Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
58 words
A method of reactive sputtering, characterized by the steps: to activate reactive gas in advance and to introduce the same into a reaction chamber, to form a desired film on the surface of a substrate material to be treated through the reaction of the particles ejected from a target material and said reactive gas in said reactive chamber.
Claim 2
Independent Claim
58 words
A method of reactive sputtering, characterized by the steps: to activate reactive gas in advance and to introduce the same into a reaction chamber, to form a desired film on the surface of a substrate material to be treated through the reaction of the particles ejected from a target material and said reactive gas in said reactive chamber.
Claim 3
Dependent Claim
19 words
A method of claim 1, characterized in.that said reactive gas is nitrogen gas and said target material is silicon.
Claim 4
Dependent Claim
54 words
A method of claim 1, characterized in that said that said reactive gas is selected from a group of oxygen (0 2 ), nitric monoxide (NO), nitrous oxide (N 2 0) or mixture of some of these, and said target material is selected from a group of aluminum (Al), titanium (Ti) and tantalum (Ta).
Claim 5
Independent Claim
86 words
An apparatus for carrying out processes of reactive sputtering which comprises: a reaction chamber (1) in which electrodes (3,6) are provided (oppositely), with a material (4) to be treated being placed on one electrode (3) and a target material (7) on the other electrode (6), a vacuum pump system (2), a high frequency power source (11), an inlet (13) for inert gas, and an inlet (14) for a reactive gas, characterized in that a plasmagenerator (15) is connected to the inlet (14) for the reactive gas.
Claim 6
Independent Claim
86 words
An apparatus for carrying out processes of reactive sputtering which comprises: a reaction chamber (1) in which electrodes (3,6) are provided (oppositely), with a material (4) to be treated being placed on one electrode (3) and a target material (7) on the other electrode (6), a vacuum pump system (2), a high frequency power source (11), an inlet (13) for inert gas, and an inlet (14) for a reactive gas, characterized in that a plasmagenerator (15) is connected to the inlet (14) for the reactive gas.
Claim 7
Dependent Claim
22 words
An apparatus of claim 4, characterized in that said electrode (6) on which said target material (7) is placed comprises a magnetron.
Claim 8
Dependent Claim
18 words
An apparatus of claim 4 which is characterized in that said plasmagenerator (15) comprises a microwave oscillator (18).