US6432260B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Inductively coupled ring-plasma source apparatus for processing gases and materials and method thereof
Assignee: Advanced Energy Industries Inc
•
Filing: 2000-08-07
•
Granted: 2002-08-13
•
Expires: 2020-08-07
Abstract
Abstract There is provided by this invention a novel inductively coupled plasma source apparatus that utilizes a transformer to induce closed path secondary plasma currents in a hollow metal housing that is directly cooled by a fluid. This plasma source apparatus is particularly useful for generating a high charged particle density source of ions, electrons, and chemically active species to serve various plasma related processes that may require high power densities. A hollow metal vacuum chamber is coupled to and electrically insulated from a metal vacuum process chamber by means of dielectric gaps that are well shielded from direct exposure to the plasma body. Electrons, photons and excited gaseous species are generated within the metal hollow chamber and process chamber to serve a wide variety of material, surface and gas processing applications. There is also provided by this invention a means of ganging together several hollow metal vacuum chamber assemblies about a single vacuum process chamber.
Inventors
- 👤 Leonard J. Mahoney
- 👤 Gregory A. Roche
- 👤 Daniel C. Carter
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:09
CPC Classifications
H; H05; H05H; H05H1/00; H05H1/24; H05H1/26; H05H1/32; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321
Claims Analysis
Total Claims: 63
Claim 1
Independent Claim
234 words
An apparatus for plasma assisted processing of materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; a dielectric break between the hollow metal vacuum chamber and the metal processing chamber; an electrical transformer which is disposed about the hollow metal vacuum chamber and metal processing chamber having a primary coil so as to induce an electrical field in the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing the work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformer for supplying power to the vacuum chamber to sustain a closed path plasma current that acts as the single-turn secondary current to the transformer and that flows within the vacuum chamber and extends into the metal processing chamber to form a plasma within the metal processing chamber; and the AC power source is connected to an impedance matching circuit to match the impedance range of the transformer to the output impedance range of the ac power source wherein the impedance matching network electrically translates the electrically complex load impedance range of the transformer to an electrically resistive range of impedances at the terminals of the ac power supply to minimize switching losses.
Claim 2
Independent Claim
234 words
An apparatus for plasma assisted processing of materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; a dielectric break between the hollow metal vacuum chamber and the metal processing chamber; an electrical transformer which is disposed about the hollow metal vacuum chamber and metal processing chamber having a primary coil so as to induce an electrical field in the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing the work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformer for supplying power to the vacuum chamber to sustain a closed path plasma current that acts as the single-turn secondary current to the transformer and that flows within the vacuum chamber and extends into the metal processing chamber to form a plasma within the metal processing chamber; and the AC power source is connected to an impedance matching circuit to match the impedance range of the transformer to the output impedance range of the ac power source wherein the impedance matching network electrically translates the electrically complex load impedance range of the transformer to an electrically resistive range of impedances at the terminals of the ac power supply to minimize switching losses.
Claim 3
Dependent Claim
41 words
An apparatus for plasma assisted processing of materials as recited in claim 1 wherein a capacitively isolated electric boundary within the vacuum chamber is connected to the ac power source for the purpose of igniting a plasma within the vacuum chamber.
Claim 4
Dependent Claim
27 words
An apparatus for plasma assisted processing of materials as recited in claim 2 wherein the hollow metal vacuum chamber and the metal processing chamber are fluid cooled.
Claim 5
Dependent Claim
32 words
An apparatus for plasma assisted processing of materials as recited in claim 3 wherein the gas is selected from the group of gases consisting of: inert gases, reactive gases or mixtures thereof.
Claim 6
Dependent Claim
21 words
An apparatus for plasma assisted processing of materials as recited in claim 4 wherein the transformer includes a magnetic ferrite core.
Claim 7
Dependent Claim
21 words
An apparatus for plasma assisted processing of materials as recited in claim 5 wherein the ac power source is pulse modulated.
Claim 8
Dependent Claim
19 words
An apparatus for plasma assisted processing of materials as recited in claim 1 wherein the platform is electrically conductive.
Claim 9
Dependent Claim
27 words
An apparatus for plasma assisted processing of materials as recited in claim 7 wherein an electrical bias is applied to the platform and the mounted work piece.
Claim 10
Independent Claim
151 words
An apparatus for plasma assisted processing of materials, comprising: multiple hollow metal chambers defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; at least one dielectric break between the hollow metal chambers and the metal processing chamber; each of the hollow metal chambers having an electrical transformer with a primary winding so as to induce and electric field within the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing the work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma currents that act as the single-turn secondary currents to the transformers and that flow in a parallel manner within the vacuum chamber.
Claim 11
Independent Claim
151 words
An apparatus for plasma assisted processing of materials, comprising: multiple hollow metal chambers defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; at least one dielectric break between the hollow metal chambers and the metal processing chamber; each of the hollow metal chambers having an electrical transformer with a primary winding so as to induce and electric field within the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing the work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma currents that act as the single-turn secondary currents to the transformers and that flow in a parallel manner within the vacuum chamber.
Claim 12
Dependent Claim
43 words
An apparatus for plasma assisted processing of materials as recited in claim 9 wherein the ac power source is connected to an impedance matching circuit to match the impedance range of the transformers to the output impedance range of the ac power source.
Claim 13
Dependent Claim
41 words
An apparatus for plasma assisted processing of materials as recited in claim 10 wherein a capacitively isolated electric boundary within the vacuum chamber is connected to the ac power source for the purpose of igniting a plasma within the vacuum chamber.
Claim 14
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 11 wherein the hollow metal vacuum chambers and metal processing chamber are fluid cooled.
Claim 15
Dependent Claim
32 words
An apparatus for plasma assisted processing of materials as recited in claim 12 wherein the gas is selected from the group of gases consisting of: inert gases, reactive gases or mixtures thereof.
Claim 16
Dependent Claim
20 words
An apparatus for plasma assisted processing of materials as recited in claim 13 wherein the transformers include magnetic ferrite cores.
Claim 17
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 14 wherein of the ac power source is pulse modulated.
Claim 18
Dependent Claim
43 words
An apparatus for plasma assisted processing of materials as recited in claim 9 further comprising multiple ac power sources connected to an impedance matching circuit to match the impedance range of the transformners to the output impedance range of the ac power sources.
Claim 19
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 16 wherein the multiple ac power sources are operated synchronously.
Claim 20
Dependent Claim
23 words
An apparatus for plasma assisted processing of materials as recited in claim 16 wherein the multiple ac power sources are operated a synchronously.
Claim 21
Dependent Claim
19 words
An apparatus for plasma assisted processing of materials as recited in claim 9 wherein the platform is electrically conductive.
Claim 22
Dependent Claim
27 words
An apparatus for plasma assisted processing of materials as recited in claim 19 wherein an electrical bias is applied to the platform and the mounted work piece.
Claim 23
Dependent Claim
44 words
An apparatus for plasma assisted processing of materials as recited in claim 9 wherein the multiple hollow metal chambers are positioned on opposite sides of the processing chamber so as to treat opposite sides of a work piece mounted on the platform positioned therein.
Claim 24
Dependent Claim
44 words
An apparatus for plasma assisted processing of materials as recited in claim 9 wherein the multiple hollow metal chambers are positioned on opposite sides of the processing chamber so as to treat multiple work pieces mounted on opposite sides of the platform positioned therein.
Claim 25
Independent Claim
160 words
An apparatus for plasma assisted processing of materials, comprising: multiple metal hollow metal vacuum chambers defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; at least one dielectric break between the metal hollow metal vacuum chambers and the metal processing chamber; each of the hollow metal chambers having an electrical transformer with a primary winding so as to induce a electric field within the vacuum chamber; a gas input for delivering a reactive gas into the vacuum chamber for processing the work piece; a gas output for exhausting reactive gases from the hollow metal vacuum chamber; and an AC power source connected to the primary windings of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma currents that act as the single-turn secondary currents to the transformers and that flow in a series manner within the vacuum chamber.
Claim 26
Independent Claim
160 words
An apparatus for plasma assisted processing of materials, comprising: multiple metal hollow metal vacuum chambers defining a vacuum chamber in communication with a metal processing chamber for plasma assisted processing of a work piece mounted on a platform positioned therein; at least one dielectric break between the metal hollow metal vacuum chambers and the metal processing chamber; each of the hollow metal chambers having an electrical transformer with a primary winding so as to induce a electric field within the vacuum chamber; a gas input for delivering a reactive gas into the vacuum chamber for processing the work piece; a gas output for exhausting reactive gases from the hollow metal vacuum chamber; and an AC power source connected to the primary windings of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma currents that act as the single-turn secondary currents to the transformers and that flow in a series manner within the vacuum chamber.
Claim 27
Dependent Claim
43 words
An apparatus for plasma assisted processing of materials as recited in claim 23 wherein the ac power source is connected to an impedance matching circuit to match the impedance range of the transformers to the output impedance range of the ac power source.
Claim 28
Dependent Claim
41 words
An apparatus for plasma assisted processing of materials as recited in claim 24 wherein a capacitively isolated electric boundary within the vacuum chamber is connected to the ac power source for the purpose of igniting a plasma within the vacuum chamber.
Claim 29
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 25 wherein the hollow metal vacuum chambers and metal processing chamber are fluid cooled.
Claim 30
Dependent Claim
32 words
An apparatus for plasma assisted processing of materials as recited in claim 26 wherein the gas is selected from the group of gases consisting of: inert gases, reactive gases or mixtures thereof.
Claim 31
Dependent Claim
20 words
An apparatus for plasma assisted processing of materials as recited in claim 27 wherein the transformers include magnetic ferrite cores.
Claim 32
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 28 wherein of the ac power source is pulse modulated.
Claim 33
Dependent Claim
43 words
An apparatus for plasma assisted processing of materials as recited in claim 23 further comprising multiple ac power sources connected to an impedance matching circuit to match the impedance range of the transformers to the output impedance range of the ac power sources.
Claim 34
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 30 wherein the multiple ac power sources are operated synchronously.
Claim 35
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 30 wherein the multiple ac power sources are operated asynchronously.
Claim 36
Dependent Claim
19 words
An apparatus for plasma assisted processing of materials as recited in claim 23 wherein the platform is electrically conductive.
Claim 37
Dependent Claim
27 words
An apparatus for plasma assisted processing of materials as recited in claim 33 wherein an electrical bias is applied to the platform and the mounted work piece.
Claim 38
Independent Claim
249 words
An apparatus for chemical activation of gaseous materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with a metal processing chamber for plasma assisted chemical activation of gases disposed therein; a dielectric break between the hollow metal vacuum chamber and the metal processing chamber; an electrical transformer which is disposed about the hollow metal vacuum chamber and metal processing chamber having a primary coil so as to induce an electrical field in the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing a work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformer for supplying power to the vacuum chamber to sustain a closed path plasma current that acts as the single-turn secondary current to the transformer and that flows within the vacuum chamber and extends into the metal processing chamber to form a plasma within the metal processing chamber; the AC power source is connected to an impedance matching circuit to match the impedance range of the transformer to the output impedance range of the ac power source wherein the impedance matching network electrically translates the electrically complex load impedance range of the transformer to an electrically resistive range of impedances at the terminals of the ac power supply to minimize switching losses; and a gas output wherein the output gas is a chemically activating gaseous material for remote plasma source vacuum gas processing.
Claim 39
Independent Claim
249 words
An apparatus for chemical activation of gaseous materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with a metal processing chamber for plasma assisted chemical activation of gases disposed therein; a dielectric break between the hollow metal vacuum chamber and the metal processing chamber; an electrical transformer which is disposed about the hollow metal vacuum chamber and metal processing chamber having a primary coil so as to induce an electrical field in the vacuum chamber; a gas input for delivering a gas into the vacuum chamber for processing a work piece; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformer for supplying power to the vacuum chamber to sustain a closed path plasma current that acts as the single-turn secondary current to the transformer and that flows within the vacuum chamber and extends into the metal processing chamber to form a plasma within the metal processing chamber; the AC power source is connected to an impedance matching circuit to match the impedance range of the transformer to the output impedance range of the ac power source wherein the impedance matching network electrically translates the electrically complex load impedance range of the transformer to an electrically resistive range of impedances at the terminals of the ac power supply to minimize switching losses; and a gas output wherein the output gas is a chemically activating gaseous material for remote plasma source vacuum gas processing.
Claim 40
Dependent Claim
41 words
An apparatus for plasma assisted processing of materials as recited in claim 35 wherein a capacitively isolated electric boundary within the vacuum chamber is connected to the ac power source for the purpose of igniting a plasma within the vacuum chamber.
Claim 41
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 36 wherein the hollow metal vacuum chamber and metal processing chamber are fluid cooled.
Claim 42
Dependent Claim
33 words
An apparatus for plasma assisted processing of materials as recited in claim 37 wherein the input gas is selected from the group of gases consisting of: inert gases, reactive gases or mixtures thereof.
Claim 43
Dependent Claim
21 words
An apparatus for plasma assisted processing of materials as recited in claim 38 wherein the transformer includes a magnetic ferrite core.
Claim 44
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 39 wherein of the ac power source is pulse modulated.
Claim 45
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 35 wherein the remote plasma source vacuum gas processing consists of remote chamber cleaning.
Claim 46
Dependent Claim
30 words
An apparatus for plasma assisted processing of materials as recited in claim 35 wherein the remote plasma source vacuum gas processing consists of remote chamber ashing of polymer like surfaces.
Claim 47
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 35 wherein the remote plasma source vacuum gas processing consists of downstream foreline cleaning.
Claim 48
Dependent Claim
30 words
An apparatus for plasma assisted processing of materials as recited in claim 35 wherein the remote plasma source vacuum gas processing consists of post-process gas abatement within a vacuum foreline.
Claim 49
Independent Claim
166 words
An apparatus for chemical activation of gaseous materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with multiple metal processing chambers for plasma assisted chemical activation of gases disposed therein; at least one dielectric break between the metal hollow chamber and the multiple metal processing chambers; each of the metal hollow chambers having an electrical transformer with a primary winding so as to induce an electric field within the vacuum chamber; a gas input for delivering gases into the vacuum chamber; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma current that acts as the single-turn secondary current to the transformers and that flows through the hollow metal chambers and metal housings in a series manner; and a gas output wherein the output gas is a chemically activating gaseous material for remote plasma source vacuum gas processing.
Claim 50
Independent Claim
166 words
An apparatus for chemical activation of gaseous materials, comprising: a metal hollow chamber defining a vacuum chamber in communication with multiple metal processing chambers for plasma assisted chemical activation of gases disposed therein; at least one dielectric break between the metal hollow chamber and the multiple metal processing chambers; each of the metal hollow chambers having an electrical transformer with a primary winding so as to induce an electric field within the vacuum chamber; a gas input for delivering gases into the vacuum chamber; a gas output for exhausting gases from the vacuum chamber; an AC power source connected to the primary winding of the electrical transformers for supplying power to the vacuum chamber to sustain closed path plasma current that acts as the single-turn secondary current to the transformers and that flows through the hollow metal chambers and metal housings in a series manner; and a gas output wherein the output gas is a chemically activating gaseous material for remote plasma source vacuum gas processing.
Claim 51
Dependent Claim
45 words
An apparatus for plasma assisted processing of materials as recited in claim 45 wherein the ac power source is connected to an impedance matching circuit to match the impedance range of the plasma loaded transformer to the output impedance range of the ac power source.
Claim 52
Dependent Claim
41 words
An apparatus for plasma assisted processing of materials as recited in claim 46 wherein a capacitively isolated electric boundary within the vacuum chamber is connected to the ac power source for the purpose of igniting a plasma within the vacuum chamber.
Claim 53
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 47 wherein the metal hollow vacuum chambers and metal processing chamber are fluid cooled.
Claim 54
Dependent Claim
32 words
An apparatus for plasma assisted processing of materials as recited in claim 48 wherein the gas is selected from the group of gases consisting of: inert gases, reactive gases or mixtures thereof.
Claim 55
Dependent Claim
21 words
An apparatus for plasma assisted processing of materials as recited in claim 49 wherein the transformer includes a magnetic ferrite core.
Claim 56
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 50 wherein of the ac power source is pulse modulated.
Claim 57
Dependent Claim
44 words
An apparatus for plasma assisted processing of materials as recited in claim 45 further comprising multiple ac power sources are connected to an impedance matching circuit to match the impedance range of the transformers to the output impedance range of the ac power sources.
Claim 58
Dependent Claim
22 words
An apparatus for plasma assisted processing of materials as recited in claim 52 wherein the multiple ac power sources are operated synchronously.
Claim 59
Dependent Claim
23 words
An apparatus for plasma assisted processing of materials as recited in claim 52 wherein the multiple ac power sources are operated a synchronously.
Claim 60
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 45 wherein the remote plasma source vacuum gas processing consists of remote chamber cleaning.
Claim 61
Dependent Claim
30 words
An apparatus for plasma assisted processing of materials as recited in claim 45 wherein the remote plasma source vacuum gas processing consists of remote chamber ashing of polymer like surfaces.
Claim 62
Dependent Claim
26 words
An apparatus for plasma assisted processing of materials as recited in claim 45 wherein the remote plasma source vacuum gas processing consists of downstream foreline cleaning.
Claim 63
Dependent Claim
30 words
An apparatus for plasma assisted processing of materials as recited in claim 45 wherein the remote plasma source vacuum gas processing consists of post-process gas abatement within a vacuum foreline.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2005-08-12 | 2006-02-11 | 2006-08-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2009-08-12 | 2010-02-11 | 2010-08-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2013-08-12 | 2014-02-11 | 2014-08-13 | $7700.00 | Window Closed / Lapsed |