Array substrate for display device and manufacturing method thereof

Claim 1

A method of manufacturing an array substrate for a display device including a plurality of scanning lines on a substrate, thin film transistors each having a first insulator film on a corresponding one of said lines, a semiconductor film thereon, a channel protective film on said semiconductor film, and source and drain electrodes electrically connected to said semiconductor film, a plurality of signal lines as each being taken out of the respective drain electrode to extend substantially perpendicularly to said scanning lines, and pixel electrodes each being electrically connected to the respective source electrode, said method comprising the steps of: forming a first wiring line layer including said scanning lines on said substrate; depositing said first insulator film and a semiconductor coated film; depositing a metal thin film on said semiconductor coated film; patterning a multi-layer film comprising at least said metal thin film and said semiconductor layer for said semiconductor film using a mask, thereby forming a second wiring line layer which includes said signal lines, said source electrodes and said drain electrodes and further forming said semiconductor film; depositing a second insulator film and forming first contact holes in said second insulator film corresponding to each said source electrode; and forming said pixel electrodes each being electrically connected to said respective source electrode through respective ones of said contact holes and overlapping at least one of said scanning lines with the first and second insulator films.

Claim 2

A method of manufacturing an array substrate for a display device including a plurality of scanning lines on a substrate, thin film transistors each having a first insulator film on a corresponding one of said lines, a semiconductor film thereon, a channel protective film on said semiconductor film, and source and drain electrodes electrically connected to said semiconductor film, a plurality of signal lines as each being taken out of the respective drain electrode to extend substantially perpendicularly to said scanning lines, and pixel electrodes each being electrically connected to the respective source electrode, said method comprising the steps of: forming a first wiring line layer including said scanning lines on said substrate; depositing said first insulator film and a semiconductor coated film; depositing a metal thin film on said semiconductor coated film; patterning a multi-layer film comprising at least said metal thin film and said semiconductor layer for said semiconductor film using a mask, thereby forming a second wiring line layer which includes said signal lines, said source electrodes and said drain electrodes and further forming said semiconductor film; depositing a second insulator film and forming first contact holes in said second insulator film corresponding to each said source electrode; and forming said pixel electrodes each being electrically connected to said respective source electrode through respective ones of said contact holes and overlapping at least one of said scanning lines with the first and second insulator films.

Claim 9

A method of manufacturing an array substrate for a display device including a plurality of scanning lines on a substrate, thin film transistors each having a first insulator film on a corresponding one of said lines, a semiconductor film thereon, a channel protective film on said semiconductor film, and source electrodes and drain electrodes electrically connected to said semiconductor film, a plurality of signal lines as each being taken out of the respective drain electrode to extend substantially perpendicularly to said scanning lines, and pixel electrodes each being electrically connected to the respective source electrode comprising: a first step of forming said scanning lines; a second step of depositing said first insulator film and a semiconductor coated film; a third step of depositing a metal thin film on said semiconductor coated film and patterning a multi-layer film comprising at least said metal thin film and said semiconductor film using a mask, thereby forming a second wiring line layer which includes said signal lines, said source electrodes and said drain electrodes and forming said semiconductor film; a fourth step of depositing a second insulator film and forming first contact holes in said second insulator film corresponding to said source electrode; and a fifth step of forming said pixel electrodes each being electrically coupled through a respective one of said contact holes to said respective source electrode and overlapping another scanning line with the first and second insulator films, said method further comprising the steps of: depositing said first insulator film and said semiconductor coated film simultaneously with said second step; forming light shield layers by patterning said multi-layer film using said mask simultaneously with said third step, said light shielding layers overlapping said scanning lines via said first insulator film; and forming said pixel electrode so as to overlap said light shield layers via said second insulator film.

Claim 10

A method of manufacturing an array substrate for a display device including a plurality of scanning lines on a substrate, thin film transistors each having a first insulator film on a corresponding one of said lines, a semiconductor film thereon, a channel protective film on said semiconductor film, and source electrodes and drain electrodes electrically connected to said semiconductor film, a plurality of signal lines as each being taken out of the respective drain electrode to extend substantially perpendicularly to said scanning lines, and pixel electrodes each being electrically connected to the respective source electrode comprising: a first step of forming said scanning lines; a second step of depositing said first insulator film and a semiconductor coated film; a third step of depositing a metal thin film on said semiconductor coated film and patterning a multi-layer film comprising at least said metal thin film and said semiconductor film using a mask, thereby forming a second wiring line layer which includes said signal lines, said source electrodes and said drain electrodes and forming said semiconductor film; a fourth step of depositing a second insulator film and forming first contact holes in said second insulator film corresponding to said source electrode; and a fifth step of forming said pixel electrodes each being electrically coupled through a respective one of said contact holes to said respective source electrode and overlapping another scanning line with the first and second insulator films, said method further comprising the steps of: depositing said first insulator film and said semiconductor coated film simultaneously with said second step; forming light shield layers by patterning said multi-layer film using said mask simultaneously with said third step, said light shielding layers overlapping said scanning lines via said first insulator film; and forming said pixel electrode so as to overlap said light shield layers via said second insulator film.