US5853523A
Expired / Lapsed
US
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Plasma-etching electrode plate
Assignee: Tokai Carbon Co Ltd
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Filing: 1997-02-14
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Granted: 1998-12-29
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Expires: 2017-02-14
Abstract
Abstract A plasma-etching electrode plate in the form of flat glassy carbon plate is characterized by a flatness with a warp smaller than 0.3 mm. This flatness permits the electrode plate to have a uniform surface temperature distribution which contributes to uniform etching on semiconductor wafers. The electrode plate is a glassy carbon plate obtained from one or more thermosetting resins having a carbon yield higher than 20%.
Inventors
- 👤 Osamu Machida
- 👤 Hisayuki Hamajima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 17:22
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32431; H01J37/32532; H01J37/32541; H01J37/3255; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
24 words
A plasma-etching electrode plate in the form of flat glassy carbon plate which is characterized by flatness with a warp smaller than 0.3 mm.
Claim 2
Dependent Claim
24 words
A plasma-etching electrode plate in the form of flat glassy carbon plate which is characterized by flatness with a warp smaller than 0.3 mm.
Claim 3
Dependent Claim
21 words
A plasma-etching electrode plate as defined in claim 1, which is characterized by flatness with a warp smaller than 0.2 mm.
Claim 4
Dependent Claim
29 words
A plasma-etching electrode plate as defined in claim 1, which is a glassy carbon plate obtained from at least one thermosetting resin having a carbon yield higher than 20%.
Claim 5
Dependent Claim
17 words
The plasma-etching eletrode of claim 1, wherein the electrode plate has a thickness greater than 5 mm.
Claim 6
Dependent Claim
58 words
A plasma-etching apparatus comprising an upper electrode plate and a lower electrode plate provided in face-to-face parallel relationship with respect to each other and means for applying a high-frequency electric power across the electrode plates, wherein an improvement comprises the upper electrode plate being a glassy carbon plate having a flatness with a warp less than 0.3 mm.
Claim 7
Dependent Claim
58 words
A plasma-etching apparatus comprising an upper electrode plate and a lower electrode plate provided in face-to-face parallel relationship with respect to each other and means for applying a high-frequency electric power across the electrode plates, wherein an improvement comprises the upper electrode plate being a glassy carbon plate having a flatness with a warp less than 0.3 mm.
Claim 8
Dependent Claim
22 words
The plasma-etching apparatus of claim 5, wherein the glassy carbon plate has a flatness with a warp of less than 0.2 mm.
Claim 9
Dependent Claim
18 words
The plasma-etching apparatus of claim 6, wherein the glassy carbon plate has a thickness greater than 5 mm.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-12-28 | 2002-06-29 | 2002-12-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-12-28 | 2006-06-29 | 2006-12-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-12-28 | 2010-06-29 | 2010-12-29 | $7700.00 | Window Closed / Lapsed |