Method of making a planar color filter array for CCDS from dyed and mordant layers

Claim 1

A method of making a solid state image sensor having a color filter array with non-overlapping, coplanar color filter elements, the method comprising: (a) providing a semiconductor substrate having spaced image pixels; (b) depositing at least one transparent support layer over the pixels and making the support layer optically planar by chemical mechanical polishing; (c) providing a first color filter layer on the planar surface of the support layer; (d) depositing a first protective film; (e) patterning the protective film and the first color filter layer to provide said first color filter elements; (f) providing a second color filter layer; and (g) planarizing the second color filter layer to the extent that the second color filter layer is entirely removed over the first color filter elements to provide second color filter elements.

Claim 2

A method of making a solid state image sensor having a color filter array with non-overlapping, coplanar color filter elements, the method comprising: (a) providing a semiconductor substrate having spaced image pixels; (b) depositing at least one transparent support layer over the pixels and making the support layer optically planar by chemical mechanical polishing; (c) providing a first color filter layer on the planar surface of the support layer; (d) depositing a first protective film; (e) patterning the protective film and the first color filter layer to provide said first color filter elements; (f) providing a second color filter layer; and (g) planarizing the second color filter layer to the extent that the second color filter layer is entirely removed over the first color filter elements to provide second color filter elements.

Claim 6

A method of making a solid state image sensor having a color filter array with non-overlapping, coplanar color filter elements, the method comprising the steps of: (a) providing a semiconductor substrate having spaced image pixels; (b) depositing at least one transparent support layer over the pixels and making the support layer optically planar by chemical mechanical polishing; (c) providing a first color filter layer on the optically planar surface of the support layer; (d) patterning the first color filter layer to provide first color falter elements having sidewalls; (e) conformally depositing a protective film on the first color filter elements, on the sidewalls, and on the support layer between the first color filter elements; (f) providing a second color filter layer on the first protective film; (g) planarizing the second color filter layer by chemical mechanical polishing to the extent that the second color filter layer is entirely removed over the first color filter elements to provide isolated second color filter elements.

Claim 7

A method of making a solid state image sensor having a color filter array with non-overlapping, coplanar color filter elements, the method comprising the steps of: (a) providing a semiconductor substrate having spaced image pixels; (b) depositing at least one transparent support layer over the pixels and making the support layer optically planar by chemical mechanical polishing; (c) providing a first color filter layer on the optically planar surface of the support layer; (d) patterning the first color filter layer to provide first color falter elements having sidewalls; (e) conformally depositing a protective film on the first color filter elements, on the sidewalls, and on the support layer between the first color filter elements; (f) providing a second color filter layer on the first protective film; (g) planarizing the second color filter layer by chemical mechanical polishing to the extent that the second color filter layer is entirely removed over the first color filter elements to provide isolated second color filter elements.

Claim 11

A method of making a solid state image sensor having a color filter array with color filter elements separated by vertical diffusion barriers, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with a support layer covering the pixels; (b) making the support layer optically planar by chemical mechanical polishing; (c) depositing a first color filter layer on the support layer which can be etched to the support layer; (d) patterning openings in regions of the first color filter layer thereby forming first color filter elements having sidewalls; (e) conformally depositing a first protective film on the first color filter elements, on the sidewalls, and on the support layer between the first color filter elements; (f) providing a second color filter layer at least filling the patterned openings in the first color filter layer; (g) providing the second color filter layer and the first protective film from over the first color filter elements; (h) removing selective first or second color filter elements to form openings; (i) coating a third color filter layer which fills the openings; (j) removing the third color filter layer from the top surface of the first and second color filter elements making the top surface of the third color filter layer substantially coplanar with the top surface of the first and second color filter elements; (k) repeating steps (i) and (j) at least once to provide additional color filter elements having different spectral transmission characteristics from the first, second, and third color filter elements and from each other.

Claim 12

A method of making a solid state image sensor having a color filter array with color filter elements separated by vertical diffusion barriers, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with a support layer covering the pixels; (b) making the support layer optically planar by chemical mechanical polishing; (c) depositing a first color filter layer on the support layer which can be etched to the support layer; (d) patterning openings in regions of the first color filter layer thereby forming first color filter elements having sidewalls; (e) conformally depositing a first protective film on the first color filter elements, on the sidewalls, and on the support layer between the first color filter elements; (f) providing a second color filter layer at least filling the patterned openings in the first color filter layer; (g) providing the second color filter layer and the first protective film from over the first color filter elements; (h) removing selective first or second color filter elements to form openings; (i) coating a third color filter layer which fills the openings; (j) removing the third color filter layer from the top surface of the first and second color filter elements making the top surface of the third color filter layer substantially coplanar with the top surface of the first and second color filter elements; (k) repeating steps (i) and (j) at least once to provide additional color filter elements having different spectral transmission characteristics from the first, second, and third color filter elements and from each other.

Claim 14

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels overlying a support layer; (b) making the support layer optically planar by chemical mechanical polishing; (c) depositing a first mordant layer having sidewalls on the support layer; (d) etching openings in the first mordant layer thereby forming first mordant elements; (e) conformally depositing a protective layer on the first mordant elements, on the sidewalls, and on the support layer in between the first mordant elements; (f) depositing a second mordant layer over the protective layer; (g) removing the second mordant layer and the protective layer from over the first mordant elements by chemical mechanical polishing to form second mordant elements; (h) providing a dye mask with openings substantially within the pixels where color filter elements of a like kind are to be formed; (i) exposing the dye mask and openings to a dye bath to provide color filter elements of a like kind; and (j) repeating steps (h) and (i) at least once to provide additional color filter elements of a like kind but having different spectral transmission characteristics.

Claim 15

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels overlying a support layer; (b) making the support layer optically planar by chemical mechanical polishing; (c) depositing a first mordant layer having sidewalls on the support layer; (d) etching openings in the first mordant layer thereby forming first mordant elements; (e) conformally depositing a protective layer on the first mordant elements, on the sidewalls, and on the support layer in between the first mordant elements; (f) depositing a second mordant layer over the protective layer; (g) removing the second mordant layer and the protective layer from over the first mordant elements by chemical mechanical polishing to form second mordant elements; (h) providing a dye mask with openings substantially within the pixels where color filter elements of a like kind are to be formed; (i) exposing the dye mask and openings to a dye bath to provide color filter elements of a like kind; and (j) repeating steps (h) and (i) at least once to provide additional color filter elements of a like kind but having different spectral transmission characteristics.

Claim 16

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with a lower support layer covering the pixels; (b) making the lower support layer optically planar by chemical mechanical polishing; (c) depositing an upper support layer which can be etched preferentially to the lower support layer; (d) removing portions of the upper support layer in regions where color filter elements are to be formed; (e) coating a single mordant layer which fills the regions where the upper support layer was removed; (f) removing the single mordant layer entirely from over the remaining portions of the upper support layer to form mordant elements separated by said remaining portions of the upper support layer, the top surface of the single mordant elements being substantially coplanar with the top surface of the remaining portions of the upper support layer; (g) providing a dye mask with openings substantially within single mordant elements where color filter elements of a like kind are to be formed; (h) exposing the dye mask and the openings to a dye bath to provide color filter elements of a like kind; and (i) repeating steps (g) and (h) at least once to provide additional color filter elements having different spectral transmission characteristics.

Claim 17

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with a lower support layer covering the pixels; (b) making the lower support layer optically planar by chemical mechanical polishing; (c) depositing an upper support layer which can be etched preferentially to the lower support layer; (d) removing portions of the upper support layer in regions where color filter elements are to be formed; (e) coating a single mordant layer which fills the regions where the upper support layer was removed; (f) removing the single mordant layer entirely from over the remaining portions of the upper support layer to form mordant elements separated by said remaining portions of the upper support layer, the top surface of the single mordant elements being substantially coplanar with the top surface of the remaining portions of the upper support layer; (g) providing a dye mask with openings substantially within single mordant elements where color filter elements of a like kind are to be formed; (h) exposing the dye mask and the openings to a dye bath to provide color filter elements of a like kind; and (i) repeating steps (g) and (h) at least once to provide additional color filter elements having different spectral transmission characteristics.

Claim 18

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with an overlying support layer having an optically planar surface; (b) coating a single mordant layer on the planar surface of the support layer; (c) removing portions of the single mordant layer entirely from over the support layer to form single mordant elements; (d) conformally depositing a protective layer over and in between the single mordant elements; (e) removing entirely the protective layer from over the single mordant elements; (f) providing a dye mask with openings substantially within single mordant elements where color filter elements of a like kind are to be formed; (g) exposing the dye mask and the openings to a dye bath to provide color filter elements of a like kind; and (h) repeating steps (f) and (g) at least once to provide additional color filter elements having different spectral transmission characteristics.

Claim 19

A method of making a solid state image sensor color filter from dyeable mordant elements separated at all adjacent vertical sidewalls by a protective film which is a dye diffusion barrier, the method comprising: (a) providing a semiconductor substrate having spaced image pixels with an overlying support layer having an optically planar surface; (b) coating a single mordant layer on the planar surface of the support layer; (c) removing portions of the single mordant layer entirely from over the support layer to form single mordant elements; (d) conformally depositing a protective layer over and in between the single mordant elements; (e) removing entirely the protective layer from over the single mordant elements; (f) providing a dye mask with openings substantially within single mordant elements where color filter elements of a like kind are to be formed; (g) exposing the dye mask and the openings to a dye bath to provide color filter elements of a like kind; and (h) repeating steps (f) and (g) at least once to provide additional color filter elements having different spectral transmission characteristics.