Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
153 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: an SOI substrate consisting of a silicon substrate, a buried oxide film being formed on said silicon substrate, and a first conductivity type silicon layer being formed on said buried oxide film; a second conductivity type first conductive layer being provided on said silicon layer to be connected with said silicon layer; a second conductivity type second conductive layer being formed in separation from said first conductive layer and provided on said silicon layer to be connected to said silicon layer; a first wire being connected to said first conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being connected to said second conductive layer, an input voltage being limited by a punch through across said first and second conductive layers.
Claim 2
Dependent Claim
153 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: an SOI substrate consisting of a silicon substrate, a buried oxide film being formed on said silicon substrate, and a first conductivity type silicon layer being formed on said buried oxide film; a second conductivity type first conductive layer being provided on said silicon layer to be connected with said silicon layer; a second conductivity type second conductive layer being formed in separation from said first conductive layer and provided on said silicon layer to be connected to said silicon layer; a first wire being connected to said first conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being connected to said second conductive layer, an input voltage being limited by a punch through across said first and second conductive layers.
Claim 3
Dependent Claim
167 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: a first conductivity type silicon substrate; a buried oxide film being provided on said silicon substrate and having an opening partially exposing the surface of said silicon substrate; a first conductivity type silicon layer being provided in said opening to be in contact with said silicon substrate; second conductivity type first and second conductive layers being provided on said silicon layer to be connected with said silicon layer and separated from each other; a LOCOS oxide film being provided on said silicon layer for electrically isolating said first and second conductive layers from each other; a first wire being connected to said first conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being connected to said second conductive layer, an input voltage being limited by a punch through across said first and second conductive layers.
Claim 4
Dependent Claim
167 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: a first conductivity type silicon substrate; a buried oxide film being provided on said silicon substrate and having an opening partially exposing the surface of said silicon substrate; a first conductivity type silicon layer being provided in said opening to be in contact with said silicon substrate; second conductivity type first and second conductive layers being provided on said silicon layer to be connected with said silicon layer and separated from each other; a LOCOS oxide film being provided on said silicon layer for electrically isolating said first and second conductive layers from each other; a first wire being connected to said first conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being connected to said second conductive layer, an input voltage being limited by a punch through across said first and second conductive layers.
Claim 5
Dependent Claim
168 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: an SOI substrate consisting of a silicon substrate, a buried oxide film being formed on the entire surface of said silicon substrate, said buried oxide film having an entire surface substantially parallel to said silicon substrate, and a first conductivity type silicon layer being formed on said buried oxide layer; a second conductivity type conductive layer being provided on said silicon layer to be connected with said silicon layer by a P-N junction; a first wire being connected to said conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being provided in separation from said conductive layer and provided on said silicon layer to be connected with said silicon layer, for extracting charges being injected into said silicon layer by an avalanche breakdown, an input voltage being limited by an avalanche breakdown at said P-N junction.
Claim 6
Dependent Claim
168 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: an SOI substrate consisting of a silicon substrate, a buried oxide film being formed on the entire surface of said silicon substrate, said buried oxide film having an entire surface substantially parallel to said silicon substrate, and a first conductivity type silicon layer being formed on said buried oxide layer; a second conductivity type conductive layer being provided on said silicon layer to be connected with said silicon layer by a P-N junction; a first wire being connected to said conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit; and a second wire being provided in separation from said conductive layer and provided on said silicon layer to be connected with said silicon layer, for extracting charges being injected into said silicon layer by an avalanche breakdown, an input voltage being limited by an avalanche breakdown at said P-N junction.
Claim 7
Dependent Claim
22 words
An SOI input protection circuit according to claim 3, wherein a film thickness of said buried oxide film is about 4000 Å.
Claim 8
Dependent Claim
23 words
An SOI input protection circuit according to claim 3, wherein said buried oxide film is formed by implanting oxygen into said silicon substrate.
Claim 9
Dependent Claim
137 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: a first conductivity type silicon substrate; a buried oxide film being provided on the entire surface of said silicon substrate, said buried oxide film having an entire surface substantially parallel to said silicon substrate and having an opening partially exposing the surface of said silicon substrate; a first conductivity type silicon layer being provided in said opening; a second conductivity type conductive layer being provided on said silicon layer to be connected with said silicon layer by a P-N junction; and a wire being connected to said conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit, an input voltage being limited by an avalanche breakdown at said P-N junction.
Claim 10
Dependent Claim
137 words
An SOI input protection circuit being provided between an input pad and an internal circuit, comprising: a first conductivity type silicon substrate; a buried oxide film being provided on the entire surface of said silicon substrate, said buried oxide film having an entire surface substantially parallel to said silicon substrate and having an opening partially exposing the surface of said silicon substrate; a first conductivity type silicon layer being provided in said opening; a second conductivity type conductive layer being provided on said silicon layer to be connected with said silicon layer by a P-N junction; and a wire being connected to said conductive layer and having an end being connected to said input pad and another end being connected to said internal circuit, an input voltage being limited by an avalanche breakdown at said P-N junction.
Claim 11
Dependent Claim
22 words
An SOI input protection circuit according to claim 6, wherein a film thickness of said buried oxide film is about 4000 Å.
Claim 12
Dependent Claim
22 words
An SOI input protection circuit according to claim 6, wherein said oxide film is formed by implanting oxygen into said silicon substrate.