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US5901271A
Expired / Lapsed
US
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Process of evaporating a liquid in a cyclone evaporator
Assignee: Novellus Systems Inc
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Filing: 1997-02-26
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Granted: 1999-05-04
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Expires: 2017-02-26
Abstract
Abstract A cyclone evaporator includes an evaporator body with an evaporation chamber therein. The evaporation chamber preferably includes a thermally conductive sidewall having a generally cylindrical upper portion and a downwardly tapered lower portion. The evaporator body further includes a cover having a vapor outlet opening into the evaporation chamber and an outlet tube. The outlet tube circumscribes the vapor outlet and extends into a lower portion of the evaporation chamber. A liquid precursor passage and a carrier gas passage extend through the evaporator body and open into the evaporation chamber. In one embodiment, the carrier gas passage is positioned to direct carrier gas parallel to liquid precursor flow and intersect the liquid precursor at a liquid precursor passage outlet within the evaporation chamber. In another embodiment, the carrier gas passage is positioned to direct carrier gas across an outlet of liquid precursor passage. In both embodiments, the carrier gas facilitates atomization of the liquid precursor and flows cyclonically to distribute the atomized liquid precursor within the evaporation chamber. The liquid precursor deposits on the thermally conductive evaporation chamber wall and evaporates to form a gas precursor. The gas precursor flows with the carrier gas and exits the cyclone evaporator through the outlet tube and the vapor outlet. The cyclone evaporator is particularly advantageous for evaporating low vapor pressure liquids useful in semiconductor fabrication processes such as chemical vapor deposition.
Inventors
- 👤 Jeffrey C. Benzing
- 👤 Edward J. McInerney
- 👤 Michael N. Susoeff
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 18:20
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/4481; H; H10; H10P; H10P14/00; H10P14/20; C23C16/4486
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
69 words
A process of evaporating a liquid in an evaporator, comprising: introducing a liquid precursor into the evaporator; introducing a carrier gas into the evaporator along a path generally tangent to a curved surface of the evaporator; entraining a portion of the liquid precursor in the carrier gas; depositing the entrained liquid precursor on a surface of the evaporator; and heating the evaporator surface to evaporate the deposited liquid precursor.
Claim 2
Dependent Claim
69 words
A process of evaporating a liquid in an evaporator, comprising: introducing a liquid precursor into the evaporator; introducing a carrier gas into the evaporator along a path generally tangent to a curved surface of the evaporator; entraining a portion of the liquid precursor in the carrier gas; depositing the entrained liquid precursor on a surface of the evaporator; and heating the evaporator surface to evaporate the deposited liquid precursor.
Claim 3
Dependent Claim
20 words
The process as in claim 1 further comprising: spreading the deposited liquid precursor into a film on the evaporator surface.
Claim 4
Dependent Claim
22 words
The process as in claim 2 wherein spreading the deposited liquid precursor includes shearing the deposited liquid precursor with the carrier gas.
Claim 5
Dependent Claim
26 words
The process as in claim 1 wherein introducing a carrier gas includes introducing the carrier gas at an approximately parallel, coincident orientation to the liquid precursor.
Claim 6
Dependent Claim
25 words
The process as in claim 1 wherein introducing a carrier gas includes introducing the carrier gas at an orientation approximately perpendicular to the liquid precursor.
Claim 7
Dependent Claim
50 words
The process as in claim 1 wherein introducing a liquid precursor includes introducing the liquid precursor under a pressure, and introducing a carrier gas includes introducing the carrier gas at an orientation to intersect the liquid precursor to create a Venturi effect to draw out and atomize the liquid precursor.
Claim 8
Dependent Claim
18 words
The process as in claim 1 wherein the liquid precursor is tetraethylorthosilicate, and the carrier gas is nitrogen.
Claim 9
Dependent Claim
116 words
A process of evaporating a liquid in an evaporator, such evaporator having a curved interior surface extending around a longitudinal axis, comprising: introducing liquid precursor droplets into the evaporator; introducing a flow of carrier gas into the evaporator; entraining a portion of the liquid precursor droplets in the carrier gas; accelerating the carrier gas flow angularly in the evaporator in a plane generally perpendicular to the longitudinal axis of the evaporator by causing the carrier gas to flow along the curved surface by momentum of carrier gas flow so as to deposit a film of the entrained liquid precursor on the curved surface; and heating the evaporator curved surface to evaporate the deposited liquid precursor film.
Claim 10
Dependent Claim
116 words
A process of evaporating a liquid in an evaporator, such evaporator having a curved interior surface extending around a longitudinal axis, comprising: introducing liquid precursor droplets into the evaporator; introducing a flow of carrier gas into the evaporator; entraining a portion of the liquid precursor droplets in the carrier gas; accelerating the carrier gas flow angularly in the evaporator in a plane generally perpendicular to the longitudinal axis of the evaporator by causing the carrier gas to flow along the curved surface by momentum of carrier gas flow so as to deposit a film of the entrained liquid precursor on the curved surface; and heating the evaporator curved surface to evaporate the deposited liquid precursor film.
Claim 11
Dependent Claim
57 words
A process as in claim 8 wherein the evaporator further includes a first region and a second region, and the liquid precursor and carrier gas are introduced into the first region, the process further comprising: creating a negative pressure gradient from the first region to the second region, wherein the carrier gas flows toward the second region.
Claim 12
Dependent Claim
28 words
A process as in claim 9, the process further comprising: maintaining an approximately constant angular acceleration of the carrier gas in the first region and the second region.
Claim 13
Dependent Claim
16 words
A process as in claim 9 wherein the carrier gas flows cyclonically toward the second region.
Claim 14
Dependent Claim
162 words
A process of evaporating a liquid in a chemical vapor deposition system having a liquid precursor source; a carrier gas source; an evaporator having a vapor outlet, a curved surface, a first region, and a second region; and a chemical vapor deposition reactor assembly, the process comprising: introducing a liquid precursor into the evaporator from the liquid precursor source; introducing a flow of carrier gas into the evaporator from the carrier gas source along a path generally tangent to the curved surface; entraining the liquid precursor in the carrier gas flow; accelerating the carrier gas angularly in the evaporator; creating a negative pressure gradient between the evaporator first region, the evaporator second region, and the chemical vapor deposition reaction assembly; spreading the entrained liquid precursor on the evaporator curved surface into a film; evaporating the liquid precursor film; and drawing the evaporated film of liquid precursor out of the evaporator through the evaporator vapor outlet into the chemical vapor deposition reactor assembly.
Claim 15
Dependent Claim
162 words
A process of evaporating a liquid in a chemical vapor deposition system having a liquid precursor source; a carrier gas source; an evaporator having a vapor outlet, a curved surface, a first region, and a second region; and a chemical vapor deposition reactor assembly, the process comprising: introducing a liquid precursor into the evaporator from the liquid precursor source; introducing a flow of carrier gas into the evaporator from the carrier gas source along a path generally tangent to the curved surface; entraining the liquid precursor in the carrier gas flow; accelerating the carrier gas angularly in the evaporator; creating a negative pressure gradient between the evaporator first region, the evaporator second region, and the chemical vapor deposition reaction assembly; spreading the entrained liquid precursor on the evaporator curved surface into a film; evaporating the liquid precursor film; and drawing the evaporated film of liquid precursor out of the evaporator through the evaporator vapor outlet into the chemical vapor deposition reactor assembly.
Claim 16
Dependent Claim
101 words
A process of evaporating a liquid in an evaporator, such evaporator having a longitudinal axis and an interior curved surface of rotation extending around the longitudinal axis, comprising: introducing liquid precursor droplets into the evaporator; introducing a carrier gas into the evaporator such that liquid precursor droplets are entrained in the carrier gas and such that carrier gas momentum carries the carrier gas along a curved surface of the evaporator creating cyclonic flow in the direction of the longitudinal axis and depositing the entrained liquid precursor on the curved surface; and heating the evaporator surface to evaporate the deposited liquid precursor.
Claim 17
Dependent Claim
101 words
A process of evaporating a liquid in an evaporator, such evaporator having a longitudinal axis and an interior curved surface of rotation extending around the longitudinal axis, comprising: introducing liquid precursor droplets into the evaporator; introducing a carrier gas into the evaporator such that liquid precursor droplets are entrained in the carrier gas and such that carrier gas momentum carries the carrier gas along a curved surface of the evaporator creating cyclonic flow in the direction of the longitudinal axis and depositing the entrained liquid precursor on the curved surface; and heating the evaporator surface to evaporate the deposited liquid precursor.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-05-03 | 2002-11-02 | 2003-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-05-03 | 2006-11-02 | 2007-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-05-03 | 2010-11-02 | 2011-05-04 | $7700.00 | Window Closed / Lapsed |