Claims Analysis
Total Claims: 21
Claim 1
Independent Claim
24 words
A nonvolatile memory cell comprising: a bidirectionally conducting nonlinear resistance selection device; and a magneto-resistive element electrically coupled in series with the selection device.
Claim 2
Dependent Claim
24 words
A nonvolatile memory cell comprising: a bidirectionally conducting nonlinear resistance selection device; and a magneto-resistive element electrically coupled in series with the selection device.
Claim 3
Dependent Claim
37 words
The nonvolatile memory cell according to claim 1, wherein the selection device has a reverse bias turn-on voltage and a forward bias turn-on voltage, the reverse bias turn-on voltage being less than the forward bias turn-on voltage.
Claim 4
Dependent Claim
18 words
The nonvolatile memory cell according to claim 1, wherein the magneto-resistive element is a magnetic tunnel junction device.
Claim 5
Dependent Claim
17 words
The nonvolatile memory cell according to claim 1, wherein the selection device is a unipolar barrier device.
Claim 6
Dependent Claim
16 words
The nonvolatile memory cell according to claim 4, wherein the selection device is a Camel diode.
Claim 7
Dependent Claim
69 words
The nonvolatile memory cell according to claim 5, wherein the memory cell is formed on a substrate, and wherein the Camel diode includes a word line formed from an n + -type doped region in the substrate, a first n-type region formed on the word line, a p + -type region formed on the first n-type region, and a second n-type region formed on the p + -type region.
Claim 8
Dependent Claim
18 words
The nonvolatile memory cell according to claim 4, wherein the selection device is a planar doped barrier device.
Claim 9
Dependent Claim
90 words
The nonvolatile memory cell according to claim 7, wherein the memory cell is formed on a substrate, and wherein the planar doped barrier device includes a word line formed from an n + -type doped region in the substrate, a first n - -type region formed on the word line, a p + -type region formed on the first n - -type region, a second n - -type region formed on the p + -type region, and an n + -type region formed on the second n - -type region.
Claim 10
Dependent Claim
16 words
The nonvolatile memory cell according to claim 4, wherein the selection device is a backward diode.
Claim 11
Dependent Claim
48 words
The nonvolatile memory cell according to claim 9, wherein the memory cell is formed on a substrate, and wherein the backward diode includes a word line formed from an n + -type doped region in the substrate, and a p + -type region formed on the word line.
Claim 12
Dependent Claim
17 words
The nonvolatile memory cell according to claim 1, wherein the selection device has a symmetrical current-voltage characteristic.
Claim 13
Dependent Claim
37 words
The nonvolatile memory cell according to claim 11, wherein the selection device has a reverse bias turn-on voltage and a forward bias turn-on voltage, the reverse bias turn-on voltage being less than the forward bias turn-on voltage.
Claim 14
Dependent Claim
18 words
The nonvolatile memory cell according to claim 11, wherein the magneto-resistive element is a magnetic tunnel junction device.
Claim 15
Dependent Claim
17 words
The nonvolatile memory cell according to claim 11, wherein the selection device is a unipolar barrier device.
Claim 16
Dependent Claim
16 words
The nonvolatile memory cell according to claim 14, wherein the selection device is a Camel diode.
Claim 17
Dependent Claim
69 words
The nonvolatile memory cell according to claim 15, wherein the memory cell is formed on a substrate, and wherein the Camel diode includes a word line formed from an n + -type doped region in the substrate, a first n-type region formed on the word line, a p + -type region formed on the first n-type region, and a second n-type region formed on the p + -type region.
Claim 18
Dependent Claim
18 words
The nonvolatile memory cell according to claim 14, wherein the selection device is a planar doped barrier device.
Claim 19
Dependent Claim
90 words
The nonvolatile memory cell according to claim 17, wherein the memory cell is formed on a substrate, and wherein the planar doped barrier device includes a word line formed from an n + -type doped region in the substrate, a first n - -type region formed on the word line, a p + -type region formed on the first n - -type region, a second n - -type region formed on the p + -type region, and an n + -type region formed on the second n - -type region.
Claim 20
Dependent Claim
16 words
The nonvolatile memory cell according to claim 14, wherein the selection device is a backward diode.
Claim 21
Dependent Claim
48 words
The nonvolatile memory cell according to claim 19, wherein the memory cell is formed on a substrate, and wherein the backward diode includes a word line formed from an n + -type doped region in the substrate, and a p + -type region formed on the word line.