US6093520A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High aspect ratio microstructures and methods for manufacturing microstructures
Assignee: Louisiana State University
•
Filing: 1994-09-09
•
Granted: 2000-07-25
•
Expires: 2014-09-09
Abstract
Abstract A method is disclosed for the manufacture of microstructures and devices. The method is relatively easy to implement, and has the capability to produce features having a resolution of ten microns or smaller with a high aspect ratio (60, 75, 100, 200, or even higher). A master mask, appropriately designed and fabricated, is used in an initial exposure step with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam to make a "transfer mask" directly on the surface of the sample. It is not necessary to produce an expensive x-ray master mask, even if x-ray exposure of the sample is desired. There is no necessity for gap control during exposure of the resist through the transfer mask. The resulting structures may, if desired, have a higher aspect ratio than microstructures that have previously been produced through other methods. The "transfer mask" is not a unit separate from the sample, but is formed directly on the surface of each sample. A conventional-type master mask is used to form the "transfer mask" with visible light, ultraviolet light, x-rays, an electron beam, or an ion beam. The total cost is determined primarily by the cost of the master mask. Because the master mask can be a conventional-type optical mask, the high cost of producing a conventional x-ray mask can be avoided. The "master mask" is used to form a "transfer mask" on each sample individually. The patterned transfer mask comprises a thin layer of an absorber of the radiation to be used in the final exposure. For example, if the final exposure is to be performed with soft x-rays, the transfer mask may be formed from an x-ray absorber such as a patterned layer of gold. The transfer mask is then used in one or more separate exposures of the underlying resist. An analogous method may be used for radiation-assisted chemistry, such as etching or deposition, on the surface of a sample.
Inventors
- 👤 Yuli Vladimirsky
- 👤 Olga Vladimirsky
- 👤 Volker Saile
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 11:58
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0017; G03F7/004; G03F7/09; G03F7/094; G03F7/095; G03F7/11; Y; Y10; Y10S; Y10S430/00; Y10S430/143; Y10S430/167; Y10S430/168
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
276 words
A method for fabricating a selected pattern at least 6 microns thick in a resist at least 6 microns thick; wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and wherein said method comprises the steps of: (a) forming a transfer mask lithographically, wherein the transfer mask adheres to the surface of the resist, wherein the transfer mask comprises portions that correspond to the pattern and that are opaque to radiation to which the resist is sensitive, wherein the transfer mask comprises other portions that are transparent to radiation to which the resist is sensitive, wherein the opaque portions corresponding to the pattern have either a positive tone or a negative tone relative to the pattern, wherein the resist has a positive tone if the opaque portions of the pattern have a positive tone relative to the pattern, wherein the resist has a negative tone if the opaque portions of the pattern have a negative tone relative to the pattern; (b) exposing the resist and the transfer mask to radiation to which the resist is sensitive, whereby portions of the resist underlying the opaque portions of the transfer mask are not exposed to the radiation, and whereby portions of the resist underlying the transparent portions of the transfer mask are exposed to the radiation; and (c) developing the resist to selectively remove the radiation-exposed portions of the resist if the resist has a positive tone; or to selectively remove the unexposed portions of the resist if the resist has a negative tone; whereby the pattern is formed in the resist.
Claim 2
Independent Claim
276 words
A method for fabricating a selected pattern at least 6 microns thick in a resist at least 6 microns thick; wherein the pattern comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater; and wherein said method comprises the steps of: (a) forming a transfer mask lithographically, wherein the transfer mask adheres to the surface of the resist, wherein the transfer mask comprises portions that correspond to the pattern and that are opaque to radiation to which the resist is sensitive, wherein the transfer mask comprises other portions that are transparent to radiation to which the resist is sensitive, wherein the opaque portions corresponding to the pattern have either a positive tone or a negative tone relative to the pattern, wherein the resist has a positive tone if the opaque portions of the pattern have a positive tone relative to the pattern, wherein the resist has a negative tone if the opaque portions of the pattern have a negative tone relative to the pattern; (b) exposing the resist and the transfer mask to radiation to which the resist is sensitive, whereby portions of the resist underlying the opaque portions of the transfer mask are not exposed to the radiation, and whereby portions of the resist underlying the transparent portions of the transfer mask are exposed to the radiation; and (c) developing the resist to selectively remove the radiation-exposed portions of the resist if the resist has a positive tone; or to selectively remove the unexposed portions of the resist if the resist has a negative tone; whereby the pattern is formed in the resist.
Claim 3
Dependent Claim
40 words
A method as recited in claim 1, wherein the resist has a positive tone, wherein the opaque portions of the pattern have a positive tone relative to the pattern, and wherein the opaque portions of the transfer mask comprise gold.
Claim 4
Dependent Claim
40 words
A method as recited in claim 1, wherein the resist has a negative tone, wherein the opaque portions of the pattern have a negative tone relative to the pattern, and wherein the opaque portions of the transfer mask comprise tungsten.
Claim 5
Dependent Claim
42 words
A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times, and wherein the transfer mask is in the same position relative to the resist during each of said exposing steps.
Claim 6
Dependent Claim
46 words
A method as recited in claim 1, wherein during said exposure step the position of the resist is scanned relative to the position of the radiation, or wherein during said exposure step the position of the radiation is scanned relative to the position of the resist.
Claim 7
Dependent Claim
46 words
A method as recited in claim 1, wherein during said exposure step the position of the resist is rotated relative to the position of the radiation, or wherein during said exposure step the position of the radiation is rotated relative to the position of the resist.
Claim 8
Dependent Claim
78 words
A method as recited in claim 1, wherein the transfer mask additionally comprises portions that are semi-opaque to radiation to which the resist is sensitive, whereby in said exposing step portions of the resist underlying the semi-opaque portions of the transfer mask are partially exposed to radiation; and whereby in said developing step the partially-exposed portions of the resist are removed to a lesser depth than the depth to which the fully-exposed portions of the resist are removed.
Claim 9
Dependent Claim
12 words
A method as recited in claim 1, wherein the radiation comprises x-rays.
Claim 10
Dependent Claim
13 words
A method as recited in claim 1, wherein the radiation comprises visible light.
Claim 11
Dependent Claim
13 words
A method as recited in claim 1, wherein the radiation comprises ultraviolet light.
Claim 12
Dependent Claim
14 words
A method as recited in claim 1, wherein the radiation comprises an electron beam.
Claim 13
Dependent Claim
14 words
A method as recited in claim 1, wherein the radiation comprises an ion beam.
Claim 14
Dependent Claim
24 words
A method as recited in claim 1, additionally comprising the step of removing the transfer mask after the pattern is formed in the resist.
Claim 15
Dependent Claim
24 words
A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask is 90°.
Claim 16
Dependent Claim
26 words
A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask is less than 90°.
Claim 17
Dependent Claim
29 words
A method as recited in claim 1, wherein the angle of incidence of the radiation on the surface of the transfer mask changes with time during said exposing step.
Claim 18
Dependent Claim
23 words
A method as recited in claim 1, wherein the surface of the transfer mask and the surface of the resist are not flat.
Claim 19
Dependent Claim
27 words
A method as recited in claim 1, wherein the shape of the transfer mask and the shape of the resist change with time during said exposing step.
Claim 20
Dependent Claim
36 words
A method as recited in claim 1, wherein the pattern fabricated in the resist comprises at least one feature having a resolution of 10 microns or smaller and having an aspect ratio of 60 or greater.
Claim 21
Dependent Claim
62 words
A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times; wherein the transfer mask is in the same position relative to the resist during each of said exposing steps; and wherein the angle of incidence of the radiation on the surface of the transfer mask changes between said exposing steps.
Claim 22
Dependent Claim
41 words
A method as recited in claim 1, wherein said exposing step and said developing step are each repeated a plurality of times, and wherein the shape of the transfer mask and the shape of the resist change between said exposing steps.
References Cited (Backward Citations)
US4165395A
Cited
WO1987006029A2
Cited
JPH01140722A
Cited
EP0363547A1
Cited
US5624791A
Cited
US5334467A
Cited
EP0599539A2
Cited
US5468595A
Cited
US5512395A
Cited
US5554484A
Cited
US5591564A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2003-07-25 | 2004-01-24 | 2004-07-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2007-07-25 | 2008-01-24 | 2008-07-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2011-07-25 | 2012-01-24 | 2012-07-25 | $7700.00 | Window Closed / Lapsed |