US5889678A
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Topography simulation method
Assignee: Toshiba Corp
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Filing: 1997-05-12
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Granted: 1999-03-30
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Expires: 2017-05-12
Abstract
Abstract In a topography simulation method, the topography of a resist pattern after curing treatment can be precisely estimated without producing a complex physical model or performing parameter measurement. Specifically, in the method of estimating the topography of a resist pattern, which is formed by selectively removing a part of a resist provided on a substrate and contracts due to curing treatment, the resist pattern is divided into a plurality of cells and the cells are contracted in accordance with a volume shrinkage amount per unit volume of the resist in the curing treatment. Then, the cells located closer to an interface between the substrate and the resist pattern are flattened to a higher degree in parallel to the substrate, and the deformed cells are brought together toward a shrinkage reference line passing through a center of a line pattern and toward the substrate.
Inventors
- 👤 Soichi Inoue
- 👤 Satoshi Tanaka
- 👤 Shoji Mimotogi
- 👤 Yasunobu Onishi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 15:39
CPC Classifications
G; G06; G06F; G06F30/00; G06F30/20; G06F30/23
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
146 words
A topography simulation method for simulating a cross-sectional topography of a resist pattern after curing treatment, the method comprising: a first step of converting first data representing a cross section of a resist pattern on a substrate before the resist pattern is subjected to the curing treatment, to second data representing a topography of cross section which has been divided into a plurality of cells; a second step of converting the second data to third data representing the plurality of cells deformed in accordance with a predetermined volumetric shrinkage ratio and a predetermined flatness ratio such that the cells located closer to an interface between the substrate and resist pattern are flattened to a higher degree in parallel to the substrate; and a third step of converting the third data to fourth data showing a topography defined by bringing together the deformed cells at desired locations.
Claim 2
Dependent Claim
146 words
A topography simulation method for simulating a cross-sectional topography of a resist pattern after curing treatment, the method comprising: a first step of converting first data representing a cross section of a resist pattern on a substrate before the resist pattern is subjected to the curing treatment, to second data representing a topography of cross section which has been divided into a plurality of cells; a second step of converting the second data to third data representing the plurality of cells deformed in accordance with a predetermined volumetric shrinkage ratio and a predetermined flatness ratio such that the cells located closer to an interface between the substrate and resist pattern are flattened to a higher degree in parallel to the substrate; and a third step of converting the third data to fourth data showing a topography defined by bringing together the deformed cells at desired locations.
Claim 3
Dependent Claim
31 words
The topography simulation method according to claim 1, wherein in the second step the volume of the cells before the deformation is equal to that of the cells after the deformation.
Claim 4
Dependent Claim
30 words
The topography simulation method according to claim 1, wherein in the second step the volume of the cells before the deformation differs from that of the cells after the deformation.
Claim 5
Dependent Claim
23 words
The topography simulation method according to claim 1, wherein in the first step the shape of each of the divided cells is cubic.
Claim 6
Dependent Claim
50 words
The shape simulation method according to claim 1, wherein in the third step, the plurality of deformed cells are brought together toward the interface between the substrate and the resist pattern and toward a center line indicating a center of a line of the resist pattern before the curing treatment.
Claim 7
Dependent Claim
188 words
A computer program product for operating a computer, said computer program product comprising: a computer readable medium; first program instruction means for instructing a computer processor to convert first data representing a cross section of a resist pattern on a substrate before the resist pattern is subjected to curing treatment, to second data representing a topography of cross section which has been divided into a plurality of cells; second program instruction means for instructing the computer processor to convert the second data to third data representing the plurality of cells deformed in accordance with a predetermined volumetric shrinkage ratio and a predetermined flatness ratio such that the cells located closer to an interface between the substrate and the resist pattern are flattened to a higher degree in parallel to the substrate; and third program instruction means for instructing the computer processor to convert the third data to fourth data showing a topography defined by bringing together the deformed cells at desired locations, wherein each of said program instruction means is recorded on said medium in excutable form and is loadable into the computer for execution by the processor.
Claim 8
Dependent Claim
188 words
A computer program product for operating a computer, said computer program product comprising: a computer readable medium; first program instruction means for instructing a computer processor to convert first data representing a cross section of a resist pattern on a substrate before the resist pattern is subjected to curing treatment, to second data representing a topography of cross section which has been divided into a plurality of cells; second program instruction means for instructing the computer processor to convert the second data to third data representing the plurality of cells deformed in accordance with a predetermined volumetric shrinkage ratio and a predetermined flatness ratio such that the cells located closer to an interface between the substrate and the resist pattern are flattened to a higher degree in parallel to the substrate; and third program instruction means for instructing the computer processor to convert the third data to fourth data showing a topography defined by bringing together the deformed cells at desired locations, wherein each of said program instruction means is recorded on said medium in excutable form and is loadable into the computer for execution by the processor.
Claim 9
Dependent Claim
35 words
The computer program product as set forth in claim 6, wherein in said second program instruction means, the volume of the cells before the deformation is equal to that of the cells after the deformation.
Claim 10
Dependent Claim
34 words
The computer program product as set forth in claim 6, wherein in said second program instruction means, the volume of the cells before the deformation differs from that of the cells after the deformation.
Claim 11
Dependent Claim
27 words
The computer program product as set forth in claim 6, wherein in said first program instruction means, the topography of each of the divided cells is cubic.
Claim 12
Dependent Claim
54 words
The computer program product as set forth in claim 6, wherein in said third program instruction means, the plurality of deformed cells are brought together toward the interface between the substrate and the resist pattern and toward a center line indicating a center of a line of the resist pattern before the curing treatment.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2002-03-29 | 2002-09-28 | 2003-03-30 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2006-03-29 | 2006-09-28 | 2007-03-30 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2010-03-29 | 2010-09-28 | 2011-03-30 | $7700.00 | Window Closed / Lapsed |