Patent EP0030107A1 successfully refreshed from Google Patents.
EP0030107A1
Expired / Lapsed
EP
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Process for forming resist pattern
Assignee: Fujitsu Ltd
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Filing: 1980-11-20
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Granted: —
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Expires: 2000-11-20
Abstract
Abstract Negative resist patterns of a high definition are produced by coating on the substrate a negative-working resist material comprising a phenol-formaldehyde novolak resin and a compound containing at least one azido radical, exposing the coated resist material to a desired pattern of electron beams, and developing the exposed resist material.
Inventors
- 👤 Kazuo Toda
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-31 09:32
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; G03F7/012; G03F7/0125
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
58 words
A process for the formation of a negative resist pattern on a substrate which comprises the steps of: coating on the substrate a negative-working resist material comprising a phenol-formaldehyde novolak resin and a compound containing at least one azido radical; exposing the coated resist material to a desired pattern of electron beams; and, developing the exposed resist material.
Claim 2
Dependent Claim
58 words
A process for the formation of a negative resist pattern on a substrate which comprises the steps of: coating on the substrate a negative-working resist material comprising a phenol-formaldehyde novolak resin and a compound containing at least one azido radical; exposing the coated resist material to a desired pattern of electron beams; and, developing the exposed resist material.
Claim 3
Dependent Claim
27 words
A process according to claim 1, wherein the said exposed resist material is heated at a temperature of from 60 to 100°C for 10 to 60 minutes.
Claim 4
Dependent Claim
39 words
A process according to claim 1, wherein the resist material is comprised of 50 to 99 parts by weight of the novolak resin and 50 to 1 parts by weight of a compound containing at least one azido radical.
Claim 5
Dependent Claim
34 words
A process according to claim 1,- wherein the phenol-formaldehyde novolak resin is selected from those of the formula: wherein R represents a hydrogen atom or an alkyl radical having 1 to 5 carbon atoms.
Claim 6
Dependent Claim
29 words
A process according to claim 1, wherein the compound containing at least one azido radical is selected from the group consisting of 4,4'-diazidochalcone, 2,6--bis(4'-azidobenzal)-cyclohexanone, 2,6-bis(4'-azidobenzal)--4-methylcyclohexanone, 2,6-bis(4'-azidobenzal)-acetone, azidopyrene, and p-azidobenzalacetophenone.
References Cited (Backward Citations)
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