US5952047A
Expired / Lapsed
US
⏱️ 0.0 years remaining
CVD precursors and film preparation method using the same
Assignee: Dowa Holdings Co Ltd
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Filing: 1998-03-26
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Granted: 1999-09-14
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Expires: 2018-03-26
Abstract
Abstract A CVD precursor that is a precursor in film preparation by the CVD method, comprising a metalorganic compound containing a metal element constituting the film (called "main compound") having blended therewith another organic compound, the other organic compound having a lower vapor pressure than the main compound at a precursor vaporization temperature and when blended with the main compound forming a fusible blend having a lower melting point than the melting point of the main compound. In particular, when the main compound has the structural formula Ma(DPM) 2 (Ma being representing an alkaline earth metal), Ma(TMOD) 2 or Ma(TMND) 2 is blended therewith.
Inventors
- 👤 Yuzo Tasaki
- 👤 Mamoru Sato
- 👤 Shuji Yoshizawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:22
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/40; C23C16/409; C07; C07F; C07F3/00; C07F3/003; C23C16/06; C23C16/18
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
150 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex with a second metalorganic complex which is other than the first metalorganic complex, wherein the first metalorganic complex contains a metal element constituting the film and has a melting point of not lower than 200° C., and wherein the second metalorganic complex has a vapor pressure at a use temperature lower than the vapor pressure of the first metalorganic complex at the use temperature and a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic organic complex; and, vaporizing the molten blend.
Claim 2
Independent Claim
150 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex with a second metalorganic complex which is other than the first metalorganic complex, wherein the first metalorganic complex contains a metal element constituting the film and has a melting point of not lower than 200° C., and wherein the second metalorganic complex has a vapor pressure at a use temperature lower than the vapor pressure of the first metalorganic complex at the use temperature and a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic organic complex; and, vaporizing the molten blend.
Claim 3
Independent Claim
145 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex with a second metalorganic complex which is other than the first metalorganic complex, wherein the first metalorganic complex has a β-diketone ligand and a metal element constituting the film, and wherein the second metalorganic complex has a β-diketone ligand, a vapor pressure at a use temperature lower than the vapor pressure of the first metalorganic complex at the use temperature and a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic complex; and, vaporizing the molten blend.
Claim 4
Independent Claim
145 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex with a second metalorganic complex which is other than the first metalorganic complex, wherein the first metalorganic complex has a β-diketone ligand and a metal element constituting the film, and wherein the second metalorganic complex has a β-diketone ligand, a vapor pressure at a use temperature lower than the vapor pressure of the first metalorganic complex at the use temperature and a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic complex; and, vaporizing the molten blend.
Claim 5
Dependent Claim
21 words
The method according to claim 2, wherein the first metalorganic complex has a melting point of not lower than 200° C.
Claim 6
Independent Claim
133 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex comprising an alkaline earth metal with a second metalorganic complex comprising an alkaline earth metal, wherein the second metalorganic complex has a vapor pressure at a use temperature lower than a vapor pressure of the first metalorganic complex at the use temperature, and wherein the second metalorganic complex has a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic complex; and, vaporizing the molten blend.
Claim 7
Independent Claim
133 words
A method for manufacturing a film using chemical-vapor deposition, the method comprising the steps of: blending a first metalorganic complex comprising an alkaline earth metal with a second metalorganic complex comprising an alkaline earth metal, wherein the second metalorganic complex has a vapor pressure at a use temperature lower than a vapor pressure of the first metalorganic complex at the use temperature, and wherein the second metalorganic complex has a melting point lower than a melting point of the first metalorganic complex, heating the blend to a temperature not higher than the melting point of the first metalorganic complex and not lower than the melting point of the blend, thereby forming a molten blend having a lower melting temperature than the melting point of the first metalorganic complex; and, vaporizing the molten blend.
Claim 8
Dependent Claim
42 words
The method according to claim 4, wherein the first metalorganic complex is Ba(DPM) 2 or Sr(DPM) 2 and the second metalorganic complex is selected from the group consisting of Ba(TMOD) 2 , Sr(TMOD) 2 , Sr(TMND) 2 , and Ba(TMND) 2 .
References Cited (Backward Citations)
US5090985A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-09-13 | 2003-03-15 | 2003-09-14 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-09-13 | 2007-03-15 | 2007-09-14 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-09-13 | 2011-03-15 | 2011-09-14 | $7700.00 | Window Closed / Lapsed |