US6172402B1
Expired / Lapsed
US
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Integrated circuit having transistors that include insulative punchthrough regions and method of formation
Assignee: GlobalFoundries Inc
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Filing: 1998-06-04
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Granted: 2001-01-09
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Expires: 2018-06-04
Abstract
Abstract An integrated circuit includes a plurality of transistors formed to include insulative punchthrough regions. Each of the plurality of transistors includes a channel formed upon a substrate, an insulative punchthrough region formed below the channel, a source formed upon the insulative punchthrough region residing adjacent a first end of the channel, a drain formed upon the insulative punchthrough region residing adjacent a second end of the channel, a gate oxide formed above the channel and a gate conductor formed above the gate oxide. Isolation regions may also be formed in the substrate that have an etch stop defination that was formed upon formation of the insulative punchthrough region. A voltage threshold region may be formed between the gate oxide and the channel and lightly doped regions may be formed adjacent the channel. The insulative punchthrough region may be and oxide layer formed within the substrate in an oxygen implant step that also formed the etch stop defination. The transistors and other circuit elements formed in the substrate may be interconnected to form an integrated circuit.
Inventors
- 👤 Mark I. Gardner
- 👤 Mark C. Gilmer
- 👤 Daniel Kadosh
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 19:15
CPC Classifications
H; H10; H10D; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0165; H10D84/0167; H10D84/0188; H10D84/02; H10D84/03; H10D84/038; H10D84/80; H10D84/82; H10D84/83; H10D84/85; H10D84/854; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/014; H10W10/0148; H10W10/10; H10W10/17
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
216 words
A transistor formed on a semiconductor substrate, comprising: an active region; a trench isolation region surrounding the active region the trench isolation region comprising a trench filled with a dielectric, the trench having a substantially flat bottom and substantially vertical sidewalls; a channel formed in a top portion of the active region; a source formed in a top portion of the active region and residing adjacent a first end of the channel; a drain formed in a top portion of the active region and residing adjacent a second end of the channel; an implanted insulative layer formed in the semiconductor substrate; wherein a first portion of the implanted insulative layer resides below the channel, the source and the drain to form an insulative punchthrough layer that extends fully across the active region; wherein a second portion of the implanted insulative layer resides below the filled dielectric of the trench isolation region and extends fully across the bottom of the trench; wherein the implanted insulative layer resides at a first depth in the substrate across the trench isolation region and at a second depth in the substrate across the active region, wherein the first depth is greater than the second depth; a gate oxide formed above the channel; and a gate conductor formed above the gate oxide.
Claim 2
Dependent Claim
216 words
A transistor formed on a semiconductor substrate, comprising: an active region; a trench isolation region surrounding the active region the trench isolation region comprising a trench filled with a dielectric, the trench having a substantially flat bottom and substantially vertical sidewalls; a channel formed in a top portion of the active region; a source formed in a top portion of the active region and residing adjacent a first end of the channel; a drain formed in a top portion of the active region and residing adjacent a second end of the channel; an implanted insulative layer formed in the semiconductor substrate; wherein a first portion of the implanted insulative layer resides below the channel, the source and the drain to form an insulative punchthrough layer that extends fully across the active region; wherein a second portion of the implanted insulative layer resides below the filled dielectric of the trench isolation region and extends fully across the bottom of the trench; wherein the implanted insulative layer resides at a first depth in the substrate across the trench isolation region and at a second depth in the substrate across the active region, wherein the first depth is greater than the second depth; a gate oxide formed above the channel; and a gate conductor formed above the gate oxide.
Claim 3
Dependent Claim
57 words
The transistor of claim 1 , wherein the implanted insulative layer has a thickness and wherein the difference between the second depth and the first depth is greater than the thickness of the implanted insulative layer such that the first portion of the implanted insulative layer does not contact the second portion of the implanted insulative layer.
Claim 4
Dependent Claim
20 words
The transistor of claim 1 , further comprising a voltage threshold region formed between the gate oxide and the channel.
Claim 5
Dependent Claim
15 words
The transistor of claim 1 , further comprising insulative spacers formed about the gate conductor.
Claim 6
Dependent Claim
15 words
The transistor of claim 1 , further comprising lightly doped regions formed adjacent the channel.
Claim 7
Dependent Claim
19 words
The transistor of claim 1 , wherein the implanted insulative layer comprises an oxide layer formed within the substrate.
Claim 8
Dependent Claim
21 words
The transistor of claim 1 , wherein the implanted insulative layer comprises Silicon Dioxide that has been formed within the substrate.
Claim 9
Dependent Claim
18 words
The transistor of claim 1 , further comprising liner oxide regions formed on the sidewalls of the trench.
Claim 10
Dependent Claim
242 words
An integrated circuit formed in a semiconductor substrate comprising: a plurality of transistors, each transistor comprising: an active region; a trench isolation region surrounding, the active region, the trench isolation region comprising a trench filled with a dielectric, the trench having a substantially flat bottom and substantially vertical sidewalls; a channel formed in a top portion of the active region; a source formed in a top portion of the active region and residing adjacent a first end of the channel; a drain formed in a top portion of the active region and residing adjacent a second end of the channel; an implanted insulative layer formed in the semiconductor substrate; wherein a first portion of the implanted insulative layer resides below the channel, the source and the drain to form an insulative punchthrough layer that extends fully across the active region; wherein a second portion of the implanted insulative layer resides below the filled dielectric of the trench isolation region and extends fully across the bottom of the trench; wherein the implanted insulative layer resides at a first depth in the substrate across the trench isolation region and at a second depth in the substrate across the active region, wherein the first depth is greater than the second depth; a gate oxide formed above the channel; and a gate conductor formed above the gate oxide; and a plurality of interconnections coupling the plurality of transistors to one another to form the integrated circuit.
Claim 11
Dependent Claim
242 words
An integrated circuit formed in a semiconductor substrate comprising: a plurality of transistors, each transistor comprising: an active region; a trench isolation region surrounding, the active region, the trench isolation region comprising a trench filled with a dielectric, the trench having a substantially flat bottom and substantially vertical sidewalls; a channel formed in a top portion of the active region; a source formed in a top portion of the active region and residing adjacent a first end of the channel; a drain formed in a top portion of the active region and residing adjacent a second end of the channel; an implanted insulative layer formed in the semiconductor substrate; wherein a first portion of the implanted insulative layer resides below the channel, the source and the drain to form an insulative punchthrough layer that extends fully across the active region; wherein a second portion of the implanted insulative layer resides below the filled dielectric of the trench isolation region and extends fully across the bottom of the trench; wherein the implanted insulative layer resides at a first depth in the substrate across the trench isolation region and at a second depth in the substrate across the active region, wherein the first depth is greater than the second depth; a gate oxide formed above the channel; and a gate conductor formed above the gate oxide; and a plurality of interconnections coupling the plurality of transistors to one another to form the integrated circuit.
Claim 12
Dependent Claim
58 words
The integrated circuit of claim 9 , wherein the implanted insulative layer has a thickness and wherein the difference between the second depth and the first depth is greater than the thickness of the implanted insulative layer such that the first portion of the implanted insulative layer does not contact the second portion of the implanted insulative layer.
Claim 13
Dependent Claim
24 words
The integrated circuit of claim 9 , wherein each transistor further comprises a voltage threshold region disposed between the gate oxide and the channel.
Claim 14
Dependent Claim
19 words
The integrated circuit of claim 9 , wherein each transistor further comprises insulative spacers formed about the gate conductor.
Claim 15
Dependent Claim
19 words
The integrated circuit of claim 9 , wherein each transistor further comprises lightly doped regions formed adjacent the channel.
Claim 16
Dependent Claim
20 words
The integrated circuit of claim 9 , wherein the implanted insulative layer comprises an oxide layer formed within the substrate.
Claim 17
Dependent Claim
22 words
The integrated circuit of claim 9 , wherein the implanted insulative layer comprises Silicon Dioxide that has been formed within the substrate.
Claim 18
Dependent Claim
28 words
The integrated circuit of claim 9 , wherein at least one of the plurality of transistors further comprises liner oxide regions formed on the sidewalls of the trench.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2004-01-09 | 2004-07-10 | 2005-01-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2008-01-09 | 2008-07-10 | 2009-01-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2012-01-09 | 2012-07-10 | 2013-01-09 | $7700.00 | Window Closed / Lapsed |