Exposure apparatus, exposure method, and device production method

Abstract

Abstract An exposure apparatus has a liquid feeding device for feeding liquid with which a light path space (K1) for exposure light is filled; a first land surface (75) facing a surface of a substrate that is placed at an exposure position and surrounding the light path space (K1) for exposure light; and a second land surface (76) provided outside the first land surface (75). The first land surface (75) can hold the liquid between itself and the surface of the substrate. The second land surface (76) is provided so as not to be in contact with a film of the liquid that is present between itself and the surface of the substrate. When the substrate is exposed while being moved, the light path space for exposure light can be filled with the liquid to a desired state.

Inventors

• 👤 Hiroyuki Nagasaka

Bibliographic Details