US6200897B1
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for manufacturing even dielectric layer
Assignee: United Microelectronics Corp
•
Filing: 1999-06-06
•
Granted: 2001-03-13
•
Expires: 2019-06-06
Abstract
Abstract A method for manufacturing an even dielectric layer. A substrate having a patterned conductive layer formed thereon is provided. A first dielectric layer with a relatively high dopant dosage is formed on the substrate and the patterned conductive layer. A second dielectric layer with a relatively low dopant dosage is formed on the first dielectric layer. A chemical-mechanical polishing process is formed.
Inventors
- 👤 Brian Wang
- 👤 Chih-Ching Hsu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:29
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; H10P14/6923; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/66; H10P14/662; H10P14/6928; H10P95/00; H10P95/06; H10P95/062
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
66 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a patterned conductive layer formed thereon, comprising the steps of: forming a first dielectric layer with a relatively high dopant dosage on the substrate and the patterned conductive layer; forming a second dielectric layer with a relatively low dopant dosage on the first dielectric layer; and performing a chemical-mechanical polishing process.
Claim 2
Independent Claim
66 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a patterned conductive layer formed thereon, comprising the steps of: forming a first dielectric layer with a relatively high dopant dosage on the substrate and the patterned conductive layer; forming a second dielectric layer with a relatively low dopant dosage on the first dielectric layer; and performing a chemical-mechanical polishing process.
Claim 3
Dependent Claim
19 words
The method of claim 1 , wherein the step of forming the first dielectric layer includes chemical vapor deposition.
Claim 4
Dependent Claim
19 words
The method of claim 1 , wherein the step of forming the second dielectric layer includes chemical vapor deposition.
Claim 5
Dependent Claim
16 words
The method of claim 1 , wherein material of the first dielectric layer includes borosilicate glass.
Claim 6
Dependent Claim
16 words
The method of claim 1 , wherein material of the first dielectric layer includes phosphosilicate glass.
Claim 7
Dependent Claim
16 words
The method of claim 1 , wherein material of the first dielectric layer includes borophosphosilicate glass.
Claim 8
Independent Claim
74 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a pattered conductive layer formed thereon, comprising the steps of: forming a gradient-doped dielectric layer, wherein the dopant dosage in the gradient-doped dielectric layer is increased with increasing depth, from the top of the gradient-doped dielectric layer to the bottom of the gradient-doped dielectric layer, on the substrate and the patterned conductive layer; and performing a chemical-mechanical polishing process.
Claim 9
Independent Claim
74 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a pattered conductive layer formed thereon, comprising the steps of: forming a gradient-doped dielectric layer, wherein the dopant dosage in the gradient-doped dielectric layer is increased with increasing depth, from the top of the gradient-doped dielectric layer to the bottom of the gradient-doped dielectric layer, on the substrate and the patterned conductive layer; and performing a chemical-mechanical polishing process.
Claim 10
Dependent Claim
16 words
The method of claim 7 , wherein material of the gradient-doped dielectric layer includes borosilicate glass.
Claim 11
Dependent Claim
16 words
The method of claim 7 , wherein material of the gradient-doped dielectric layer includes phosphosilicate glass.
Claim 12
Dependent Claim
16 words
The method of claim 7 , wherein material of the gradient-doped dielectric layer includes borophosphosilicate glass.
Claim 13
Independent Claim
114 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a patterned conductive layer formed thereon, comprising the steps of: forming a first dielectric layer with a relatively high polishing rate on the substrate and the patterned conductive layer; forming a second dielectric layer with a relatively low polishing rate on the first dielectric layer; performing a chemical-mechanical polishing process for removing a portion of said second dielectric layer with a relatively low polishing rate until a portion of said first dielectric layer with a relatively high polishing rate is exposed; and continuing said chemical-mechanical polishing process until reaching a planar endpoint to form an even surfaced dielectric layer.
Claim 14
Independent Claim
114 words
A method of manufacturing an even dielectric layer formed over a substrate, the substrate having a patterned conductive layer formed thereon, comprising the steps of: forming a first dielectric layer with a relatively high polishing rate on the substrate and the patterned conductive layer; forming a second dielectric layer with a relatively low polishing rate on the first dielectric layer; performing a chemical-mechanical polishing process for removing a portion of said second dielectric layer with a relatively low polishing rate until a portion of said first dielectric layer with a relatively high polishing rate is exposed; and continuing said chemical-mechanical polishing process until reaching a planar endpoint to form an even surfaced dielectric layer.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-03-12 | 2004-09-11 | 2005-03-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-03-12 | 2008-09-11 | 2009-03-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-03-12 | 2012-09-11 | 2013-03-13 | $7700.00 | Window Closed / Lapsed |