US5798822A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus
Assignee: Nikon Corp
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Filing: 1997-10-15
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Granted: 1998-08-25
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Expires: 2017-10-15
Abstract
Abstract A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.
Inventors
- 👤 Seiji Miyazaki
- 👤 Hiroshi Shirasu
- 👤 Kazuaki Saiki
- 👤 Tsuyoshi Narabe
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 12:07
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/20; G03F7/70216; G03F7/70358; G03F9/00; G03F9/70; G03F9/7003; G03F9/7023; G03F9/7026
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
171 words
An exposure apparatus comprising: a projecting optical system; a holding stage which holds a mask and a photosensitive substrate such that said mask and said photosensitive substrate are opposed to each other with said projecting optical system between, an image of said mask being projected onto said photosensitive substrate by said projecting optical system; a position detecting device which detects a positional relationship between said mask and said photosensitive substrate in an optical axis direction of said projecting optical system; a driving device which drives said mask and/or said photosensitive substrate in the optical axis direction and relatively positions said mask and said photosensitive substrate to meet a predetermined positional relationship; a pair of reference plates arranged on said holding stage and opposed each other along the optical axis direction; and a control device which causes said position detecting device to detect a positional relationship of said reference plates, in the optical axis direction, and which corrects said position detecting device based on the detected positional relationship of said reference plates.
Claim 2
Dependent Claim
171 words
An exposure apparatus comprising: a projecting optical system; a holding stage which holds a mask and a photosensitive substrate such that said mask and said photosensitive substrate are opposed to each other with said projecting optical system between, an image of said mask being projected onto said photosensitive substrate by said projecting optical system; a position detecting device which detects a positional relationship between said mask and said photosensitive substrate in an optical axis direction of said projecting optical system; a driving device which drives said mask and/or said photosensitive substrate in the optical axis direction and relatively positions said mask and said photosensitive substrate to meet a predetermined positional relationship; a pair of reference plates arranged on said holding stage and opposed each other along the optical axis direction; and a control device which causes said position detecting device to detect a positional relationship of said reference plates, in the optical axis direction, and which corrects said position detecting device based on the detected positional relationship of said reference plates.
Claim 3
Dependent Claim
18 words
An apparatus according to claim 1, wherein said projecting optical system is an optical system of one-to-one magnification.
Claim 4
Dependent Claim
35 words
An apparatus according to claim 1, wherein said holding stage is moved relative to said projecting optical system, and an entire surface of said mask is exposed onto said photosensitive substrate by the relative movement.
Claim 5
Dependent Claim
78 words
An apparatus according to claim 3, further comprising at least one of a mask stage on which said mask is placed to be movable with respect to said holding stage and a substrate stage on which said photosensitive substrate is placed to be movable with respect to said holding stage, wherein said driving device adjusts the positional relationship between said mask and said photosensitive substrate by controlling at least one of said mask stage and said substrate stage.
Claim 6
Dependent Claim
20 words
An apparatus according to claim 1, wherein said holding stage holds said mask and said substrate along a vertical direction.
Claim 7
Dependent Claim
36 words
An apparatus according to claim 1, wherein said control device causes said position detecting device to detect a positional relationship of said pair of reference plates in the optical axis direction at a predetermined time interval.
Claim 8
Dependent Claim
100 words
An exposure apparatus comprising: a projecting optical system disposed between a mask formed with a pattern and a photosensitive substrate, which projects an image of the pattern of said mask onto said photosensitive substrate; a position detecting device which detects a positional relationship between said mask and said photosensitive a substrate in an optical axis direction of said projecting optical system; a pair of reference plates arranged in accordance with a predetermined positional relationship, in said optical axis direction, of said mask and said photosensitive substrate; and a calibration device which calibrates said position detecting device using said reference plates.
Claim 9
Dependent Claim
100 words
An exposure apparatus comprising: a projecting optical system disposed between a mask formed with a pattern and a photosensitive substrate, which projects an image of the pattern of said mask onto said photosensitive substrate; a position detecting device which detects a positional relationship between said mask and said photosensitive a substrate in an optical axis direction of said projecting optical system; a pair of reference plates arranged in accordance with a predetermined positional relationship, in said optical axis direction, of said mask and said photosensitive substrate; and a calibration device which calibrates said position detecting device using said reference plates.
Claim 10
Dependent Claim
30 words
An apparatus according to claim 7, further comprising: a holding member which integrally holds said mask and said photosensitive substrate, wherein said reference plates are provided on said holding member.
Claim 11
Dependent Claim
22 words
An apparatus according to claim 7, wherein said mask and said substrate are moved synchronously with respect to said projecting optical system.
Claim 12
Dependent Claim
21 words
An apparatus according to claim 7, wherein said position detecting device is disposed in the vicinity of said projecting optical system.
Claim 13
Dependent Claim
42 words
An apparatus according to claim 7, wherein said calibration device detects a positional relationship of said pair of reference plates in said optical axis direction, and calibrates said position detecting device when the detected positional relationship deviates from the predetermined positional relationship.
Claim 14
Dependent Claim
82 words
An exposure method for exposing a pattern of a mask onto a substrate through a projection optical system, comprising the steps of: detecting a distance, in a direction of an optical axis of the projection optical system, between a pair of reference plates which are arranged at spaced positions in the optical axis direction, of said mask and said substrate; and adjusting a distance in the optical axis direction between said mask and said substrate based on a result of said detection.
Claim 15
Dependent Claim
82 words
An exposure method for exposing a pattern of a mask onto a substrate through a projection optical system, comprising the steps of: detecting a distance, in a direction of an optical axis of the projection optical system, between a pair of reference plates which are arranged at spaced positions in the optical axis direction, of said mask and said substrate; and adjusting a distance in the optical axis direction between said mask and said substrate based on a result of said detection.
Claim 16
Dependent Claim
48 words
An exposure method according to claim 12, wherein when a detection result obtained in said detecting step differs from a previous detection result, the adjustment of the distance between said mask and said substrate in said adjusting step is effected based on the difference in the detection result.
Claim 17
Dependent Claim
50 words
An exposure method according to claim 12, wherein said adjusting step includes a step of detecting positions of said mask and said substrate in said optical axis direction with a sensor, and comparing a result of this detection and the detection result with respect to said pair of reference plates.
Claim 18
Dependent Claim
28 words
An exposure method according to claim 12, wherein said step of detecting the distance between said pair of reference plates includes synchronously moving said pair of reference plates.
Claim 19
Dependent Claim
26 words
An exposure method according to claim 12, wherein said step of detecting the distance between said pair of reference plates is performed at predetermined time intervals.
Claim 20
Dependent Claim
32 words
An exposure method according to claim 12, wherein said step of detecting the distance between said pair of reference plates is performed after a plurality of exposures of said substrate are effected.
Claim 21
Dependent Claim
34 words
An exposure method according to claim 12, wherein said step of detecting the distance between said pair of reference plates is performed after each occurrence of a predetermined number of exposures of said substrate.
Claim 22
Dependent Claim
14 words
A substrate having a pattern formed by an exposure method according to claim 12.
References Cited (Backward Citations)
US5528027A
Cited
US5523574A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-08-24 | 2002-02-23 | 2002-08-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-08-24 | 2006-02-23 | 2006-08-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-08-24 | 2010-02-23 | 2010-08-25 | $7700.00 | Window Closed / Lapsed |