Patent US1129755A successfully refreshed from Google Patents.
Patent US3810707A successfully refreshed from Google Patents.
US6811945B2
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing pattern-formed structure and photomask used in the same
Assignee: Dai Nippon Printing Co Ltd
•
Filing: 2003-03-13
•
Granted: 2004-11-02
•
Expires: 2023-03-13
Abstract
Abstract A method of producing a pattern-formed structure, comprising: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer whose characteristic at a surface thereof can be modified by the action of photocatalyst; preparing a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing photocatalyst, arranging the substrate for a pattern-formed structure and the photocatalyst-containing-Iayer side substrate such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a clearance of no larger than 200 mum therebetween; and irradiating energy to the characteristic-modifiable layer from a predetermined direction, and modifying characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer.
Inventors
- 👤 Hironori Kobayashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 13:42
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/38; G03F7/00; G03F7/0005; G03F7/0007; B; B82; B82Y; B82Y30/00; G03F1/62; G03F7/001; G03F7/004; G03F7/09; G03F7/11; G03F7/20; G03F7/2002; G03F7/2014; Y; Y10; Y10S; Y10S430/00; Y10S430/148
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
134 words
A method of producing a functional element, comprising: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer with at least one characteristic at a surface thereof that can be modified by the action of a photocatalyst; arranging the substrate for the pattern-formed structure and a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing the photocatalyst, such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a gap of no larger than 200 μm therebetween; irradiating energy to the characteristic-modifiable layer by way of the photocatalyst-containing layer from a predetermined direction, and modifying the at least one characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer; and providing a functional portion of the pattern at the characteristic-modifiable layer.
Claim 2
Independent Claim
134 words
A method of producing a functional element, comprising: preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer with at least one characteristic at a surface thereof that can be modified by the action of a photocatalyst; arranging the substrate for the pattern-formed structure and a photocatalyst-containing-layer side substrate having a photocatalyst-containing layer formed on a base material, the photocatalyst-containing layer containing the photocatalyst, such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a gap of no larger than 200 μm therebetween; irradiating energy to the characteristic-modifiable layer by way of the photocatalyst-containing layer from a predetermined direction, and modifying the at least one characteristic of a surface of the characteristic-modifiable layer, thereby forming a pattern at the characteristic-modifiable layer; and providing a functional portion of the pattern at the characteristic-modifiable layer.
Claim 3
Dependent Claim
20 words
A method of producing a functional element according to claim 1 , wherein the functional portion is made of metal.
Claim 4
Dependent Claim
28 words
A method of producing a color filter, comprising: providing a functional element according to the method of claim 1 , wherein the function portion is a pixel portion.
Claim 5
Independent Claim
181 words
A method of producing a pattern-formed structure, comprising: preparing a photocatalyst-containing-layer side substrate in which a photocatalyst-containing layer is formed on a photomask by way of a primer layer, the photomask being formed by providing a light-shielding portion, in a pattern-like configuration, on a transparent base material; preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer having at least one characteristic that can be modified by the action of a photocatalyst contained at least in the photocatalyst-containing layer; arranging the photocatalyst-containing-layer side substrate and the substrate for the pattern-formed structure such that photocatalyst-containing layer and the substrate for the pattern-formed structure are in contact; or such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a gap therebetween, the gap being narrow enough to allow the action of the photocatalyst to have an effect on the characteristic-modifiable layer; effecting irradiation of energy to the substrates, thereby modifying the at least one characteristic of the irradiated portion of the characteristic-modifiable layer; removing the photocatalyst-containing-layer side substrate, thereby obtaining a pattern-formed structure; and providing a functional portion on the pattern-formed structure.
Claim 6
Independent Claim
181 words
A method of producing a pattern-formed structure, comprising: preparing a photocatalyst-containing-layer side substrate in which a photocatalyst-containing layer is formed on a photomask by way of a primer layer, the photomask being formed by providing a light-shielding portion, in a pattern-like configuration, on a transparent base material; preparing a substrate for a pattern-formed structure having a characteristic-modifiable layer having at least one characteristic that can be modified by the action of a photocatalyst contained at least in the photocatalyst-containing layer; arranging the photocatalyst-containing-layer side substrate and the substrate for the pattern-formed structure such that photocatalyst-containing layer and the substrate for the pattern-formed structure are in contact; or such that the characteristic-modifiable layer faces the photocatalyst-containing layer with a gap therebetween, the gap being narrow enough to allow the action of the photocatalyst to have an effect on the characteristic-modifiable layer; effecting irradiation of energy to the substrates, thereby modifying the at least one characteristic of the irradiated portion of the characteristic-modifiable layer; removing the photocatalyst-containing-layer side substrate, thereby obtaining a pattern-formed structure; and providing a functional portion on the pattern-formed structure.
Claim 7
Dependent Claim
19 words
The method of producing a pattern-formed structure of claim 4 , wherein the functional portion is made of metal.
Claim 8
Dependent Claim
28 words
A method of producing a color filter comprising: providing a pattern-formed structure according to the method of claim 4 , wherein the function portion is a pixel portion.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2007-11-02 | 2008-05-03 | 2008-11-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2011-11-02 | 2012-05-03 | 2012-11-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2015-11-02 | 2016-05-03 | 2016-11-02 | $7700.00 | Window Closed / Lapsed |