Abstract The method for fabricating a charge coupled device disclosed includes the steps of forming a gate oxide film and forming a transfer electrode. The provisional oxide film is formed on a semiconductor substrate, and the provisional oxide film at a transfer electrode formation region is selectively etched away. The transfer electrode from a polycrystalline silicon film on the gate oxide film of the transfer electrode formation region is selectively formed, and the provisional oxide film between transfer electrodes is etched away. Since the oxide film which protects the silicon substrate surface (oxide film/silicon interface) of the second layer transfer electrode formation region during the patterning of the first layer polycrystalline film and the insulating oxide film which covers the first layer transfer electrode surface, is formed in the two-step oxidation process, it is possible to adjust the thicknesses of the two oxide films as desired.
A method for fabricating a charge coupled device comprising the steps of: forming a first provisional oxide film on a semiconductor substrate; forming a first gate oxide film after selectively etching away said first provisional oxide film at a first layer transfer electrode formation region; forming selectively a first layer transfer electrode from a polycrystalline silicon film on said first gate oxide film of said first layer transfer electrode formation region; etching away an oxide film formed of said first provisional oxide film and said first gate oxide film between said first layer transfer electrodes; forming a second provisional oxide film on said semiconductor substrate; forming a second gate oxide film after selectively etching away said second provisional oxide film at a second layer transfer electrode formation region on said semiconductor substrate; and forming selectively a second layer transfer electrode from a polycrystalline silicon film on said second gate oxide film of said second layer transfer electrode formation region.
Claim 2
Independent Claim
159 words
A method for fabricating a charge coupled device comprising the steps of: forming a first provisional oxide film on a semiconductor substrate; forming a first gate oxide film after selectively etching away said first provisional oxide film at a first layer transfer electrode formation region; forming selectively a first layer transfer electrode from a polycrystalline silicon film on said first gate oxide film of said first layer transfer electrode formation region; etching away an oxide film formed of said first provisional oxide film and said first gate oxide film between said first layer transfer electrodes; forming a second provisional oxide film on said semiconductor substrate; forming a second gate oxide film after selectively etching away said second provisional oxide film at a second layer transfer electrode formation region on said semiconductor substrate; and forming selectively a second layer transfer electrode from a polycrystalline silicon film on said second gate oxide film of said second layer transfer electrode formation region.
Claim 3
Dependent Claim
23 words
The method for fabricating a charge coupled device according to claim 1, in which a silicon substrate is used as said semiconductor substrate.