US5733405A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing apparatus
Assignee: Mitsubishi Electric Corp
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Filing: 1996-02-06
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Granted: 1998-03-31
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Expires: 2016-02-06
Abstract
Abstract A plasma processing apparatus capable of forming plasma uniformly throughout a large surface area whereby a sample having a large diameter can be uniformly processed. The plasma processing apparatus has a first electrode 3 on which a workpiece 2 is placed, a second electrode 4 located to face the first electrode 3, and a plurality of ring-shaped permanent magnets 11 each having the same polarity in their circumferential direction, and the magnets are disposed concentrically or the outer side of the second electrode 4 so that the polarities opposing in the radial direction of adjacent magnets 11 are opposite to each other.
Inventors
- 👤 Masakazu Taki
- 👤 Hiroki Ootera
- 👤 Tatsuo Oomori
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 01:43
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H10; H10P; H10P50/00; H01J37/3266
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
87 words
A plasma processing apparatus comprising: a first electrode on which a workpiece is placed; a second electrode located so as to face said first electrode; a plurality of ring-shaped magnets disposed on an outer surface of said second electrode and facing said first electrode, each of said magnets having the same polarity in its circumferential direction, and said plurality of ring-shaped magnets being concentrically arranged so that the polarities of adjacent magnets of said plurality of ring-shaped magnets are opposite to each other in the radial direction.
Claim 2
Dependent Claim
87 words
A plasma processing apparatus comprising: a first electrode on which a workpiece is placed; a second electrode located so as to face said first electrode; a plurality of ring-shaped magnets disposed on an outer surface of said second electrode and facing said first electrode, each of said magnets having the same polarity in its circumferential direction, and said plurality of ring-shaped magnets being concentrically arranged so that the polarities of adjacent magnets of said plurality of ring-shaped magnets are opposite to each other in the radial direction.
Claim 3
Dependent Claim
62 words
A plasma processing apparatus according to claim 1, wherein the intensity of a magnetic field formed by said plurality of ring-shaped magnets near said second electrode is 100 Gausses or more in its maximum value, and the intensity of a magnetic field formed by said plurality of ring-shaped magnets near said first electrode is 20 Gausses or less in its maximum value.
Claim 4
Dependent Claim
22 words
A plasma processing apparatus according to claim 2, wherein a second magnet is disposed at the central portion of the ring-shaped magnets.
Claim 5
Dependent Claim
45 words
A plasma processing apparatus according to claim 3, wherein the intensity of the magnetic field at the front surface of the second magnet disposed at the central portion of the ring-shaped magnets is greater than the intensity of the magnetic field of the ring-shaped magnets.
Claim 6
Dependent Claim
30 words
A plasma processing apparatus according to claim 1, wherein each of said plurality of ring-shaped magnets is comprised of a plurality of rectangular prism magnets arranged in a ring-shaped form.
Claim 7
Dependent Claim
24 words
A plasma processing apparatus according to claim 1, wherein a plurality of bar magnets are disposed on a circumferential wall of said processing apparatus.
Claim 8
Dependent Claim
22 words
A plasma processing apparatus according to claim 1, wherein said first electrode and said second electrode each have a separate power source.
Claim 9
Dependent Claim
23 words
A plasma processing apparatus according to claim 1, further comprising a reactant gas inlet which is disposed within said plurality of ring-shaped magnets.
Claim 10
Dependent Claim
82 words
A plasma processing apparatus comprising: a plasma producing chamber for producing plasma; magnetic means attached to an upper surface of said plasma producing chamber, and a processing chamber in which a workpiece is placed and which is partitioned by a partition plate having a plurality of openings from the plasma producing chamber, wherein a uniform distribution of plasma is produced in said plasma processing apparatus by supplying high frequency electric power and by applying a magnetic field formed by said magnetic means.
Claim 11
Dependent Claim
82 words
A plasma processing apparatus comprising: a plasma producing chamber for producing plasma; magnetic means attached to an upper surface of said plasma producing chamber, and a processing chamber in which a workpiece is placed and which is partitioned by a partition plate having a plurality of openings from the plasma producing chamber, wherein a uniform distribution of plasma is produced in said plasma processing apparatus by supplying high frequency electric power and by applying a magnetic field formed by said magnetic means.
Claim 12
Dependent Claim
87 words
A plasma processing chamber according to claim 9, wherein an electrode is disposed in the plasma producing chamber to face the partition plate so that a high frequency electric power is applied to the electrode; said magnetic means is composed of a plurality of ring-shaped magnets each having the same polarity in its circumferential direction, and the ring-shaped magnets are disposed concentrically at the rear side of the electrode so that the polarities opposing in the radial direction of adjacent ring-shaped magnets are opposite to each other.
Claim 13
Dependent Claim
39 words
A plasma processing apparatus according to claim 10, wherein the electrode disposed to face the partition plate is applied with a first high frequency electric power, and the partition plate is applied with a second high frequency electric power.
Claim 14
Dependent Claim
77 words
A plasma processing apparatus according to claim 9, wherein the partition plate is applied with a high frequency electric power; said magnetic means is composed of a plurality of ring-shaped magnets each having the same polarity in its circumferential direction, and the ring-shaped magnets are disposed concentrically in the plasma producing chamber at a position opposing the partition plate so that the polarities opposing in the radial direction of adjacent ring-shaped magnets are opposite to each other.
Claim 15
Dependent Claim
25 words
A plasma processing apparatus according to claim 9, further comprising means for supplying a gas to the plasma producing chamber as a series of pulses.
Claim 16
Dependent Claim
25 words
A plasma processing apparatus according to claim 10, further comprising means for supplying a gas to the plasma producing chamber as a series of pulses.
Claim 17
Dependent Claim
25 words
A plasma processing apparatus according to claim 11, further comprising means for supplying a gas to the plasma producing chamber as a series of pulses.
Claim 18
Dependent Claim
24 words
A plasma processing apparatus according to claim 9, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
Claim 19
Dependent Claim
24 words
A plasma processing apparatus according to claim 10, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
Claim 20
Dependent Claim
24 words
A plasma processing apparatus according to claim 11, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
Claim 21
Dependent Claim
24 words
A plasma processing apparatus according to claim 13, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
Claim 22
Dependent Claim
24 words
A plasma processing apparatus according to claim 14, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
Claim 23
Dependent Claim
24 words
A plasma processing apparatus according to claim 15, wherein high frequency electric power is applied to a stage on which the workpiece is placed.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-03-30 | 2001-09-29 | 2002-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-03-30 | 2005-09-29 | 2006-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-03-30 | 2009-09-29 | 2010-03-31 | $7700.00 | Window Closed / Lapsed |