Method and apparatus for irradiating a microlithographic substrate

Claim 1

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along a first axis generally parallel to the substrate radiation path segment while the microlithographic substrate simultaneously moves along a second axis generally perpendicular to the substrate radiation path segment.

Claim 2

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along a first axis generally parallel to the substrate radiation path segment while the microlithographic substrate simultaneously moves along a second axis generally perpendicular to the substrate radiation path segment.

Claim 21

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing a beam of the radiation along a radiation path in a first direction toward a reticle; passing the radiation through an aperture of the reticle and to the microlithographic substrate along the radiation path in a second direction, the beam having a beam width at least proximate to an intersection between the beam and the microlithographic substrate; focusing the radiation toward a focal plane; moving the reticle relative to the radiation path along a reticle path generally normal to the first direction; and moving the microlithographic substrate relative to the radiation path and the focal plane along a substrate path, the substrate path having a first component generally parallel to the second direction, the substrate path having a second component generally perpendicular to the second direction, the microlithographic substrate simultaneously moving parallel to and perpendicular to the second direction while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein moving the microlithographic substrate includes moving the microlithographic substrate for an integer number of periods during the time the microlithographic substrate moves transverse to the beam by a distance of approximately one beam width.

Claim 22

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing a beam of the radiation along a radiation path in a first direction toward a reticle; passing the radiation through an aperture of the reticle and to the microlithographic substrate along the radiation path in a second direction, the beam having a beam width at least proximate to an intersection between the beam and the microlithographic substrate; focusing the radiation toward a focal plane; moving the reticle relative to the radiation path along a reticle path generally normal to the first direction; and moving the microlithographic substrate relative to the radiation path and the focal plane along a substrate path, the substrate path having a first component generally parallel to the second direction, the substrate path having a second component generally perpendicular to the second direction, the microlithographic substrate simultaneously moving parallel to and perpendicular to the second direction while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein moving the microlithographic substrate includes moving the microlithographic substrate for an integer number of periods during the time the microlithographic substrate moves transverse to the beam by a distance of approximately one beam width.

Claim 33

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is coupled to at least one actuator to oscillate toward and away from the reticle along a first axis generally parallel to the second direction while moving along a second axis generally perpendicular to the second direction.

Claim 34

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is coupled to at least one actuator to oscillate toward and away from the reticle along a first axis generally parallel to the second direction while moving along a second axis generally perpendicular to the second direction.

Claim 49

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a source of radiation positioned to direct a beam of selected radiation along a radiation path; a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path to describe a periodic motion, the beam having a beam width proximate to the substrate support surface; a reticle positioned in the radiation path between the source of radiation and the substrate support to intersect the beam and direct at least a portion of the beam along the radiation path to the substrate support the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path and opposite the first component of the substrate support path; and a controller operatively coupled to the reticle and the substrate support to move the substrate support for an integer number of periods during the time required for the microlithographic substrate to move transverse to the beam by at least one beam width.

Claim 50

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a source of radiation positioned to direct a beam of selected radiation along a radiation path; a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path to describe a periodic motion, the beam having a beam width proximate to the substrate support surface; a reticle positioned in the radiation path between the source of radiation and the substrate support to intersect the beam and direct at least a portion of the beam along the radiation path to the substrate support the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path and opposite the first component of the substrate support path; and a controller operatively coupled to the reticle and the substrate support to move the substrate support for an integer number of periods during the time required for the microlithographic substrate to move transverse to the beam by at least one beam width.

Claim 58

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a source of radiation positioned to direct a beam of selected radiation along a radiation path; a substrate support configured to support a microlithographic substrate in the radiation path, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being simultaneously movable along both the first and second components of the substrate support path to describe a periodic motion, the beam having a beam width proximate to the substrate support; and a reticle positioned in the radiation path between the source of radiation and the substrate support to intersect the radiation beam, the reticle including at least one aperture and being positioned to pass the radiation along the radiation path to the substrate support, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path and opposite the first component of the substrate support path; and a controller operatively coupled to the reticle and the substrate support to move the substrate support for an integer number of periods during the time required for the entire width of the beam to pass over a point on the microlithographic substrate.

Claim 59

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a source of radiation positioned to direct a beam of selected radiation along a radiation path; a substrate support configured to support a microlithographic substrate in the radiation path, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being simultaneously movable along both the first and second components of the substrate support path to describe a periodic motion, the beam having a beam width proximate to the substrate support; and a reticle positioned in the radiation path between the source of radiation and the substrate support to intersect the radiation beam, the reticle including at least one aperture and being positioned to pass the radiation along the radiation path to the substrate support, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path and opposite the first component of the substrate support path; and a controller operatively coupled to the reticle and the substrate support to move the substrate support for an integer number of periods during the time required for the entire width of the beam to pass over a point on the microlithographic substrate.

Claim 66

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate, the radiation including a beam having a beam width at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, the microlithographic substrate moving generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along an axis generally parallel to the substrate radiation path segment, further wherein a motion of the microlithographic substrate is periodic and wherein moving the microlithographic substrate includes moving the microlithographic substrate for one period during the time the microlithographic substrate moves transverse to the beam by a distance of one beam width or about one beam width.

Claim 67

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate, the radiation including a beam having a beam width at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, the microlithographic substrate moving generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along an axis generally parallel to the substrate radiation path segment, further wherein a motion of the microlithographic substrate is periodic and wherein moving the microlithographic substrate includes moving the microlithographic substrate for one period during the time the microlithographic substrate moves transverse to the beam by a distance of one beam width or about one beam width.

Claim 68

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate, the radiation including a beam having a beam width at least proximate to an intersection between the beam and the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along an axis generally parallel to the substrate radiation path segment, further wherein a motion of the microlithographic substrate is periodic and wherein moving the microlithographic substrate includes moving the microlithographic substrate for an integer number of periods during the time the microlithographic substrate moves transverse to the beam by a distance of one beam width or about one beam width.

Claim 69

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate, the radiation including a beam having a beam width at least proximate to an intersection between the beam and the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path, and wherein the microlithographic substrate oscillates toward and away from the reticle along an axis generally parallel to the substrate radiation path segment, further wherein a motion of the microlithographic substrate is periodic and wherein moving the microlithographic substrate includes moving the microlithographic substrate for an integer number of periods during the time the microlithographic substrate moves transverse to the beam by a distance of one beam width or about one beam width.

Claim 70

A method for exposing a radiation-sensitive material of a microlithographic substrate, to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a square wave, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 71

A method for exposing a radiation-sensitive material of a microlithographic substrate, to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a square wave, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 72

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a sinusoidal wave, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 73

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a sinusoidal wave, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 74

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a periodic, triangular profile, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 75

A method for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: directing the radiation along a reticle radiation path segment toward a reticle; passing the radiation from the reticle and to the microlithographic substrate along a substrate radiation path segment at the microlithographic substrate; moving the reticle along a reticle path generally normal to the reticle radiation path segment; and moving the microlithographic substrate relative to the radiation path along a substrate path describing a periodic, triangular profile, the substrate path having a first component generally parallel to the substrate radiation path segment, and the substrate path having a second component generally perpendicular to the substrate radiation path segment, wherein the microlithographic substrate moves generally parallel to and generally perpendicular to the substrate radiation path segment toward and away from the reticle while the reticle moves along the reticle path.

Claim 76

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, the radiation including a radiation beam having a beam width proximate to the substrate support surface, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is coupled to at least one actuator to oscillate in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein the substrate support is configured to move for one period during the time the substrate support moves transverse to the beam by a distance of approximately one beam width.

Claim 77

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, the radiation including a radiation beam having a beam width proximate to the substrate support surface, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is coupled to at least one actuator to oscillate in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein the substrate support is configured to move for one period during the time the substrate support moves transverse to the beam by a distance of approximately one beam width.

Claim 78

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, the radiation including a radiation beam having a beam width proximate to the substrate support surface, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is configured to oscillate in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein the substrate support is configured to move for an integer number of periods during the time the substrate support moves transverse to the beam by a distance of approximately one beam width.

Claim 79

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, the radiation including a radiation beam having a beam width proximate to the substrate support surface, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path, and wherein the substrate support is configured to oscillate in a periodic manner toward and away from the reticle along an axis generally parallel to the second direction, further wherein the substrate support is configured to move for an integer number of periods during the time the substrate support moves transverse to the beam by a distance of approximately one beam width.

Claim 80

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a square wave, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.

Claim 81

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a square wave, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.

Claim 82

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a sinusoidal wave, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.

Claim 83

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a sinusoidal wave, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.

Claim 84

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a periodic, triangular profile, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.

Claim 85

An apparatus for exposing a radiation-sensitive material of a microlithographic substrate to a selected radiation, comprising: a radiation source positioned to direct a selected radiation along a radiation path; a reticle positioned in the radiation path, the reticle being configured to selectively direct at least a portion of the radiation toward a microlithographic substrate, the reticle being coupled to at least one actuator to move relative to the radiation path in a direction generally perpendicular to the radiation path; and a substrate support having a support surface positioned to support a microlithographic substrate in the radiation path with the microlithographic substrate receiving radiation from the reticle, wherein the substrate support is coupled to at least one actuator to move relative to the radiation path along a substrate support path describing a periodic, triangular profile, the substrate support path having a first component generally parallel to the radiation path proximate to the substrate support, the substrate support path having a second component generally perpendicular to the radiation path proximate to the substrate support, the substrate support being movable along both the first and second components of the substrate support path while the reticle moves along the reticle path.