US5892572A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Projection exposure apparatus and method
Assignee: Nikon Corp
•
Filing: 1998-01-02
•
Granted: 1999-04-06
•
Expires: 2018-01-02
Abstract
Abstract A projection exposure apparatus has an exposure processing section for projecting and exposing an image of a pattern of a reticle on a photosensitive substrate, an environmental chamber for covering the exposure processing section and a fan unit for supplying a temperature-controlled gas to the environmental chamber. Exposure to the photosensitive substrate is carried out in a temperature-controlled atmosphere. The pressure of the gas in the environmental chamber is monitored by a pressure sensor. When the pressure is changed, the mixture ratio of the gas supplied to the environmental chamber is changed to keep the refractive index of the gas in the chamber constant thereby to prevent imaging characteristics of the projected image from deteriorating.
Inventors
- 👤 Kenji Nishi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 02:22
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/708; G03F7/70858; G03F7/70866; G03F7/70216; G03F7/70241
Claims Analysis
Total Claims: 105
Claim 1
Independent Claim
95 words
A projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system, and a chamber for covering said exposure processing section, comprising: at least one refractive index measuring unit that measures the actual refractive index of gas in said chamber and that generates a signal varied in accordance with the refractive index; and a refractive index control device that controls the refractive index of gas supplied to said chamber in response to at least one signal generated by said at least one refractive index measuring unit.
Claim 2
Dependent Claim
95 words
A projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system, and a chamber for covering said exposure processing section, comprising: at least one refractive index measuring unit that measures the actual refractive index of gas in said chamber and that generates a signal varied in accordance with the refractive index; and a refractive index control device that controls the refractive index of gas supplied to said chamber in response to at least one signal generated by said at least one refractive index measuring unit.
Claim 3
Dependent Claim
19 words
An apparatus according to claim 1, further comprising an atmospheric pressure sensor that measures atmospheric pressure in said chamber.
Claim 4
Dependent Claim
53 words
An apparatus according to claim 1, further comprising an atmospheric pressure sensor that measures atmospheric pressure in said chamber, wherein said refractive index control device controls the refractive index of the gas supplied to said chamber in accordance with a measurement result of said atmospheric pressure sensor and said at least one signal.
Claim 5
Dependent Claim
27 words
An apparatus according to claim 1, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism that supplies a temperature-controlled gas to said chamber.
Claim 6
Dependent Claim
27 words
An apparatus according to claim 4, wherein said refractive index control device controls the refractive index of the gas supplied to said chamber from said air-conditioning mechanism.
Claim 7
Dependent Claim
69 words
An apparatus according to claim 4, wherein said air-conditioning mechanism has a first supply source that emits air and a second supply source that emits a gas different from the air to supply a gas formed by the air and the gas different from the air to said chamber, and said refractive index control device adjusts the mixture ratio of said air to said gas different from the air.
Claim 8
Dependent Claim
43 words
An apparatus according to claim 1, wherein said refractive index control device is a mixture ratio control device that adjusts the mixture ratio of a plurality of gases of different types to control the refractive index of the gas supplied to said chamber.
Claim 9
Dependent Claim
32 words
An apparatus according to claim 7, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism, and wherein said air-conditioning mechanism diffuses the plurality of gases of different types.
Claim 10
Dependent Claim
46 words
An apparatus according to claim 1, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism, and wherein said refractive index control device controls said air-conditioning mechanism such that at least one of the temperature and humidity of the supplied gas is controlled.
Claim 11
Dependent Claim
212 words
A projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, an imaging characteristic adjusting section for adjusting imaging characteristics of said projection optical system, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, said projection exposure apparatus comprising: at least one refractive index measuring unit that measures a change in the actual refractive index of the gas in said chamber and that generates a signal varied in accordance with the chance in refractive index; a refractive index control device that controls the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in response to at least one signal generated by said at least one refractive index measuring unit; and a control section that controls said imaging characteristics adjusting section, using the gas whose refractive index is controlled, so as to correct a change of the imaging characteristics of said projection optical system due to factors other than the change in refractive index of the gas in said chamber.
Claim 12
Dependent Claim
212 words
A projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, an imaging characteristic adjusting section for adjusting imaging characteristics of said projection optical system, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, said projection exposure apparatus comprising: at least one refractive index measuring unit that measures a change in the actual refractive index of the gas in said chamber and that generates a signal varied in accordance with the chance in refractive index; a refractive index control device that controls the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in response to at least one signal generated by said at least one refractive index measuring unit; and a control section that controls said imaging characteristics adjusting section, using the gas whose refractive index is controlled, so as to correct a change of the imaging characteristics of said projection optical system due to factors other than the change in refractive index of the gas in said chamber.
Claim 13
Dependent Claim
50 words
An apparatus according to claim 10, wherein said factors are a change in temperature of said projection optical system due to the emission of said light and a change in intensity distribution of said light in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 14
Dependent Claim
126 words
A projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring the actual refractive index of the gas in said chamber, generating a signal that varies in accordance with the refractive index, and changing the refractive index of the gas in response to said signal; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 15
Dependent Claim
126 words
A projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring the actual refractive index of the gas in said chamber, generating a signal that varies in accordance with the refractive index, and changing the refractive index of the gas in response to said signal; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 16
Independent Claim
81 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system, and a chamber for covering said exposure processing section, the method comprising the steps of: measuring the actual refractive index of gas in said chamber and generating a signal that varies in accordance with the refractive index; and controlling the refractive index of gas supplied to said chamber in responses to the signal.
Claim 17
Independent Claim
81 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system, and a chamber for covering said exposure processing section, the method comprising the steps of: measuring the actual refractive index of gas in said chamber and generating a signal that varies in accordance with the refractive index; and controlling the refractive index of gas supplied to said chamber in responses to the signal.
Claim 18
Dependent Claim
17 words
A method according to claim 13, further comprising the step of measuring atmospheric pressure in said chamber.
Claim 19
Dependent Claim
33 words
A method according to claim 13, wherein said step of measuring the actual refractive index of the gas includes measuring the actual refractive index of a sample of the gas in said chamber.
Claim 20
Dependent Claim
49 words
A method according to claim 13, wherein said step of controlling the refractive index of the gas includes supplying a gas formed by air and a gas different from the air to said chamber, and adjusting the mixture ratio of said air to said gas different from the air.
Claim 21
Dependent Claim
30 words
A method according to claim 13, wherein said step of controlling the refractive index of the gas includes adjusting the mixture ratio of a plurality of gases of different types.
Claim 22
Dependent Claim
38 words
A method according to claim 17, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism, said method further comprising the step of diffusing the plurality of gases of different types with said air-conditioning mechanism.
Claim 23
Dependent Claim
46 words
A method according to claim 13, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism, said method further comprising the step of controlling said air-conditioning mechanism such that at least one of the temperature and humidity of the supplied gas is controlled.
Claim 24
Independent Claim
129 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing a pattern on a substrate, and a chamber for covering said exposure processing section, the method comprising the steps of: measuring a change in the actual refractive index of gas in said chamber and generating a signal that varies in accordance with the change in the refractive index; controlling the refractive index of gas supplied to said chamber in response to the signal; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 25
Independent Claim
129 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing a pattern on a substrate, and a chamber for covering said exposure processing section, the method comprising the steps of: measuring a change in the actual refractive index of gas in said chamber and generating a signal that varies in accordance with the change in the refractive index; controlling the refractive index of gas supplied to said chamber in response to the signal; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 26
Dependent Claim
50 words
A method according to claim 20, wherein said factors are a change in temperature of said projection optical system due to the emission of said light and a change in intensity distribution of said light in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 27
Independent Claim
125 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring the actual refractive index of the gas in said chamber, generating a signal that varies in accordance with the refractive index, and changing the refractive index of the gas in response to said signal; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 28
Independent Claim
125 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring the actual refractive index of the gas in said chamber, generating a signal that varies in accordance with the refractive index, and changing the refractive index of the gas in response to said signal; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 29
Dependent Claim
71 words
A projection exposure apparatus having an exposure processing section, said apparatus comprising: a chamber that covers said exposure processing section; a sensor that is disposed in said chamber and that measures a characteristic of gas in said chamber; and a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber in accordance with a measurement result of said sensor.
Claim 30
Dependent Claim
71 words
A projection exposure apparatus having an exposure processing section, said apparatus comprising: a chamber that covers said exposure processing section; a sensor that is disposed in said chamber and that measures a characteristic of gas in said chamber; and a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber in accordance with a measurement result of said sensor.
Claim 31
Dependent Claim
21 words
An apparatus according to claim 23, wherein said sensor is an atmospheric pressure sensor that measures atmospheric pressure in said chamber.
Claim 32
Dependent Claim
26 words
An apparatus according to claim 23, wherein said sensor is a refractive index monitor that measures the actual refractive index of the gas in said chamber.
Claim 33
Dependent Claim
72 words
An apparatus according to claim 23, wherein said sensor is constituted of a refractive index monitor that measures the actual refractive index of the gas in said chamber, said apparatus further comprises an atmospheric pressure sensor that measures atmospheric pressure in said chamber, and said refractive index control device controls the refractive index of the supplied gas in accordance with measurement results of said atmospheric pressure sensor and said refractive index monitor.
Claim 34
Dependent Claim
74 words
An apparatus according to claim 23, further comprising an air-conditioning mechanism, wherein said air-conditioning mechanism has a first supply source for emitting air and a second supply source for emitting a gas different from the air to supply a gas formed by the air and the gas different from the air to said chamber, and said refractive index control device adjusts the mixture ratio of said air to said gas different from the air.
Claim 35
Dependent Claim
40 words
An apparatus according to claim 23, wherein said refractive index control device is a mixture ratio control device that adjusts the mixture ratio of a plurality of gases of different types to control the refractive index of the supplied gas.
Claim 36
Dependent Claim
19 words
An apparatus according to claim 28, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism.
Claim 37
Dependent Claim
18 words
An apparatus according to claim 29, wherein said air-conditioning mechanism diffuses the plurality of gases of different types.
Claim 38
Dependent Claim
40 words
An apparatus according to claim 23, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism, and wherein said refractive index control device controls said air-conditioning mechanism such that the temperature of the supplied gas is controlled.
Claim 39
Dependent Claim
168 words
A projection exposure apparatus having an exposure processing section that includes a projection optical system for projecting and exposing an image of a pattern of a mask on a photosensitive substrate, said projection exposure apparatus comprising: a chamber that covers said exposure processing section; an imaging characteristic adjusting section that is connected to said projection optical system and that adjusts an imaging characteristic of said projection optical system; a sensor that is disposed in said chamber and that measures a change in a characteristic of gas in said chamber; a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber in accordance with a measurement result of said sensor; and a control section that is connected to said imaging characteristic adjusting section and that controls so as to correct a change of the imaging characteristic of said projection optical system due to factors other than a change in refractive index of the gas in said chamber.
Claim 40
Dependent Claim
168 words
A projection exposure apparatus having an exposure processing section that includes a projection optical system for projecting and exposing an image of a pattern of a mask on a photosensitive substrate, said projection exposure apparatus comprising: a chamber that covers said exposure processing section; an imaging characteristic adjusting section that is connected to said projection optical system and that adjusts an imaging characteristic of said projection optical system; a sensor that is disposed in said chamber and that measures a change in a characteristic of gas in said chamber; a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber in accordance with a measurement result of said sensor; and a control section that is connected to said imaging characteristic adjusting section and that controls so as to correct a change of the imaging characteristic of said projection optical system due to factors other than a change in refractive index of the gas in said chamber.
Claim 41
Dependent Claim
41 words
An apparatus according to claim 32, wherein said factors are a change in temperature of said projection optical system and a change in light intensity distribution in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 42
Dependent Claim
112 words
A projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and controlling the refractive index of the gas; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 43
Dependent Claim
112 words
A projection exposure apparatus having an exposure processing section for forming a pattern on a substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and controlling the refractive index of the gas; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 44
Independent Claim
132 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an mage of a pattern of a mask on a photosensitive substrate via a projection optical system, a chamber for covering said exposure processing section, and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, whereby said projection exposure apparatus performs exposure to said photosensitive substrate in a temperature-controlled atmosphere, the method comprising the steps of: measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; and controlling the refractive index of the gas supplied to said chamber from said air-conditioning mechanism in accordance with the measured characteristic of the gas by changing the humidity of the gas supplied to said chamber.
Claim 45
Independent Claim
132 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an mage of a pattern of a mask on a photosensitive substrate via a projection optical system, a chamber for covering said exposure processing section, and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, whereby said projection exposure apparatus performs exposure to said photosensitive substrate in a temperature-controlled atmosphere, the method comprising the steps of: measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; and controlling the refractive index of the gas supplied to said chamber from said air-conditioning mechanism in accordance with the measured characteristic of the gas by changing the humidity of the gas supplied to said chamber.
Claim 46
Dependent Claim
23 words
A method according to claim 35, wherein said step of measuring the characteristic of the gas includes measuring atmospheric pressure in said chamber.
Claim 47
Dependent Claim
31 words
A method according to claim 35, wherein said step of measuring the characteristic of the gas includes measuring the actual refractive index of a sample of the gas in said chamber.
Claim 48
Dependent Claim
38 words
A method according to claim 35, wherein said step of measuring the characteristic of the gas includes measuring the actual refractive index of a sample of the gas in said chamber and measuring atmospheric pressure in said chamber.
Claim 49
Dependent Claim
49 words
A method according to claim 35, wherein said step of controlling the refractive index of the gas includes supplying a gas formed by air and a gas different from the air to said chamber, and adjusting the mixture ratio of said air to said gas different from the air.
Claim 50
Dependent Claim
30 words
A method according to claim 35, wherein said step of controlling the refractive index of the gas includes adjusting the mixture ratio of a plurality of gases of different types.
Claim 51
Dependent Claim
23 words
A method according to claim 40, further comprising the step of diffusing the plurality of gases of different types with said air-conditioning mechanism.
Claim 52
Dependent Claim
24 words
A method according to claim 35, further comprising the step of controlling said air-conditioning mechanism such that the temperature of said gas is controlled.
Claim 53
Independent Claim
162 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, the method comprising the steps of: measuring a change in a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; controlling the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in accordance with the measured change in the characteristic by changing the humidity of the gas supplied to said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than a change in refractive index.
Claim 54
Independent Claim
162 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, the method comprising the steps of: measuring a change in a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; controlling the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in accordance with the measured change in the characteristic by changing the humidity of the gas supplied to said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than a change in refractive index.
Claim 55
Dependent Claim
50 words
A method according to claim 43, wherein said factors are a change in temperature of said projection optical system due to the emission of said light and a change in intensity distribution of said light in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 56
Independent Claim
132 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and controlling the refractive index of the gas by changing the humidity of the gas; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 57
Independent Claim
132 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and controlling the refractive index of the gas by changing the humidity of the gas; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 58
Dependent Claim
66 words
A projection exposure apparatus having an exposure processing section, said projection exposure apparatus performing exposure to a substrate, comprising: a chamber that covers said exposure processing section; a sensor that is disposed in said chamber and that measures a characteristic of gas in said chamber; and a refractive index control device connected to said chamber that controls the refractive index of gas supplied to said chamber.
Claim 59
Dependent Claim
66 words
A projection exposure apparatus having an exposure processing section, said projection exposure apparatus performing exposure to a substrate, comprising: a chamber that covers said exposure processing section; a sensor that is disposed in said chamber and that measures a characteristic of gas in said chamber; and a refractive index control device connected to said chamber that controls the refractive index of gas supplied to said chamber.
Claim 60
Dependent Claim
21 words
An apparatus according to claim 46, wherein said sensor is an atmospheric pressure sensor that measures atmospheric pressure in said chamber.
Claim 61
Dependent Claim
26 words
An apparatus according to claim 46, wherein said sensor is a refractive index monitor that measures the actual refractive index of the gas in said chamber.
Claim 62
Dependent Claim
72 words
An apparatus according to claim 46, wherein said sensor is constituted of a refractive index monitor that measures the actual refractive index of the gas in said chamber, said apparatus further comprises an atmospheric pressure sensor that measures atmospheric pressure in said chamber, and said refractive index control device controls the refractive index of the supplied gas in accordance with measurement results of said atmospheric pressure sensor and said refractive index monitor.
Claim 63
Dependent Claim
19 words
An apparatus according to claim 46, wherein the gas supplied to said chamber is supplied by an air-conditioning mechanism.
Claim 64
Dependent Claim
69 words
An apparatus according to claim 50, wherein said air-conditioning mechanism has a first supply source that emits air and a second supply source that emits a gas different from the air to supply a gas formed by the air and the gas different from the air to said chamber, and said refractive index control device adjusts the mixture ratio of said air to said gas different from the air.
Claim 65
Dependent Claim
54 words
An apparatus according to claim 50, wherein the refractive index control device controls the refractive index of the gas supplied to said chamber in accordance with a measurement result of said sensor by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas supplied to said chamber.
Claim 66
Dependent Claim
18 words
An apparatus according to claim 52, wherein said air-conditioning mechanism diffuses the plurality of gases of different types.
Claim 67
Dependent Claim
32 words
An apparatus according to claim 50, wherein said refractive index control device controls said air-conditioning mechanism such that at least one of the temperature and humidity of the supplied gas is controlled.
Claim 68
Dependent Claim
118 words
A projection exposure apparatus having an exposure processing section that includes a projection optical system, an imaging characteristic adjusting section, and a chamber for covering said exposure processing section, said projection exposure apparatus comprising: a sensor that is disposed in said chamber and that measures a change in a characteristic of gas in said chamber; a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber; and a control section that controls said imaging characteristic adjusting section, so as to correct a change of an imaging characteristic of said projection optical system due to factors other than a change in refractive index of the supplied gas.
Claim 69
Dependent Claim
118 words
A projection exposure apparatus having an exposure processing section that includes a projection optical system, an imaging characteristic adjusting section, and a chamber for covering said exposure processing section, said projection exposure apparatus comprising: a sensor that is disposed in said chamber and that measures a change in a characteristic of gas in said chamber; a refractive index control device that is connected to said chamber and that controls the refractive index of gas supplied to said chamber; and a control section that controls said imaging characteristic adjusting section, so as to correct a change of an imaging characteristic of said projection optical system due to factors other than a change in refractive index of the supplied gas.
Claim 70
Dependent Claim
55 words
An apparatus according to claim 55, wherein said factors are a change in temperature of said projection optical system due to light illuminating a pattern projected by said projection optical system and a change in intensity distribution of said light in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 71
Dependent Claim
89 words
A projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 72
Dependent Claim
89 words
A projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a substrate via a projection optical system and a chamber for covering said exposure processing section, comprising: a device that corrects a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber; and a device that corrects a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 73
Independent Claim
143 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system, a chamber for covering said exposure processing section, and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, whereby said projection exposure apparatus performs exposure to said photosensitive substrate in a temperature-controlled atmosphere, the method comprising the steps of: measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; and controlling the refractive index of the gas supplied to said chamber from said air-conditioning mechanism in accordance with the measured characteristic of the gas by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas supplied to said chamber.
Claim 74
Independent Claim
143 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system, a chamber for covering said exposure processing section, and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, whereby said projection exposure apparatus performs exposure to said photosensitive substrate in a temperature-controlled atmosphere, the method comprising the steps of: measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; and controlling the refractive index of the gas supplied to said chamber from said air-conditioning mechanism in accordance with the measured characteristic of the gas by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas supplied to said chamber.
Claim 75
Dependent Claim
23 words
A method according to claim 58, wherein said step of measuring the characteristic of the gas includes measuring atmospheric pressure in said chamber.
Claim 76
Dependent Claim
31 words
A method according to claim 58, wherein said step of measuring the characteristic of the gas includes measuring the actual refractive index of a sample of the gas in said chamber.
Claim 77
Dependent Claim
38 words
A method according to claim 58, wherein said step of measuring the characteristic of the gas includes measuring the actual refractive index of a sample of the gas in said chamber and measuring atmospheric pressure in said chamber.
Claim 78
Dependent Claim
49 words
A method according to claim 58, wherein said step of controlling the :refractive index of the gas includes supplying a gas formed by air and a gas different from the air to said chamber, and adjusting the mixture ratio of said air to said gas different from the air.
Claim 79
Dependent Claim
23 words
A method according to claim 58, further comprising the step of diffusing the plurality of gases of different types with said air-conditioning mechanism.
Claim 80
Dependent Claim
30 words
A method according to claim 58, further comprising the step of controlling said air-conditioning mechanism such that at least one of the temperature and humidity of said gas is controlled.
Claim 81
Independent Claim
173 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, the method comprising the steps of: measuring a change in a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; controlling the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in accordance with the measured change in the characteristic by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas supplied to said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 82
Independent Claim
173 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section constituted of a light source for emitting light, an illumination optical system for illuminating a mask with the light and a projection optical system for projecting and exposing an image of a pattern of said mask on a photosensitive substrate, a chamber for covering said exposure processing section and an air-conditioning mechanism for supplying a temperature-controlled gas to said chamber, the method comprising the steps of: measuring a change in a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber; controlling the refractive index of the gas supplied from said air-conditioning mechanism to said chamber in accordance with the measured change in the characteristic by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas supplied to said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 83
Dependent Claim
50 words
A method according to claim 65, wherein said factors are a change in temperature of said projection optical system due to the emission of said light and a change in intensity distribution of said light in a Fourier transform plane of said projection optical system with respect to said pattern.
Claim 84
Independent Claim
146 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and changing the refractive index of the gas by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas in said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 85
Independent Claim
146 words
A method of controlling optical performance in a projection exposure apparatus having an exposure processing section for forming an image of a pattern of a mask on a photosensitive substrate via a projection optical system and a chamber for covering said exposure processing section, the method comprising the steps of: correcting a change of imaging characteristics of said projection optical system due to a change in refractive index of a gas in said chamber by measuring a characteristic of the gas in said chamber that indicates the refractive index of the gas in said chamber and changing the refractive index of the gas by adjusting a mixture ratio of a plurality of gases of different types that collectively constitute the gas in said chamber; and correcting a change of imaging characteristics of said projection optical system due to factors other than the change in refractive index.
Claim 86
Dependent Claim
27 words
An apparatus according to claim 1, wherein said at least one refractive index measuring unit optically measures the actual refractive index of said gas in said chamber.
Claim 87
Dependent Claim
39 words
An apparatus according to claim 1, wherein said at least one refractive index measuring unit measures the actual refractive index by measuring how the refractive index of the gas in said chamber affects light emitted from a light source.
Claim 88
Dependent Claim
30 words
A method according to claim 13, wherein said step of measuring the actual refractive index of the gas includes optically measuring the refractive index of the gas in said chamber.
Claim 89
Dependent Claim
32 words
A method according to claim 13, wherein the actual refractive index :is measured by measuring how the refractive index of the gas in said chamber affects light emitted from a light source.
Claim 90
Dependent Claim
23 words
An apparatus according to claim 23, wherein the refractive index is controlled by changing the humidity of the gas supplied to said chamber.
Claim 91
Dependent Claim
25 words
An apparatus according to claim 72, wherein the changing the humidity includes adding moisture to or removing moisture from the gas supplied to said chamber.
Claim 92
Dependent Claim
21 words
A method according to claim 35, wherein the changing the humidity includes adding moisture to the gas supplied to said chamber.
Claim 93
Dependent Claim
21 words
A method according to claim 35, wherein the changing the humidity includes removing moisture from the gas supplied to said chamber.
Claim 94
Dependent Claim
45 words
An apparatus according to claim 46, wherein said chamber is constructed to provide an output used to extract gas from said chamber, wherein the extracted gas is combined with a plurality of gases in order to produce the gas which is supplied to the chamber.
Claim 95
Dependent Claim
45 words
A method according to claim 58, wherein said chamber is constructed to provide an output used to extract gas from said chamber, wherein the extracted gas is combined with said plurality of gases in order to produce the gas which is supplied to the chamber.
Claim 96
Independent Claim
39 words
A method for making a lithographic system, comprising: providing a sensor that measures a characteristic of a gas in a chamber; and providing a refractive index control device that controls a refractive index of gas supplied to said chamber.
Claim 97
Independent Claim
39 words
A method for making a lithographic system, comprising: providing a sensor that measures a characteristic of a gas in a chamber; and providing a refractive index control device that controls a refractive index of gas supplied to said chamber.
Claim 98
Dependent Claim
19 words
A method according to claim 78, wherein said sensor detects the refractive index of the gas in said chamber.
Claim 99
Dependent Claim
29 words
A method according to claim 78, wherein said sensor has an optical path passing through the gas in said chamber and detects an optical characteristic of said optical path.
Claim 100
Dependent Claim
36 words
A method according to claim 79, wherein said sensor has at least two optical paths and detects the refractive index of the gas in said chamber based on an interference information of said two optical paths.
Claim 101
Dependent Claim
17 words
A substrate which is produced by a lithographic system made by a method recited in claim 78.
Claim 102
Dependent Claim
58 words
An exposure apparatus, comprising: a chamber which covers an exposure section; an air-conditioning mechanism which controls an atmosphere in said chamber; and a refractive index measuring sensor that has an optical path passing through a gas in said chamber and that detects an optical characteristic of said optical path which corresponds to a refractive index of said gas.
Claim 103
Dependent Claim
58 words
An exposure apparatus, comprising: a chamber which covers an exposure section; an air-conditioning mechanism which controls an atmosphere in said chamber; and a refractive index measuring sensor that has an optical path passing through a gas in said chamber and that detects an optical characteristic of said optical path which corresponds to a refractive index of said gas.
Claim 104
Dependent Claim
37 words
An exposure apparatus according to claim 83, wherein said refractive index measuring sensor has at least two optical paths and detects the refractive index of said gas based on an interference information of said two optical paths.
Claim 105
Dependent Claim
43 words
An exposure apparatus according to claim 83, wherein said gas is a mixture of plural type gases, and said air-conditioning mechanism adjusts a supplying amount of at least one of said gases based on a measurement result of said refractive index measuring sensor.
References Cited (Backward Citations)
US4699505A
Cited
US4989031A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-04-05 | 2002-10-05 | 2003-04-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-04-05 | 2006-10-05 | 2007-04-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-04-05 | 2010-10-05 | 2011-04-06 | $7700.00 | Window Closed / Lapsed |