Patent US1306674A successfully refreshed from Google Patents.
US5709593A
Expired / Lapsed
US
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Apparatus and method for distribution of slurry in a chemical mechanical polishing system
Assignee: Applied Materials Inc
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Filing: 1995-10-27
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Granted: 1998-01-20
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Expires: 2015-10-27
Abstract
Abstract Slurry is provided to the surface of the polishing pad by pumping the slurry up through a central port, or by dripping the slurry down onto the surface of the polishing pad from a slurry feed tube. A slurry wiper, which may have one or more flexible members, sweeps the slurry evenly and thinly across the polishing pad. A control system coordinates the distribution of slurry to the polishing pad with the motion of the carrier head.
Inventors
- 👤 William L. Guthrie
- 👤 Semyon Spektor
- 👤 Ivan A. Ocanada
- 👤 Norm Shendon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 14:14
CPC Classifications
B; B24; B24B; B24B37/00; B24B37/04; B24B1/00; B24B1/04; B24B57/00; B24B57/02
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
72 words
A chemical mechanical polishing apparatus, comprising: a rotating polishing pad; a dispenser for providing a slurry to a surface of said polishing pad; and a flexible member disposed above said surface of said polishing pad and positioned so that, as said slurry passes beneath said flexible member, a bottom edge of said flexible member contacts said slurry and distributes it as a substantially uniform film across said surface of said polishing pad.
Claim 2
Dependent Claim
72 words
A chemical mechanical polishing apparatus, comprising: a rotating polishing pad; a dispenser for providing a slurry to a surface of said polishing pad; and a flexible member disposed above said surface of said polishing pad and positioned so that, as said slurry passes beneath said flexible member, a bottom edge of said flexible member contacts said slurry and distributes it as a substantially uniform film across said surface of said polishing pad.
Claim 3
Dependent Claim
25 words
The apparatus of claim 1 wherein said flexible member extends from an edge of said polishing pad substantially to a center of said polishing pad.
Claim 4
Dependent Claim
12 words
The apparatus of claim 2 wherein said flexible member is substantially linear.
Claim 5
Dependent Claim
18 words
The apparatus of claim 1 wherein there is a gap separating said flexible member from said polishing pad.
Claim 6
Dependent Claim
16 words
The apparatus of claim 1 wherein said flexible member contacts said surface of said polishing pad.
Claim 7
Dependent Claim
19 words
The apparatus of claim 1 further comprising a second flexible member disposed above said surface of said polishing pad.
Claim 8
Dependent Claim
13 words
The apparatus of claim 1 wherein said flexible member includes an angled edge.
Claim 9
Dependent Claim
37 words
The apparatus of claim 1 further comprising a rigid arm which extends from an edge of said polishing pad substantially to a center of said polishing pad, and wherein said flexible member is connected to said arm.
Claim 10
Dependent Claim
25 words
The apparatus of claim 8 further comprising a rotary motor connected to said arm to move said arm over said surface of said polishing pad.
Claim 11
Dependent Claim
109 words
A chemical mechanical polishing apparatus, comprising: a rotating polishing pad; a dispenser for providing a slurry to a surface of said polishing pad; an arm which extends from an edge of said polishing pad substantially to a center of said polishing pad; a motor connected to said arm to move said arm over said polishing pad surface; a flexible member connected to said arm and disposed above said polishing pad surface to sweep slurry across said polishing pad; a carrier head to press a substrate against said polishing pad; and a control system to control the motion of said carrier head and said arm to prevent a collision therebetween.
Claim 12
Dependent Claim
109 words
A chemical mechanical polishing apparatus, comprising: a rotating polishing pad; a dispenser for providing a slurry to a surface of said polishing pad; an arm which extends from an edge of said polishing pad substantially to a center of said polishing pad; a motor connected to said arm to move said arm over said polishing pad surface; a flexible member connected to said arm and disposed above said polishing pad surface to sweep slurry across said polishing pad; a carrier head to press a substrate against said polishing pad; and a control system to control the motion of said carrier head and said arm to prevent a collision therebetween.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-01-19 | 2001-07-21 | 2002-01-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-01-19 | 2005-07-21 | 2006-01-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-01-19 | 2009-07-21 | 2010-01-20 | $7700.00 | Window Closed / Lapsed |