-sulfonylazidobenzoate.
Claim 11
Dependent Claim
47 words
A photosensitive resin composition according to claim 2 wherein the compound represented by the general formula (1) is at least one selected from 2-(N,N-dimethylamino)ethyl para-azidobenzoate, 2-(N,N-dimethylamino)-ethyl meta-azidobenzoate, 3-(N,N-dimethylamino)propyl meta-azidobenzoate, 2-hydroxyethyl para-azidobenzoate, 2-hydroxyethyl meta-azidobenzoate, N,N-dimethyl-N'-para- azidobenzoylethylenediamine, N,N-dimethyl-N'-meta- azidobenzoylethylenediamine, N,N-dimethyl-N'-para- azidobenzoylpropylenediamine, N,N-dimethyl-N'-meta- azidobenzoylpropylenediamine, para-azidophenyl 2-(N,N-dimethylaminoyethyl para-sulfonylazidobenzoate and 2-(N,N-dimethylamino)ethyl meta-sulfonylazidobenzoate.
Claim 12
Dependent Claim
52 words
A photosensitive resin composition according to claim 3 wherein the compound represented by the general formula (1) is at least one selected from 2-(N,N-dimethylamino)ethyl para-azidobenzoate, 2-(N,N-dimethylamino)ethyl meta-azidobenzoate, 3-(N,N-dimethylamino)propyl para-azidobenzoate, 3-(N,N-dimethylamino)-propyl meta-azidobenzoate, 2-hydroxyethyl para-azidobenzoate, 2-hydroxyethyl para-azidobenzoate, 2-hydroxyethyl meta-azidobenzoate, N,N-dimethyl-N'-para- azidobenzoylethylenediamine, N,N-dimethyl-N'-meta- azidobenzoylethylenediamine, N,N-dimethyl-N'-para- azidobenzoylpropylenediamine, N,N-dimethyl-N'-meta- azidobenzoylpropylenediamine, para-azidophenyl 2-(N,N-dimethylamino)ethyl ketone and meta-azidophenyl 2-(N,N-dimethylamino)echyl ketone.
Claim 13
Dependent Claim
35 words
A photoresistive resin composition according to claim 4 wherein the solvent is at least one compound selected from acetone, methyl ethyl ketone, cyclohexanone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, ethyl acetate and butyl acetate.
Claim 14
Dependent Claim
35 words
A photosensitive resin composition according to claim 5 wherein the solvent is at least one cmpound selected from acetone, methyl ethyl ketone, cyclohexanone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, ethyl acetate and butyl acetate.
Claim 15
Dependent Claim
35 words
A photosensitive resin composition according to claim 6 wherein the solvent is at least one compound selected from acetone, methyl ethyl ketone, cyclohexanone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, ethyl acetate and butyl acetate.
Claim 16
Dependent Claim
36 words
A photosensitive resin composition according to claim 1 wherein amount of the azide compound represented by the general formula (1) is 0.5 to 150 parts by weight per 100 parts by weight of the polymer compound.
Claim 17
Dependent Claim
36 words
A photosensitive resin composition according to claim 2 wherein amount of the azide compound represented by the general formula (1) is 0.5 to 150 parts by weight per 100 parts by weight of the polymer compound.
Claim 18
Dependent Claim
36 words
A photosensitive resin composition according to claim 3 wherein amount of the azide compound represented by the general formula (1) is 0.5 to 150 parts by weight per 10,0 parts by weight of the polymer compound.
Claim 19
Dependent Claim
48 words
A photosensitive resin composition according to claim 4 wherein amount of the azide compound represented by the general formula (1) is 0.5 to l50 parts by weight and that of the solvent is 100 to 10000 parts by weight per 100 parts by weight of the polymer compound.
Claim 20
Dependent Claim
48 words
A photosensitive resin composition according to claim 5 wherein amount of the azide compound represented by the general formula (1) is 0.5 to 150 parts by weight and that of the solvent is 100 to 10000 parts by weight per 100 parts by weight of the polymer compound.
Claim 21
Dependent Claim
48 words
A photosensitive resin composition according to claim 6 wherein amount of the azide compound represented by the general formula (1) is 0.5 to 150 parts by weight and that of the solvent is 100 to 10000 parts _by weight per 100 parts by weight of the polymer compound.
Claim 22
Dependent Claim
49 words
A method for forming fine patterns which comprises coating on a substrate the photosensitive resin composition according to claim 4, drying the coated composition to form a coating film, exposing locally this film and developing the film with an alkaline aqueous solution to dissolve and remove the unexposed portions.
Claim 23
Dependent Claim
49 words
A method for forming fine patterns which comprises coating on a substrate the photosensitive resin composition according to claim 5, drying the coated composition to form a coating film, exposing locally this film and developing the film with an alkaline aqueous solution to dissolve and remove the unexposed portions.
Claim 24
Dependent Claim
49 words
A method for forming fine patterns which comprises coating on a substrate the photosensitive resin composition according to claim 6, drying the coated composition to form a coating film, exposing locally this film and developing the film with an alkaline aqueous solution to dissolve and remove the unexposed portions.
References Cited (Backward Citations)
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