US5826130A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus and method for developing resist coated on substrate
Assignee: Tokyo Electron Ltd
•
Filing: 1997-06-05
•
Granted: 1998-10-20
•
Expires: 2017-06-05
Abstract
Abstract A developing apparatus for developing a photoresist-coated substrate comprises a spin chuck having a supporting surface smaller in size than the substrate and adapted to be spin-driven with the photoresist-coated substrate surface held upward, a cup surrounding the spin chuck, a developing solution nozzle for applying a developing solution on the photoresist-coated substrate held on the spin chuck, a first washing solution nozzle for applying a washing solution to the photoresist-coated surface of the substrate held on the spin chuck, a second washing solution nozzle for applying the washing solution to a rear surface of the substrate on the spin chuck, a liquid seal ring mounted substantially coaxial with the spin chuck and having a diameter greater than the supporting surface of the spin chuck and smaller than the substrate, and a liquid film forming section provided on an upper end of the liquid seal ring and located near and opposite a peripheral edge portion of a rear surface of the substrate on the spin chuck to provide a clearance relative to the peripheral edge portion of the rear surface of the substrate, in which the liquid film forming section includes a first wall portion situated substantially orthogonal to the rear surface of the substrate and in an outwardly facing relation, and a second wall portion gently inclined relative to the rear surface of the substrate and situated in an inwardly facing relation.
Inventors
- 👤 Hideya Tanaka
- 👤 Norimitsu Morioka
- 👤 Kosuke Yoshihara
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 17:33
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/3021; H; H10; H10P; H10P76/00; B; B05; B05C; B05C11/00; B05C11/02; B05C11/08
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
172 words
A developing method for developing a photoresist-coated substrate, comprising the steps of; (a) supporting the photoresist-coated substrate on a spin chuck in a chamber with the photoresist-coated substrate held upward and facing a liquid film forming means at an area near a periphery of a rear surface of the substrate to define a clearance between the liquid film forming means and the periphery of the rear surface of the substrate; (b) starting an exhaust operation in the chamber and, while rotating the substrate at a first rotation speed, supplying a washing solution to the clearance to create an annular continuous washing solution film; (c) while stopping the rotation of the substrate, stopping an exhaust operation in the chamber and applying a developing solution to the photoresist-coated surface of the substrate to develop the coated photoresist in a hermetically sealed chamber; and (d) while rotating the substrate at a second rotation speed, applying the washing solution on both surfaces of the substrate and removing the developing solution from both surfaces of the substrate.
Claim 2
Dependent Claim
172 words
A developing method for developing a photoresist-coated substrate, comprising the steps of; (a) supporting the photoresist-coated substrate on a spin chuck in a chamber with the photoresist-coated substrate held upward and facing a liquid film forming means at an area near a periphery of a rear surface of the substrate to define a clearance between the liquid film forming means and the periphery of the rear surface of the substrate; (b) starting an exhaust operation in the chamber and, while rotating the substrate at a first rotation speed, supplying a washing solution to the clearance to create an annular continuous washing solution film; (c) while stopping the rotation of the substrate, stopping an exhaust operation in the chamber and applying a developing solution to the photoresist-coated surface of the substrate to develop the coated photoresist in a hermetically sealed chamber; and (d) while rotating the substrate at a second rotation speed, applying the washing solution on both surfaces of the substrate and removing the developing solution from both surfaces of the substrate.
Claim 3
Dependent Claim
23 words
The developing method according to claim 1, wherein the washing solution film is created in a width range of 5 to 15 mm.
Claim 4
Dependent Claim
34 words
The developing method according to claim 1, wherein the liquid film forming means is moved near and opposite the rear surface of the substrate to define a clearance range of 0.5 to 1.5 mm.
Claim 5
Dependent Claim
182 words
A developing method for developing a photoresist-coated substrate, comprising the steps of; (p) supporting the photoresist-coated substrate on a spin chuck with the photoresist-coated substrate held upward and facing a liquid film forming means at an area near a periphery of a rear surface of the substrate to define a clearance between the liquid film forming means and the periphery of the rear surface of the substrate; (q) while rotating the photoresist-coated substrate at a first rotation speed, supplying a washing solution to the clearance to create an annular continuous washing solution film; (r) temporarily stopping the rotation of the substrate and, while applying a developing solution on the photoresist-coated surface of the substrate, rotating the substrate at a second rotation speed; (s) stopping the rotation of the substrate and allowing the developing solution to act upon the coated-photoresist on the substrate in a stopped state of the substrate; and (t) while rotating the substrate at a third rotation speed, applying the washing solution on both surfaces of the substrate and removing the developing solution from both the surfaces of the substrate.
Claim 6
Dependent Claim
182 words
A developing method for developing a photoresist-coated substrate, comprising the steps of; (p) supporting the photoresist-coated substrate on a spin chuck with the photoresist-coated substrate held upward and facing a liquid film forming means at an area near a periphery of a rear surface of the substrate to define a clearance between the liquid film forming means and the periphery of the rear surface of the substrate; (q) while rotating the photoresist-coated substrate at a first rotation speed, supplying a washing solution to the clearance to create an annular continuous washing solution film; (r) temporarily stopping the rotation of the substrate and, while applying a developing solution on the photoresist-coated surface of the substrate, rotating the substrate at a second rotation speed; (s) stopping the rotation of the substrate and allowing the developing solution to act upon the coated-photoresist on the substrate in a stopped state of the substrate; and (t) while rotating the substrate at a third rotation speed, applying the washing solution on both surfaces of the substrate and removing the developing solution from both the surfaces of the substrate.
Claim 7
Dependent Claim
26 words
The developing method according to claim 4, wherein the washing solution film formed at the clearance is in a width range of 5 to 15 mm.
Claim 8
Dependent Claim
33 words
The developing method according to claim 4, wherein the liquid-film forming means is moved toward the rear surface of the substrate to set the clearance in a range of 0.5 to 1.5 mm.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-10-19 | 2002-04-20 | 2002-10-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-10-19 | 2006-04-20 | 2006-10-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-10-19 | 2010-04-20 | 2010-10-20 | $7700.00 | Window Closed / Lapsed |