US6151122A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Inspection method and apparatus for projection optical systems
Assignee: Nikon Corp
•
Filing: 1999-06-14
•
Granted: 2000-11-21
•
Expires: 2019-06-14
Abstract
Abstract The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.
Inventors
- 👤 Tetsuo Taniguchi
- 👤 Toshihiko Tsuji
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 16:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/70591; G03F7/706; G03F7/70216; G03F7/70358; G03F7/70691
Claims Analysis
Total Claims: 170
Claim 1
Independent Claim
121 words
An inspection method of a projection optical system for projecting an image of a pattern on a mask onto a predetermined plate, comprising the steps of: (1) detecting a positional relationship between a plurality of reference marks formed on a reference mark member provided on a mask stage, said reference mark member being different from said mask; (2) forming projected images of said reference marks on the predetermined plane; (3) detecting a positional relationship between a plurality of projected images of said reference marks; and (4) obtaining an image formation characteristic of said projection optical system, based on said positional relationship between reference marks detected in said step (1) and said positional relationship between projected images detected in said step (3).
Claim 2
Dependent Claim
121 words
An inspection method of a projection optical system for projecting an image of a pattern on a mask onto a predetermined plate, comprising the steps of: (1) detecting a positional relationship between a plurality of reference marks formed on a reference mark member provided on a mask stage, said reference mark member being different from said mask; (2) forming projected images of said reference marks on the predetermined plane; (3) detecting a positional relationship between a plurality of projected images of said reference marks; and (4) obtaining an image formation characteristic of said projection optical system, based on said positional relationship between reference marks detected in said step (1) and said positional relationship between projected images detected in said step (3).
Claim 3
Dependent Claim
53 words
The inspection method as set forth in claim 1, wherein said reference mark member is a single reference mark member, said plurality of reference marks are formed in said single reference mark member, and a center of said single reference mark member is aligned with an optical axis of said projection optical system.
Claim 4
Dependent Claim
37 words
The inspection method as set forth in claim 1, wherein said reference mark member comprises a plurality of reference plates, and said plurality of reference plates are provided around a position at which said mask is disposed.
Claim 5
Dependent Claim
83 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and obtaining an image formation characteristic other than a projection magnification and distortion based on information obtained by detecting said reference mark.
Claim 6
Dependent Claim
83 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and obtaining an image formation characteristic other than a projection magnification and distortion based on information obtained by detecting said reference mark.
Claim 7
Dependent Claim
77 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the proj ection optical system, wherein said reference mark member is formed on a mask stage and is different from said mask; and adjusting a bobbin-type distortion or a barrel-type distortion based on information obtained by detecting said reference mark.
Claim 8
Dependent Claim
77 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the proj ection optical system, wherein said reference mark member is formed on a mask stage and is different from said mask; and adjusting a bobbin-type distortion or a barrel-type distortion based on information obtained by detecting said reference mark.
Claim 9
Dependent Claim
71 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from a mask; and moving said mask based on information obtained by detecting said reference mark.
Claim 10
Dependent Claim
71 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from a mask; and moving said mask based on information obtained by detecting said reference mark.
Claim 11
Dependent Claim
86 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and disposing a glass plate between the mask and the projection system, wherein said glass plate is formed in accordance with information obtained by detecting said reference mark.
Claim 12
Dependent Claim
86 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and disposing a glass plate between the mask and the projection system, wherein said glass plate is formed in accordance with information obtained by detecting said reference mark.
Claim 13
Dependent Claim
89 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and changing the pressure in an enclosed space defined in said projection system or the composition of gas within said enclosed space based on information obtained by detecting said reference mark.
Claim 14
Dependent Claim
89 words
A projection exposure method in which a pattern formed on a mask is transferred onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; and changing the pressure in an enclosed space defined in said projection system or the composition of gas within said enclosed space based on information obtained by detecting said reference mark.
Claim 15
Dependent Claim
95 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said a mask; and obtaining an image formation characteristic on the basis of information obtained by detecting said reference mark, wherein the image formation characteristic is obtained in accord with an illumination condition for a mask.
Claim 16
Dependent Claim
95 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting a reference mark of a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said a mask; and obtaining an image formation characteristic on the basis of information obtained by detecting said reference mark, wherein the image formation characteristic is obtained in accord with an illumination condition for a mask.
Claim 17
Dependent Claim
101 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; exposing a substrate with the projection image of the reference mark; detecting a resist image formed on the substrate; and obtaining an image formation characteristic on the basis of information obtained by detecting the resist image.
Claim 18
Dependent Claim
101 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; exposing a substrate with the projection image of the reference mark; detecting a resist image formed on the substrate; and obtaining an image formation characteristic on the basis of information obtained by detecting the resist image.
Claim 19
Dependent Claim
106 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; forming the projected image of the reference mark on an erasable device; detecting an image formed on the erasable device; and obtaining an image formation characteristic on the basis of information obtained by detecting said image formed on the erasable device.
Claim 20
Dependent Claim
106 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection system, wherein said reference mark member is formed on a mask stage which holds said mask and is different from said mask; forming the projected image of the reference mark on an erasable device; detecting an image formed on the erasable device; and obtaining an image formation characteristic on the basis of information obtained by detecting said image formed on the erasable device.
Claim 21
Dependent Claim
60 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting, through the projection system, a reference mark on a reference member disposed on a stage which holds a mask while said mask is exchanged, said reference member being different from said mask.
Claim 22
Dependent Claim
60 words
A projection exposure method in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: detecting, through the projection system, a reference mark on a reference member disposed on a stage which holds a mask while said mask is exchanged, said reference member being different from said mask.
Claim 23
Dependent Claim
24 words
A method according to claim 12, wherein said reference member disposed on said stage exists within an illumination area while said mask is exchanged.
Claim 24
Dependent Claim
75 words
A projection exposure method in which a pattern of a mask is transferred onto a substrate through a projection optical system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection optical system, wherein said reference mark member is disposed on a mask stage which holds said mask and is different from said mask; and forming an image of said reference mark on a sensitive member.
Claim 25
Dependent Claim
75 words
A projection exposure method in which a pattern of a mask is transferred onto a substrate through a projection optical system, the method comprising: projecting an image of a reference mark formed on a reference mark member through the projection optical system, wherein said reference mark member is disposed on a mask stage which holds said mask and is different from said mask; and forming an image of said reference mark on a sensitive member.
Claim 26
Dependent Claim
16 words
The projection exposure method according to claim 14, wherein said sensitive member is a photosensitive substrate.
Claim 27
Dependent Claim
23 words
The projection exposure method according to claim 14, wherein said sensitive member is a device from which said formed image can be erased.
Claim 28
Dependent Claim
18 words
The projection exposure method according to claim 14, further comprising: detecting said image formed on the sensitive member.
Claim 29
Dependent Claim
20 words
The projection exposure method according to claim 17, further comprising: obtaining an image formation characteristic based on the detected image.
Claim 30
Dependent Claim
19 words
The projection exposure method according to claim 17, further comprising: adjusting said projection system based on the detected image.
Claim 31
Dependent Claim
28 words
The projection exposure method according to claim 19, wherein adjustment of said projection system is performed by moving at least one of lens elements of said projection system.
Claim 32
Dependent Claim
18 words
The projection exposure method according to claim 17, further comprising: moving said mask based on the detected image.
Claim 33
Dependent Claim
28 words
The projection exposure method according to claim 18, wherein said image formation characteristic includes at least one of a projection magnification, distortion, a focus position and a coma.
Claim 34
Dependent Claim
40 words
The projection exposure method according to claim 17, wherein forming said image of a reference mark on said sensitive member and detecting the image formed on said sensitive member is performed when an illumination condition for said mask is changed.
Claim 35
Dependent Claim
104 words
A scanning exposure method in which a mask and a substrate are moved synchronously for a scanning exposure, the method comprising: moving a reference member to a predetermined position, wherein said reference member is disposed on a mask stage which holds said mask and is arranged within an approach run section of said mask stage; and detecting a reference mark formed on said reference member moved to the predetermined position, wherein said approach run section of said mask stage is passed through an illumination area of exposure light at the time of acceleration or deceleration movement of said mask stage for the scanning exposure.
Claim 36
Dependent Claim
104 words
A scanning exposure method in which a mask and a substrate are moved synchronously for a scanning exposure, the method comprising: moving a reference member to a predetermined position, wherein said reference member is disposed on a mask stage which holds said mask and is arranged within an approach run section of said mask stage; and detecting a reference mark formed on said reference member moved to the predetermined position, wherein said approach run section of said mask stage is passed through an illumination area of exposure light at the time of acceleration or deceleration movement of said mask stage for the scanning exposure.
Claim 37
Dependent Claim
24 words
The scanning exposure method according to claim 24, further comprising: obtaining an image formation characteristic based on information obtained by detecting said reference mark.
Claim 38
Dependent Claim
23 words
The scanning exposure method according to claim 24, further comprising: adjusting a projection system based on information obtained by detecting said reference mark.
Claim 39
Dependent Claim
28 words
The scanning exposure method according to claim 26, wherein adjustment of said projection system is performed by moving at least one of lens elements of said projection system.
Claim 40
Dependent Claim
22 words
The scanning exposure method according to claim 24, further comprising: moving said mask based on information obtained by detecting said reference mark.
Claim 41
Dependent Claim
28 words
The scanning exposure method according to claim 25, wherein said image formation characteristics include at least one of a projection magnification, distortion, a focus position and a coma.
Claim 42
Dependent Claim
38 words
The scanning exposure method according to claim 24, wherein said reference mark is plural in number and wherein said plural reference marks are formed on said reference member along the direction of synchronous scanning movement of said mask.
Claim 43
Dependent Claim
26 words
The scanning exposure method according to claim 24, wherein said detection of said reference mark is performed while said mask on said mask stage is exchanged.
Claim 44
Dependent Claim
26 words
The scanning exposure method according to claim 24, wherein said detection of said reference mark is performed when an illumination condition for said mask is changed.
Claim 45
Dependent Claim
90 words
A projection exposure method in which a pattern of a mask is transferred onto a substrate through a projection optical system, the method comprising the steps of: detecting a reference mark formed on a reference member through said projection optical system, said reference mark member being formed on a mask stage to support said mask and being different from said mask; and obtaining information related to at least one of a focus position and a coma of said projection optical system based on the detected result of the reference mark.
Claim 46
Dependent Claim
90 words
A projection exposure method in which a pattern of a mask is transferred onto a substrate through a projection optical system, the method comprising the steps of: detecting a reference mark formed on a reference member through said projection optical system, said reference mark member being formed on a mask stage to support said mask and being different from said mask; and obtaining information related to at least one of a focus position and a coma of said projection optical system based on the detected result of the reference mark.
Claim 47
Dependent Claim
23 words
The scanning exposure method according to claim 33, further comprising a step of adjusting said projection optical system based on said obtained information.
Claim 48
Independent Claim
103 words
A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate, the method comprising: providing a projection optical system, disposed between said mask and said substrate, which projects a pattern image on the image plane side thereof; providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask; providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask, wherein an image of said reference mark is formed on a sensitive member through said projection optical system.
Claim 49
Independent Claim
103 words
A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate, the method comprising: providing a projection optical system, disposed between said mask and said substrate, which projects a pattern image on the image plane side thereof; providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask; providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask, wherein an image of said reference mark is formed on a sensitive member through said projection optical system.
Claim 50
Independent Claim
121 words
A method for making a scanning exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection system by synchronously moving said substrate and said mask in respective scanning directions, the method comprising: providing a mask stage, disposed on the object plane side of said projection system, which is movable in said scanning direction while holding said mask; and providing a reference mark member, disposed on said mask stage and arranged within an approach run section of said mask stage, which has a reference mark, wherein said approach run section of said mask stage is passed through an illumination area of an exposure light at the time of acceleration or deceleration movement of said mask stage.
Claim 51
Independent Claim
121 words
A method for making a scanning exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection system by synchronously moving said substrate and said mask in respective scanning directions, the method comprising: providing a mask stage, disposed on the object plane side of said projection system, which is movable in said scanning direction while holding said mask; and providing a reference mark member, disposed on said mask stage and arranged within an approach run section of said mask stage, which has a reference mark, wherein said approach run section of said mask stage is passed through an illumination area of an exposure light at the time of acceleration or deceleration movement of said mask stage.
Claim 52
Independent Claim
112 words
A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection optical system, the method comprising: providing a projection optical system, disposed between said mask and said substrate, which projects an image of said pattern onto said substrate; providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask; providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask; and providing a driving device, connected to said reference mark member, which moves said reference mark member with respect to said mask stage.
Claim 53
Independent Claim
112 words
A method for making a projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a projection optical system, the method comprising: providing a projection optical system, disposed between said mask and said substrate, which projects an image of said pattern onto said substrate; providing a mask stage, disposed on the object plane side of said projection optical system, which supports said mask; providing a reference mark member, disposed on said mask stage, which has a reference mark and is different from said mask; and providing a driving device, connected to said reference mark member, which moves said reference mark member with respect to said mask stage.
Claim 54
Dependent Claim
16 words
The projection exposure method according to claim 6, wherein said resist image includes a latent image.
Claim 55
Dependent Claim
23 words
A projection exposure method according to claim 4, wherein said image formation characteristic other than the projection magnification and distortion includes a coma.
Claim 56
Dependent Claim
24 words
A projection exposure method according to claim 4, wherein said image formation characteristic other than the projection magnification and distortion includes a focus position.
Claim 57
Dependent Claim
28 words
A projection exposure method according to claim 4, further comprising: adjusting said projection system based on the obtained image formation characteristic other than the projection magnification and distortion.
Claim 58
Dependent Claim
28 words
A projection exposure method according to claim 41, wherein the adjusting of the projection system includes a movement of at least one of elements of the projection system.
Claim 59
Dependent Claim
31 words
A projection exposure method according to claim 42, wherein adjustment of a curvature of image plane may be performed by moving at least one of said elements of said projection system.
Claim 60
Dependent Claim
28 words
A projection exposure method according to claim 42, wherein adjustment of an astigmatism may be performed by moving at least one of said elements of said projection system.
Claim 61
Dependent Claim
39 words
A projection exposure method according to claim 41, wherein the adjusting of the projection system includes a change of a pressure in an enclosed space defined in said projection system or a composition of gas within said enclosed space.
Claim 62
Dependent Claim
27 words
A projection exposure method according to claim 4, further comprising: moving said mask based on the obtained image formation characteristic other than the projection magnification and distortion.
Claim 63
Dependent Claim
38 words
A projection exposure method according to claim 4, further comprising: disposing a glass plate between said mask and said substrate, which is formed in accordance with the obtained image formation characteristic other than the projection magnification and distortion.
Claim 64
Dependent Claim
23 words
A projection exposure method according to claim 4, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 65
Dependent Claim
32 words
A projection exposure method according to claim 48, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of movement of said mask.
Claim 66
Dependent Claim
35 words
A projection exposure method according to claim 48, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction intersecting a direction of movement of said mask.
Claim 67
Dependent Claim
58 words
A projection exposure method according to claim 48, wherein said reference mark member is arranged within an approach run section of said mask stage, and wherein said approach run section of said mask stage is passed through an illumination area of exposed light at the time of acceleration or deceleration movement of said mask stage for the exposure.
Claim 68
Dependent Claim
23 words
A projection exposure method according to claim 4, wherein said reference mark is detected at an image plane side of said projection system.
Claim 69
Dependent Claim
50 words
A protection exposure method according to claim 52, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 70
Dependent Claim
30 words
A projection exposure method according to claim 53, wherein an image formation position of said image of said reference mark is measured by detecting said image of said reference mark.
Claim 71
Dependent Claim
50 words
A projection exposure method according to claim 4, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 72
Dependent Claim
39 words
A projection exposure method according to claim 55, wherein said sensitive member comprises a sensitive substrate on which resist is applied, a resist image of said reference mark which is formed on said sensitive substrate by exposure being detected.
Claim 73
Dependent Claim
16 words
A projection exposure method according to claim 56, wherein said resist image comprises a latent image.
Claim 74
Dependent Claim
16 words
A projection exposure method according to claim 56, wherein said sensitive: member comprises an erasable device.
Claim 75
Dependent Claim
18 words
A projection exposure method according to claim 4, wherein said reference mark is detected while exchanging said mask.
Claim 76
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 4.
Claim 77
Dependent Claim
17 words
A projection exposure method according to claim 5, wherein the obtained information includes an image formation characteristic.
Claim 78
Dependent Claim
21 words
A projection exposure method according to claim 5, wherein the bobbin-type or the barrel-type distortion is adjusted by moving said mask.
Claim 79
Dependent Claim
23 words
A projection exposure method according to claim 5, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 80
Dependent Claim
33 words
A projection exposure method according to claim 5, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of synchronous movement of said mask.
Claim 81
Dependent Claim
23 words
A projection exposure method according to claim 5, wherein said reference mark is detected at an image plane side of said projection system.
Claim 82
Dependent Claim
50 words
A projection exposure method according to claim 65, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 83
Dependent Claim
50 words
A projection exposure method according to claim 5, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 84
Dependent Claim
39 words
A projection exposure method according to claim 67, wherein said sensitive member comprises a sensitive substrate on which resist is applied, a resist image of said reference mark which is formed on said sensitive substrate by exposure being detected.
Claim 85
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 5.
Claim 86
Dependent Claim
17 words
A projection exposure method according to claim 6, wherein said obtained information includes an image formation characteristic.
Claim 87
Dependent Claim
22 words
A projection exposure method according to claim 6, wherein a bobbin-type or a barrel-type distortion may be adjusted by moving said mask.
Claim 88
Dependent Claim
23 words
A projection exposure method according to claim 6, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 89
Dependent Claim
33 words
A projection exposure method according to claim 72, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of synchronous movement of said mask.
Claim 90
Dependent Claim
23 words
A projection exposure method according to claim 6, wherein said reference mark is detected at an image plane side of said projection system.
Claim 91
Dependent Claim
50 words
A projection exposure method according to claim 74, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 92
Dependent Claim
50 words
A projection exposure method according to claim 6, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 93
Dependent Claim
39 words
A projection exposure method according to claim 76, wherein said sensitive member comprises a sensitive substrate on which resist is applied, a resist image of said reference mark which is formed on said sensitive substrate by exposure being detected.
Claim 94
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 5.
Claim 95
Dependent Claim
17 words
A projection exposure method according to claim 7, wherein said obtained information includes an image formation characteristic.
Claim 96
Dependent Claim
19 words
A projection exposure method according to claim 7, wherein a distortion may be adjusted by disposing said glass plate.
Claim 97
Dependent Claim
23 words
A projection exposure method according to claim 7, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 98
Dependent Claim
33 words
A projection exposure method according to claim 81, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of synchronous movement of said mask.
Claim 99
Dependent Claim
23 words
A projection exposure method according to claim 7, wherein said reference mark is detected at an image plane side of said projection system.
Claim 100
Dependent Claim
50 words
A projection exposure method according to claim 83, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 101
Dependent Claim
30 words
A projection exposure method according to claim 84, wherein an image formation position of said image of said reference mark is measured by detecting said image of said reference mark.
Claim 102
Dependent Claim
50 words
A projection exposure method according to claim 7, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 103
Dependent Claim
39 words
A projection exposure method according to claim 86, wherein said sensitive member comprises a sensitive substrate on which resist is applied, a resist image of said reference mark which is formed on said sensitive substrate by exposure being detected.
Claim 104
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 7.
Claim 105
Dependent Claim
17 words
A projection exposure method according to claim 8, wherein said obtained information includes an image formation characteristic.
Claim 106
Dependent Claim
23 words
A projection exposure method according to claim 8, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 107
Dependent Claim
33 words
A projection exposure method according to claim 90, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of synchronous movement of said mask.
Claim 108
Dependent Claim
23 words
A projection exposure method according to claim 8, wherein said reference mark is detected at an image plane side of said projection system.
Claim 109
Dependent Claim
50 words
A projection exposure method according to claim 92, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 110
Dependent Claim
50 words
A projection exposure method according to claim 8, wherein detection, of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 111
Dependent Claim
39 words
A projection exposure method according to claim 94, wherein said sensitive member comprises a sensitive substrate on which resist is applied, a resist image of said reference mark which is formed on said sensitive substrate by exposure being detected.
Claim 112
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 8.
Claim 113
Dependent Claim
23 words
A projection exposure method according to claim 9, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 114
Dependent Claim
32 words
A projection exposure method according to claim 97, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of movement of said mask.
Claim 115
Dependent Claim
23 words
A projection exposure method according to claim 9, wherein said reference mark is detected at an image plane side of said projection system.
Claim 116
Dependent Claim
50 words
A projection exposure method according to claim 99, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 117
Dependent Claim
50 words
A projection exposure method according to claim 9, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 118
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 9.
Claim 119
Dependent Claim
24 words
A projection exposure method according to claim 12, further comprising: obtaining an image formation characteristic based on information obtained by detecting said reference mark.
Claim 120
Dependent Claim
23 words
A projection exposure method according to claim 12, further comprising: adjusting said projection system based on information obtained by detecting said reference mark.
Claim 121
Dependent Claim
28 words
A projection exposure method according to claim 104, wherein the adjusting of the projection system includes a movement of at least one of elements of the projection system.
Claim 122
Dependent Claim
39 words
A projection exposure method according to claim 105, wherein the adjusting of the projection system includes a change of a pressure in an enclosed space defined in said projection system or a composition of gas within said enclosed space.
Claim 123
Dependent Claim
22 words
A projection exposure method according to claim 12, further comprising: moving said mask based on information obtained by detecting said reference mark.
Claim 124
Dependent Claim
33 words
A projection exposure method according to claim 12, further comprising: disposing a glass plate between said mask and said substrate, which is formed in accordance with information obtained by detecting said reference mark.
Claim 125
Dependent Claim
23 words
A projection exposure method according to claim 12, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 126
Dependent Claim
31 words
A projection exposure method according to claim 109 wherein said reference member includes a plurality of marks which are spaced from each other in a direction of movement of said mask.
Claim 127
Dependent Claim
23 words
A projection exposure method according to claim 12, wherein said reference mark is detected at an image plane side of said projection system.
Claim 128
Dependent Claim
50 words
A projection exposure method according to claim 111, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 129
Dependent Claim
50 words
A projection exposure method according to claim 12, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 130
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 12.
Claim 131
Dependent Claim
33 words
A projection exposure method according to claim 14, wherein an image of said reference mark member is projected by irradiating an exposure beam from an exposure illumination system onto said reference mark member.
Claim 132
Dependent Claim
23 words
A projection exposure method according to claim 14, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 133
Dependent Claim
31 words
A projection exposure method according to claim 116, wherein said reference member includes a plurality of marks which are spaced from each other in a direction of movement of said mask.
Claim 134
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 14.
Claim 135
Dependent Claim
39 words
A projection exposure method according to claim 26, wherein the adjusting of the projection system includes a change of a pressure in an enclosed space defined in said projection system or a composition of gas within said enclosed space.
Claim 136
Dependent Claim
23 words
A projection exposure method according to claim 24, wherein said reference mark is detected at an image plane side of said projection system.
Claim 137
Dependent Claim
50 words
A projection exposure method according to claim 120, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 138
Dependent Claim
50 words
A projection exposure method according to claim 24, wherein detection of said reference mark includes detection of an image of said reference mark formed on a sensitive member which is disposed at an image plane side of said projection system by projecting said sensitive member through said reference mark member.
Claim 139
Dependent Claim
13 words
A method for manufacturing a device using the method according to claim 24.
Claim 140
Dependent Claim
19 words
A method according to claim 35, wherein said sensitive member comprises a sensitive substrate on which resist is applied.
Claim 141
Dependent Claim
26 words
A method according to claim 35, wherein an image formation characteristic is obtained by detecting the image of said reference mark formed on the sensitive member.
Claim 142
Dependent Claim
29 words
A method according to claim 35, wherein said projection system is adjusted based on information obtained by detecting the image of said reference mark formed on the sensitive member.
Claim 143
Dependent Claim
28 words
A method according to claim 35, wherein said mask is moved based on information obtained by detecting the image of said reference mark formed on the sensitive member.
Claim 144
Dependent Claim
21 words
A method according to claim 35, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 145
Dependent Claim
30 words
A method according to claim 128, wherein said reference mark member includes a plurality of marks which are spaced from each other in a direction of movement of said mask.
Claim 146
Dependent Claim
17 words
A method for manufacturing a device using the device made by the method according to claim 35.
Claim 147
Dependent Claim
17 words
A method according to claim 36, further comprising: providing a detecting system which detects the reference mark.
Claim 148
Dependent Claim
18 words
A method according to claim 131, wherein an image formation characteristic is obtained by detecting the reference mark.
Claim 149
Dependent Claim
31 words
A method according to claim 131, further comprising: providing an adjusting system, functionally connected with said detecting system, which adjusts said projection system based on information obtained by the detecting system.
Claim 150
Dependent Claim
30 words
A method according to claim 131, further comprising: providing a driving system, functionally connected with said detecting system, which moves said mask based on information obtained by the detecting system.
Claim 151
Dependent Claim
31 words
A method according to claim 131, further comprising: providing a glass plate disposed between said mask and said substrate, which is formed in accordance with information obtained by the detecting system.
Claim 152
Dependent Claim
23 words
A method according to claim 131, wherein said detecting system detects said reference mark at an image plane side of said projection system.
Claim 153
Dependent Claim
48 words
A method according to claim 136, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 154
Dependent Claim
21 words
A method according to claim 36, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 155
Dependent Claim
29 words
A method according to claim 138, wherein said reference mark member includes a plurality of marks which are spaced from each other in the scanning direction of said marks.
Claim 156
Dependent Claim
16 words
A method for manufacturing device using the device made by the method according to claim 36.
Claim 157
Independent Claim
96 words
A method for making a projection exposure apparatus in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: providing a mask stage, disposed on the object plane side of said projection system, which holds said mask; providing a reference mark member disposed on said mask stage, which has a reference mark; and providing a detecting system which detects the reference mark of said reference mark member through the projection system to obtain an image formation characteristic other than a projection magnification and distortion.
Claim 158
Independent Claim
96 words
A method for making a projection exposure apparatus in which an image of a pattern formed on a mask is projected onto a substrate through a projection system, the method comprising: providing a mask stage, disposed on the object plane side of said projection system, which holds said mask; providing a reference mark member disposed on said mask stage, which has a reference mark; and providing a detecting system which detects the reference mark of said reference mark member through the projection system to obtain an image formation characteristic other than a projection magnification and distortion.
Claim 159
Dependent Claim
21 words
A method according to claim 141, wherein said image formation characteristic other than the projection magnification and distortion includes a coma.
Claim 160
Dependent Claim
22 words
A method according to claim 141, wherein said image formation characteristic other than the projection magnification and distortion includes a focus position.
Claim 161
Dependent Claim
30 words
A method according to claim 141, further comprising: providing an adjusting system, functionally connected with said detecting system, which adjusts the projection system based on the obtained image formation characteristic.
Claim 162
Dependent Claim
20 words
A method according to claim 144, wherein said adjusting system moves at least one of elements of the projection system.
Claim 163
Dependent Claim
31 words
A method according to claim 144, wherein the adjusting system changes a pressure in an enclosed space defined in said projection system or a composition of gas within said enclosed space.
Claim 164
Dependent Claim
29 words
A method according to claim 141, further comprising: providing a driving system, functionally connected with said detecting system, which moves said mask based on the obtained image formation characteristic.
Claim 165
Dependent Claim
30 words
A method according to claim 147, further comprising: providing a glass plate disposed between said mask and said substrate, which is formed in accordance with the obtained image formation characteristic.
Claim 166
Dependent Claim
21 words
A method according to claim 141, wherein said mask and said substrate are moved synchronously during an exposure of said substrate.
Claim 167
Dependent Claim
31 words
A method according to claim 149, wherein said reference mark member includes a plurality of marks which are spaced apart from each other in a direction of movement of said mask.
Claim 168
Dependent Claim
23 words
A method according to claim 141, wherein said detecting system detects said reference mark on an image plane side of said projection system.
Claim 169
Dependent Claim
48 words
A method according to claim 151, wherein exposure light is irradiated onto said reference mark to form an image of said reference mark at said image plane side of said projection system, so that said reference mark is detected at said image plane side of said projection system.
Claim 170
Dependent Claim
17 words
A method for manufacturing a device using the device made by the method according to claim 41.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-11-21 | 2004-05-22 | 2004-11-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-11-21 | 2008-05-22 | 2008-11-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-11-21 | 2012-05-22 | 2012-11-21 | $7700.00 | Window Closed / Lapsed |