US5739898A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure method and apparatus
Assignee: Nikon Corp
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Filing: 1994-09-26
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Granted: 1998-04-14
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Expires: 2014-09-26
Abstract
Abstract The present invention relates to a projection exposure method and an exposure apparatus for projecting a pattern on a photo-mask through a projection optical system onto a predetermined photosensitive material. The photosensitive material is a nonlinear photosensitive material in which the effective light intensity distribution is nonlinear to the intensity of incident exposure light. Further, multiple exposure is made with plural patterns having a certain lateral shift therebetween, or multiple exposure is made with shifting the position of an identical pattern, whereby multiple exposure is effected with patterns different in intensity distribution on the photosensitive material. A high-resolution pattern can be formed over the resolution limit of projection optical system by the above arrangement.
Inventors
- 👤 Toshihiko Ozawa
- 👤 Masaya Komatsu
- 👤 Masato Shibuya
- 👤 Hiroshi Ooki
- 👤 Masaomi Kameyama
- 👤 Yoshifumi Tokoyoda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 03:55
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70483; G03F7/7055; G03F7/70566; G03F7/70058; G03F7/70125; G03F7/70425; G03F7/70475; G03F7/70583
Claims Analysis
Total Claims: 42
Claim 1
Independent Claim
164 words
A projection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern from a first region of a first photo-mask and a second pattern from a second region of a second photo-mask onto said photosensitive material; and a mechanism for moving said first photo-mask related to said photo sensitive material to project said second pattern onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 2
Dependent Claim
164 words
A projection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern from a first region of a first photo-mask and a second pattern from a second region of a second photo-mask onto said photosensitive material; and a mechanism for moving said first photo-mask related to said photo sensitive material to project said second pattern onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 3
Dependent Claim
27 words
An exposure apparatus according to claim 1, wherein said mechanism moves said first photo-mask in a direction perpendicular to an optical axis of said projection optical system.
Claim 4
Dependent Claim
162 words
A projection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern having a first region on a first photo-mask and a second pattern having a second region on a second photo-mask onto said photosensitive material; and a mechanism for replacing said first photo-mask with said second photo-mask to project said second pattern onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 5
Dependent Claim
162 words
A projection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern having a first region on a first photo-mask and a second pattern having a second region on a second photo-mask onto said photosensitive material; and a mechanism for replacing said first photo-mask with said second photo-mask to project said second pattern onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 6
Dependent Claim
16 words
An exposure apparatus to claim 3, wherein said first and second photo-masks have mutually different patterns.
Claim 7
Dependent Claim
31 words
An apparatus according to claim 3, wherein said first photo-mask is a phase shifting mask, and wherein said first pattern is projected by said incident light passed through said first photo-mask.
Claim 8
Dependent Claim
58 words
An apparatus according to claim 3, wherein said first photo-mask is a first phase shifting mask, and wherein said first pattern is projected by said incident light passed through said first photo-mask; and wherein said second photo-mask is a second phase shifting mask, wherein said second pattern is projected by said incident light passed through said second photo-mask.
Claim 9
Dependent Claim
46 words
An apparatus according to claim 3, wherein said first photo-mask is a phase shifting mask having an open portion between first and second opaque portions and a phase film arranged between said second opaque portion and a third opaque portion adjacent to said second opaque portion.
Claim 10
Dependent Claim
97 words
An apparatus according to claim 3, wherein said first photo-mask is a first phase shifting mask having an open portion between first and second opaque portions and a phase film arranged between said second opaque portion and a third opaque portion adjacent to said second opaque portion; and wherein said second photo-mask is a second phase shifting mask having an open portion between first and second opaque portions and a phase film arranged between said second opaque portion of said second photo-mask and a third opaque portion adjacent to said second opaque portion of said second photo-mask.
Claim 11
Dependent Claim
93 words
A protection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern on a first photo-mask onto an exposing region of said photosensitive material; a mechanism for replacing said first photo-mask with second photo-mask having a second pattern to project said second pattern onto said exposing region of said photosensitive material; and a polarized plate being so arranged that said incident light travels therethrough.
Claim 12
Dependent Claim
93 words
A protection exposure apparatus for exposing a photosensitive material having a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, said apparatus comprising: a projection optical system for projecting a first pattern on a first photo-mask onto an exposing region of said photosensitive material; a mechanism for replacing said first photo-mask with second photo-mask having a second pattern to project said second pattern onto said exposing region of said photosensitive material; and a polarized plate being so arranged that said incident light travels therethrough.
Claim 13
Dependent Claim
60 words
A projection exposure apparatus for projecting a pattern including a line pattern onto a photosensitive material, comprising: a projection optical system for projecting said line pattern onto said photosensitive material; and a polarized plate being so arranged that incident light to be applied thereto passes therethrough, wherein said incident light is polarized along a longitudinal direction of said line pattern.
Claim 14
Dependent Claim
60 words
A projection exposure apparatus for projecting a pattern including a line pattern onto a photosensitive material, comprising: a projection optical system for projecting said line pattern onto said photosensitive material; and a polarized plate being so arranged that incident light to be applied thereto passes therethrough, wherein said incident light is polarized along a longitudinal direction of said line pattern.
Claim 15
Dependent Claim
43 words
A projection exposure apparatus, comprising: a projection optical system for projecting light through a first photo-mask onto a photosensitive material; a mechanism for replacing said first photo-mask with a second photo-mask; and a polarized plate being so arranged that said light travels therethrough.
Claim 16
Dependent Claim
43 words
A projection exposure apparatus, comprising: a projection optical system for projecting light through a first photo-mask onto a photosensitive material; a mechanism for replacing said first photo-mask with a second photo-mask; and a polarized plate being so arranged that said light travels therethrough.
Claim 17
Dependent Claim
148 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern from a first region of a first photo-mask onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, and projecting a second pattern from a second region of a second photo-mask onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peak thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 18
Dependent Claim
148 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern from a first region of a first photo-mask onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto, and projecting a second pattern from a second region of a second photo-mask onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peak thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 19
Dependent Claim
34 words
An exposure method according to claim 12, wherein said photosensitive material has a nonlinear sensitivity characteristic in which the latent image is formed according to the m-th power (m≠1) of intensity of incident light.
Claim 20
Dependent Claim
35 words
An exposure method according to claim 13, wherein said photosensitive material has a nonlinear sensitivity characteristic in which the latent image is formed according to the m-th power of intensity of incident light and m>1.
Claim 21
Dependent Claim
35 words
An exposure method according to claim 13, wherein said photosensitive material has a nonlinear sensitivity characteristic in which the latent image is formed according to the m-th power of intensity of incident light and m<1.
Claim 22
Dependent Claim
51 words
A method according to claim 12, wherein said first pattern includes a first line pattern extending in a first direction on said photosensitive material from said first photo-mask, and wherein said second pattern includes a second line pattern extending in a second direction on said photosensitive material from said second photo-mask.
Claim 23
Dependent Claim
15 words
A method according to claim 12, wherein said first photo-mask is a phase shifting mask.
Claim 24
Dependent Claim
27 words
A method according to claim 12, wherein said first photo-mask is a first phase shifting mask, and wherein said second photo-mask is a second phase shifting mask.
Claim 25
Dependent Claim
45 words
A method according to claim 12, wherein said first photo-mask is a phase shifting mask having an open portion between first and second opaque portion and a phase film arranged between said second opaque portion and third opaque portion adjacent to said second opaque portion.
Claim 26
Dependent Claim
97 words
A method according to claim 12, wherein said first photo-mask is a first phase shifting mask having an open portion between first and second opaque portions and a phase film arranged between said second opaque portion and a third opaque portion adjacent to said second opaque portion; and wherein said second photo-mask is a second phase shifting mask having an open portion between first and second opaque portions and a phase film arranged between said second opaque portion of said second photo-mask and a third opaque portion adjacent to said second opaque portion of said second photo-mask.
Claim 27
Dependent Claim
157 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern from a first region of a first photo-mask onto a photosensitive material through a transmitting film, wherein said transmitting film has such a property that intensity of outgoing light traveling through said transmitting is nonlinear to an intensity of incident light to be applied thereto, and projecting a second pattern from a second region of a second photo-mask onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 28
Dependent Claim
157 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern from a first region of a first photo-mask onto a photosensitive material through a transmitting film, wherein said transmitting film has such a property that intensity of outgoing light traveling through said transmitting is nonlinear to an intensity of incident light to be applied thereto, and projecting a second pattern from a second region of a second photo-mask onto said photosensitive material, wherein the respective intensity distributions of said first and second patterns projected on said photosensitive material are partially overlapped and the peaks thereof are isolated, wherein no portion of the positions occupied by said first and second regions, when said first and second patterns are respectively projected, is overlapped, and wherein a distance between the peaks of the intensity distributions is less than a distance defined by the limit of resolution of the projection optical system.
Claim 29
Dependent Claim
111 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a second pattern onto said photosensitive material, wherein said first pattern and said second pattern are different in intensity distribution in said photosensitive material, whereby a high-resolution pattern is formed over a resolution limit of the projection optical system, and wherein said first pattern includes a line pattern, and wherein light for projecting is polarized along longitudinal direction of said line pattern.
Claim 30
Dependent Claim
111 words
A projection exposure method using a projection optical system, said method comprising the steps of: projecting a first pattern onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a second pattern onto said photosensitive material, wherein said first pattern and said second pattern are different in intensity distribution in said photosensitive material, whereby a high-resolution pattern is formed over a resolution limit of the projection optical system, and wherein said first pattern includes a line pattern, and wherein light for projecting is polarized along longitudinal direction of said line pattern.
Claim 31
Dependent Claim
21 words
A method according to claim 22, wherein said first pattern is formed by light passed through a first phase shifting mask.
Claim 32
Dependent Claim
61 words
A projection exposure method comprising the steps of: forming a photosensitive material, wherein said photosensitive material has a nonlinear sensitivity characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a line pattern on said photosensitive material, wherein light for projecting is polarized along a longitudinal direction of said line pattern.
Claim 33
Dependent Claim
61 words
A projection exposure method comprising the steps of: forming a photosensitive material, wherein said photosensitive material has a nonlinear sensitivity characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a line pattern on said photosensitive material, wherein light for projecting is polarized along a longitudinal direction of said line pattern.
Claim 34
Dependent Claim
59 words
A projection exposure method comprising the steps of: forming a transmitting film on a photosensitive material, wherein said transmitting film has such a property that an intensity of outgoing light traveling through said transmitting film is nonlinear to an intensity of incident light to be applied thereto; and projecting a pattern onto said photosensitive material through said transmitting film.
Claim 35
Dependent Claim
59 words
A projection exposure method comprising the steps of: forming a transmitting film on a photosensitive material, wherein said transmitting film has such a property that an intensity of outgoing light traveling through said transmitting film is nonlinear to an intensity of incident light to be applied thereto; and projecting a pattern onto said photosensitive material through said transmitting film.
Claim 36
Dependent Claim
19 words
A method according to claim 25, wherein said pattern is formed by light passed through a phase shifting mask.
Claim 37
Dependent Claim
64 words
A projection exposure method comprising: forming a photosensitive material, wherein said photosensitive material has a nonlinear sensitivity characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; projecting a first line pattern extending in a first direction onto said photosensitive material; and projecting a second line pattern extending in a second direction onto said photosensitive material.
Claim 38
Dependent Claim
64 words
A projection exposure method comprising: forming a photosensitive material, wherein said photosensitive material has a nonlinear sensitivity characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; projecting a first line pattern extending in a first direction onto said photosensitive material; and projecting a second line pattern extending in a second direction onto said photosensitive material.
Claim 39
Dependent Claim
22 words
A method according to claim 27, wherein said first line pattern is formed by light passed through a first phase shifting mask.
Claim 40
Dependent Claim
39 words
A method according to claim 27, wherein said first line pattern is formed by light passed through a first phase shifting mask, and wherein said second line pattern is formed by light passed through a second phase masking mask.
Claim 41
Dependent Claim
100 words
A projection exposure method comprising the steps of: projecting a first pattern onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a second pattern onto said photosensitive material, wherein intensity distributions of said first pattern and said second pattern are different in said photosensitive material, wherein a distance between the peaks of the intensity distributions is less than the distance defined by the limit of resolution of a projection optical system used for projecting said first and second pattern.
Claim 42
Dependent Claim
100 words
A projection exposure method comprising the steps of: projecting a first pattern onto a photosensitive material, wherein said photosensitive material has a characteristic in which effective light intensity is nonlinear to an intensity of incident light to be applied thereto; and projecting a second pattern onto said photosensitive material, wherein intensity distributions of said first pattern and said second pattern are different in said photosensitive material, wherein a distance between the peaks of the intensity distributions is less than the distance defined by the limit of resolution of a projection optical system used for projecting said first and second pattern.
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