US5773852A
Expired / Lapsed
US
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Shorted anode lateral insulated gate bipolar transistor
Assignee: Korea Electronics Co Ltd
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Filing: 1996-07-15
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Granted: 1998-06-30
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Expires: 2016-07-15
Abstract
Abstract A shorted anode lateral insulated gate bipolar transistor includes a semiconductor layer of a first conductivity type, a first current electrode, a second current electrode, a first insulation layer, a first gate electrode, a second gate electrode, a first high concentration impurity region of a second conductivity type, a low concentration impurity region of the second conductivity type, a first high concentration impurity region of the first conductivity type, a second high concentration impurity region of the second conductivity type, a third high concentration impurity region of the second conductivity type, and a second high concentration impurity region of the first conductivity type.
Inventors
- 👤 Min-Koo Han
- 👤 Byeong-Hoon Lee
- 👤 Moo-Sup Lim
- 👤 Yearn-Ik Choi
- 👤 Jung-Eon Park
- 👤 Won-Oh Lee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 18:41
CPC Classifications
H; H10; H10D; H10D48/00; H10D48/30; H10D48/32; H10D48/34; H10D48/345; H10D12/00; H10D12/411; H10D12/421
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
450 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed on the surface of the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a second high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer adjacent to the intermediate concentration impurity region of the first conductivity and extending to a fifth depth; l) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the second gate electrode to a part of the second current electrode and extending to the fifth depth; and m) a second high concentration impurity region of the first conductivity type formed to be adjacent with the third high concentration impurity region of a second conductivity type below the second current electrode and extending to the third depth.
Claim 2
Dependent Claim
450 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed on the surface of the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a second high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer adjacent to the intermediate concentration impurity region of the first conductivity and extending to a fifth depth; l) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the second gate electrode to a part of the second current electrode and extending to the fifth depth; and m) a second high concentration impurity region of the first conductivity type formed to be adjacent with the third high concentration impurity region of a second conductivity type below the second current electrode and extending to the third depth.
Claim 3
Dependent Claim
38 words
A shorted anode lateral insulated gate bipolar transistor as claimed in claim 1, wherein a second insulation layer is provided between a semiconductor substrate of the second conductivity type and said semiconductor layer of the first conductivity type.
Claim 4
Dependent Claim
31 words
A shorted anode lateral insulated gate bipolar transistor as claimed in claim 1, wherein the first conductivity type is an N type, and the second conductivity type is a P type.
Claim 5
Dependent Claim
429 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed in a trench formed in the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a second high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer adjacent to the intermediate concentration impurity region of the first conductivity and extending to a fifth depth; and l) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the second gate electrode and below the first insulation layer between the second gate electrode and second current electrode and extending to the fifth depth, and one side of which is adjacent the second current electrode.
Claim 6
Dependent Claim
429 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed in a trench formed in the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a second high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer adjacent to the intermediate concentration impurity region of the first conductivity and extending to a fifth depth; and l) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the second gate electrode and below the first insulation layer between the second gate electrode and second current electrode and extending to the fifth depth, and one side of which is adjacent the second current electrode.
Claim 7
Dependent Claim
38 words
A shorted anode lateral insulated gate bipolar transistor as claimed in claim 4, wherein a second insulation layer is provided between a semiconductor substrate of the second conductivity type and said semiconductor layer of the first conductivity type.
Claim 8
Dependent Claim
31 words
A shorted anode lateral insulated gate bipolar transistor as claimed in claim 4, wherein the first conductivity type is an N type, and the second conductivity type is a P type.
Claim 9
Dependent Claim
409 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed on the surface of the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the second gate electrode to a part of the second current electrode and extending to a fifth depth; and l) a second high concentration impurity region of the first conductivity type formed to be adjacent the third high concentration impurity region of a second conductivity type below the second current electrode and extending to the third depth.
Claim 10
Dependent Claim
409 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed on the surface of the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; k) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the second gate electrode to a part of the second current electrode and extending to a fifth depth; and l) a second high concentration impurity region of the first conductivity type formed to be adjacent the third high concentration impurity region of a second conductivity type below the second current electrode and extending to the third depth.
Claim 11
Dependent Claim
389 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed in a trench formed in the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; and k) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the second gate electrode and below the first insulation layer between the second gate electrode and second current electrode and extending to the fifth depth, and one side of which is adjacent the second current electrode.
Claim 12
Dependent Claim
389 words
A shorted anode lateral insulated gate bipolar transistor comprising: a) a semiconductor layer of a first conductivity type having a surface; b) a first current electrode formed on the surface of the semiconductor layer; c) a second current electrode formed in a trench formed in the semiconductor layer and spaced apart from the first current electrode; d) a first insulation layer formed on the surface of the semiconductor layer and disposed between the first current electrode and the second current electrode; e) a first gate electrode formed within the first insulation layer in the vicinity of the first current electrode; f) a second gate electrode formed within the first insulation layer in the vicinity of the second current electrode; g) a first high concentration impurity region of a second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first current electrode and extending to a first depth; h) a low concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the first insulation layer between the first gate electrode and the first current electrode and below the first gate electrode to be adjacent the first high concentration impurity region of the second conductivity type and extending to a second depth which is less than the first depth; i) a first high concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer extending from the first gate electrode to a part of the first current electrode and extending to a third depth which is less than the second depth; j) an intermediate concentration impurity region of the first conductivity type formed in the vicinity of the surface of the semiconductor layer disposed below the second gate electrode, below the first insulation layer between the second gate electrode and the second current electrode, and below the second current electrode and extending to a fourth depth; and k) a third high concentration impurity region of the second conductivity type formed in the vicinity of the surface of the semiconductor layer below the second gate electrode and below the first insulation layer between the second gate electrode and second current electrode and extending to the fifth depth, and one side of which is adjacent the second current electrode.
References Cited (Backward Citations)
JPH05283622A
Cited
JPH05335556A
Cited
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