US6560031B1
Expired / Lapsed
US
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Optical projection lens system
Assignee: Carl Zeiss SMT GmbH
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Filing: 2000-10-23
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Granted: 2003-05-06
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Expires: 2020-10-23
Abstract
Abstract An optical projection lens system comprising in direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a waist with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refracting power, which follows the second lens group, wherein at least one lens of the projection lens system, which is arranged in front of the waist comprises an aspherical surface.
Inventors
- 👤 David R. Shafer
- 👤 Wilhelm Ulrich
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 02:49
CPC Classifications
G; G02; G02B; G02B13/00; G02B13/14; G02B13/143; G03; G03F; G03F7/00; G03F7/20; G02B13/24; G03F7/70; G03F7/70216; G03F7/70241
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
81 words
An optical projection lens system for microlithography, comprising in a direction of propagating radiation: a first lens group having positive refractive power; a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows said second lens group, wherein the optical projection lens system comprises only one clearly defined constriction portion and wherein at least one lens comprises an aspherical surface.
Claim 2
Dependent Claim
81 words
An optical projection lens system for microlithography, comprising in a direction of propagating radiation: a first lens group having positive refractive power; a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows said second lens group, wherein the optical projection lens system comprises only one clearly defined constriction portion and wherein at least one lens comprises an aspherical surface.
Claim 3
Dependent Claim
31 words
The optical projection lens system according to claim 1 , comprising lenses comprising a first lens material and lenses which comprise at least a second lens material used for chromatic correction.
Claim 4
Dependent Claim
27 words
The optical projection lens system according to claim 1 , comprising lenses comprising a first material comprising quartz glass and lenses comprising a second material comprising fluoride.
Claim 5
Dependent Claim
33 words
The optical projection lens system according to claim 3 , comprising an aperture stop, wherein the optical projection lens system comprises positive lens elements consisting of a second material nearby the aperture stop.
Claim 6
Dependent Claim
29 words
The optical projection lens system according to claim 3 , comprising lenses of a first lens material comprising quartz glass and lenses comprising a second lens material comprising fluoride.
Claim 7
Dependent Claim
29 words
The optical projection lens system according to claim 3 , comprising lenses comprising a first lens material comprising quartz glass and lenses comprising a second lens material comprising fluoride.
Claim 8
Dependent Claim
21 words
The optical projection lens system according to claim 1 , wherein the optical projection lens system comprises only two convex portions.
Claim 9
Dependent Claim
78 words
An optical projection lens system for microlithography, comprising in a direction of propagation radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating ray, a further lens arrangement with positive refracting power, which follows said second lens group, wherein the projection lens system comprises only one clearly defined constriction portion, and wherein the numerical aperture is greater than 0.65.
Claim 10
Dependent Claim
78 words
An optical projection lens system for microlithography, comprising in a direction of propagation radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating ray, a further lens arrangement with positive refracting power, which follows said second lens group, wherein the projection lens system comprises only one clearly defined constriction portion, and wherein the numerical aperture is greater than 0.65.
Claim 11
Dependent Claim
120 words
A process for producing microstructured devices, comprising from an object side to an image side exposing a wafer with a light sensitive layer with UV-light using an optical projection lens system, comprising a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refracting power, which follows said second lens group, wherein the optical projection lens system comprises only one clearly defined constriction portion and wherein at least one lens comprises an aspherical surface, using a mask for defining the structure of the device, and developing the light sensitive layer to obtain the microstructured device.
Claim 12
Dependent Claim
120 words
A process for producing microstructured devices, comprising from an object side to an image side exposing a wafer with a light sensitive layer with UV-light using an optical projection lens system, comprising a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refracting power, which follows said second lens group, wherein the optical projection lens system comprises only one clearly defined constriction portion and wherein at least one lens comprises an aspherical surface, using a mask for defining the structure of the device, and developing the light sensitive layer to obtain the microstructured device.
Claim 13
Dependent Claim
117 words
A process for producing microstructured devices, comprising from an object side to an image side exposing a wafer with a light sensitive layer with UV-light using an optical projection lens system, comprising a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating ray, a further lens arrangement with positive refracting power, which follows said second lens group, wherein the projection lens system comprises only one clearly defined constriction portion, and wherein the numerical aperture is greater than 0.65, using a mask for defining the structure of the device, and developing the light sensitive layer to obtain the microstructured device.
Claim 14
Dependent Claim
117 words
A process for producing microstructured devices, comprising from an object side to an image side exposing a wafer with a light sensitive layer with UV-light using an optical projection lens system, comprising a first lens group having positive refractive power, a second lens group having negative refractive power and comprising a constriction portion with a minimum diameter of the propagating ray, a further lens arrangement with positive refracting power, which follows said second lens group, wherein the projection lens system comprises only one clearly defined constriction portion, and wherein the numerical aperture is greater than 0.65, using a mask for defining the structure of the device, and developing the light sensitive layer to obtain the microstructured device.
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