US6720119B2
Expired / Lapsed
US
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Method of fabricating high-dielectric color filter
Assignee: Fujifilm Business Innovation Corp
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Filing: 2001-06-14
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Granted: 2004-04-13
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Expires: 2021-06-14
Abstract
Abstract A method of fabricating a color filter with a small number of processes and at low cost is provided, for which a transparent conductive film for liquid crystal driving need not be formed, a voltage drop during liquid crystal driving is restrained, and a black matrix is easily formed; an apparatus for fabricating the color filter; the color filter; and a liquid crystal display apparatus. A color filter forming substrate on which a transparent conductive film and a transparent thin semiconductor film are provided on a transparent substrate in this order is brought into contact with an aqueous electrodeposition liquid, which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH, photoelectromotive force is produced by irradiating selected regions with light to form colored films in the selected regions, and thereby, a solvent-resistant and high-dielectric color filter is fabricated. Also, a color filter in which solvent-resistant and high-dielectric colored films are formed is provided.
Inventors
- 👤 Shigemi Ohtsu
- 👤 Yoshinori Yamaguchi
- 👤 Keishi Shimizu
- 👤 Eiichi Akutsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:07
CPC Classifications
G; G02; G02F; G02F1/00; G02F1/01; G02F1/13; G02F1/133; G02F1/1333; G02F1/1335; G02F1/133509; G02F1/133514; G02B; G02B5/00; G02B5/20; G02B5/201; G02F1/133516; G02F2202/00; G02F2202/42
Claims Analysis
Total Claims: 39
Claim 1
Independent Claim
143 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by providing a transparent conductive film and a transparent thin semiconductor film on a transparent substrate in this order so that at least the thin semiconductor film of the color filter forming substrate contacts an aqueous electrodeposition liquid which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; in this state, irradiating a selected region of the thin semiconductor film with light to apply a voltage between the thin semiconductor film of the selected region and an opposing electrode; and depositing a high-dielectric colored film in the selected region of the thin semiconductor film.
Claim 2
Dependent Claim
143 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by providing a transparent conductive film and a transparent thin semiconductor film on a transparent substrate in this order so that at least the thin semiconductor film of the color filter forming substrate contacts an aqueous electrodeposition liquid which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; in this state, irradiating a selected region of the thin semiconductor film with light to apply a voltage between the thin semiconductor film of the selected region and an opposing electrode; and depositing a high-dielectric colored film in the selected region of the thin semiconductor film.
Claim 3
Dependent Claim
26 words
The color filter fabricating method according to claim 1 , wherein a bias voltage is also applied between the thin semiconductor film and the opposing electrode.
Claim 4
Dependent Claim
52 words
The color filter fabricating method according to claim 1 , after performing the step of depositing a colored film in the thin semiconductor film of the selected region, repeating once or more the process using an electrodeposition liquid or electrolyte in which the colorant is changed to a colorant having another hue.
Claim 5
Dependent Claim
23 words
The color filter fabricating method according to claim 1 , wherein the colored film is subjected to a heating process after being deposited.
Claim 6
Dependent Claim
27 words
The color filter fabricating method according to claim 1 , wherein the relative dielectric constant of the colored film after the heating process is 4.0 or more.
Claim 7
Dependent Claim
41 words
The color filter fabricating method according to claim 1 , wherein the thickness of the transparent substrate is made 0.2 mm or less, and light diffraction is restrained by applying parallel light or applying light by a close contact exposing apparatus.
Claim 8
Dependent Claim
22 words
The color filter fabricating method according to claim 1 , wherein the selected region is irradiated with light by using a photomask.
Claim 9
Dependent Claim
36 words
The color filter fabricating method according to claim 7 , wherein an imaging optical system is inserted between the photomask and the color filter forming substrate to form an image on the thin semiconductor film face.
Claim 10
Dependent Claim
35 words
The color filter fabricating method according to claim 8 , wherein the distance between an imaging optical lens of the imaging optical system and the transparent substrate face is from 1 mm to 50 cm.
Claim 11
Dependent Claim
28 words
The color filter fabricating method according to claim 8 , wherein the focus depth of the imaging optical system is in a range of ±10 to ±100 μm.
Claim 12
Dependent Claim
37 words
The color filter fabricating method according to claim 7 , wherein a mirror reflection optical system is inserted between the photomask and the color filter forming substrate to form an image on the thin semiconductor film face.
Claim 13
Dependent Claim
89 words
The color filter fabricating method according to claim 1 , after forming colored films of plural colors on the color filter forming substrate, further comprising the steps of: applying a black ultraviolet-curing resin or negative photoresist to the entire surface on which the colored films are formed; and irradiating the entire surface with light from the substrate face on which the colored films are not formed, to form a black matrix comprising a black curing resin or resist in a part in which the colored films are not formed.
Claim 14
Dependent Claim
28 words
The color filter fabricating method according to claim 12 , wherein the entire surface of the black matrix is irradiated with light during forming of a last film.
Claim 15
Dependent Claim
34 words
The color filter fabricating method according to claim 12 , wherein defects of a film pattern is compensated for by applying only a voltage during forming of the last film on the black matrix.
Claim 16
Dependent Claim
40 words
The color filter fabricating method according to claim 1 , wherein a black matrix is formed on the color filter forming substrate, using an electrodeposition liquid or electrolyte for forming a black matrix, and then the colored film is formed.
Claim 17
Dependent Claim
31 words
The color filter fabricating method according to claim 15 , wherein the entire surface of the colored films of plural colors is irradiated with light during forming of a last film.
Claim 18
Dependent Claim
37 words
The color filter fabricating method according to claim 15 , wherein defects of a film pattern is compensated for by applying only a voltage during forming of the last film on the colored films of plural colors.
Claim 19
Dependent Claim
52 words
The color filter fabricating method according to claim 1 , wherein the polymeric material is a copolymer of monomers respectively having hydrophobic groups, hydrophilic groups, and cross-linkable groups, and the ratio of the number of hydrophobic groups to the total number of hydrophobic groups and hydrophilic groups is between 30% and 80%.
Claim 20
Dependent Claim
19 words
The color filter fabricating method according to claim 1 , wherein the transparent high-dielectric material is an oxide semiconductor.
Claim 21
Dependent Claim
17 words
The color filter fabricating method according to claim 19 , wherein the oxide semiconductor is titanium oxide.
Claim 22
Dependent Claim
23 words
The color filter fabricating method according to claim 20 , wherein the particle diameter of the titanium oxide is 20 nm or less.
Claim 23
Dependent Claim
33 words
The color filter fabricating method according to claim 1 , wherein the volume ratio of a mixture of the high-dielectric material and colorant and the polymeric material is 1 to 5.0 or less.
Claim 24
Dependent Claim
142 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing thin semiconductor films on the conductive films so that at least the thin semiconductor films of the color filter forming substrate contact an aqueous electrodeposition liquid which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; in this state, irradiating a thin semiconductor film of a selected region with light to apply a voltage between the thin semiconductor film and an opposing electrode; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 25
Dependent Claim
142 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing thin semiconductor films on the conductive films so that at least the thin semiconductor films of the color filter forming substrate contact an aqueous electrodeposition liquid which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; in this state, irradiating a thin semiconductor film of a selected region with light to apply a voltage between the thin semiconductor film and an opposing electrode; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 26
Dependent Claim
41 words
The color filter fabricating method according to claim 23 , wherein an application voltage is set to 5V or less by adding acid or alkali exerting no influence on electrodeposition characteristics to the electrodeposition liquid to control pH in the solution.
Claim 27
Dependent Claim
24 words
The color filter fabricating method according to claim 23 , wherein electrodeposition speed is kept constant by adjusting the temperature of the electrodeposition liquid.
Claim 28
Dependent Claim
23 words
The color filter fabricating method according to claim 23 , wherein an organic alkali material is used when the electrodeposition liquid is prepared.
Claim 29
Dependent Claim
22 words
The color filter fabricating method according to claim 23 , wherein an ammonium salt is used when the electrodeposition liquid is prepared.
Claim 30
Dependent Claim
138 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by providing a transparent conductive thin film and a transparent thin semiconductor film in contact with the conductive film on a transparent substrate, the conductive film being conductible to an electrolyte so that the thin semiconductor film contacts an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; bringing the conductive film into conduction with the electrolyte; in this state, irradiating a selected region of the thin semiconductor film with light; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 31
Dependent Claim
138 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by providing a transparent conductive thin film and a transparent thin semiconductor film in contact with the conductive film on a transparent substrate, the conductive film being conductible to an electrolyte so that the thin semiconductor film contacts an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; bringing the conductive film into conduction with the electrolyte; in this state, irradiating a selected region of the thin semiconductor film with light; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 32
Dependent Claim
40 words
The color filter fabricating method according to claim 28 , wherein an application voltage is set to 5V or less by adding acid or alkali exerting no influence on electrodeposition characteristics to the electrolyte to control pH in the solution.
Claim 33
Dependent Claim
23 words
The color filter fabricating method according to claim 28 , wherein electrodeposition speed is kept constant by adjusting the temperature of the electrolyte.
Claim 34
Dependent Claim
22 words
The color filter fabricating method according to claim 28 , wherein an organic alkali material is used when the electrolyte is prepared.
Claim 35
Dependent Claim
21 words
The color filter fabricating method according to claim 28 , wherein an ammonium salt is used when the electrolyte is prepared.
Claim 36
Dependent Claim
136 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing transparent thin semiconductor films in contact with the conductive films so that a part of the conductive film is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; irradiating the thin semiconductor film of a selected region with light; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 37
Dependent Claim
136 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and providing transparent thin semiconductor films in contact with the conductive films so that a part of the conductive film is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; irradiating the thin semiconductor film of a selected region with light; and depositing a high-dielectric colored film in the thin semiconductor film of the selected region.
Claim 38
Dependent Claim
150 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and transparent thin semiconductor films in contact with the conductive films so that a part of the conductive films is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; selectively driving a predetermined thin film transistor; in this state, irradiating the entire surface of the color filter forming substrate with light; and depositing a high-dielectric colored film in a thin semiconductor film corresponding to a thin film transistor not driven.
Claim 39
Dependent Claim
150 words
A color filter fabricating method, comprising the steps of: placing a color filter forming substrate formed by arraying thin film transistors and transparent conductive films on a transparent substrate and transparent thin semiconductor films in contact with the conductive films so that a part of the conductive films is exposed so that at least the conductive films and the thin semiconductor films contact an aqueous electrolyte which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH; selectively driving a predetermined thin film transistor; in this state, irradiating the entire surface of the color filter forming substrate with light; and depositing a high-dielectric colored film in a thin semiconductor film corresponding to a thin film transistor not driven.
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