US5707899A
Expired / Lapsed
US
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SOI structure with a deep thin oxide layer prepared by ION implantation at high energy followed by thermal treatment
Assignee: Istituto Guido Donegani SpA
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Filing: 1994-09-07
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Granted: 1998-01-13
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Expires: 2014-09-07
Abstract
Abstract A process for preparing an SOI structure with a deep thin oxide layer which comprises, in succession, a first ion implantation at an oxygen fluence within the range of 10 15 -10 16 ions/cm 2 , thermal treatment at a temperature within the range of 600°-900° C., a second ion implantation at an oxygen fluence within the range of 2×10 17 -8×10 17 ions/cm 2 , and a final thermal treatment at a temperature within the range of 1150°-1400° C.
Inventors
- 👤 Gianfranco Cerofolini
- 👤 Laura Meda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 04:52
CPC Classifications
H; H10; H10P; H10P30/00; H10P30/20; H10P30/208; H10P30/209; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10P90/1908; H10W; H10W10/00; H10W10/10; H10W10/181
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
89 words
A process for preparing an SOI structure with a deep thin oxide layer, having a thickness between 80 nm and 150 nm, comprising the following stages in succession: a first ion implantation at an oxygen fluence within the range of 10 15 -10 16 ions/cm 2 ; thermal treatment at a temperature within the range of 600°-900° C.; a second ion implantation at an oxygen fluence within the range of 2×10 17 -8×10 17 ions/cm 2 ; final thermal treatment at a temperature within the range of 1150°-1400° C.
Claim 2
Dependent Claim
89 words
A process for preparing an SOI structure with a deep thin oxide layer, having a thickness between 80 nm and 150 nm, comprising the following stages in succession: a first ion implantation at an oxygen fluence within the range of 10 15 -10 16 ions/cm 2 ; thermal treatment at a temperature within the range of 600°-900° C.; a second ion implantation at an oxygen fluence within the range of 2×10 17 -8×10 17 ions/cm 2 ; final thermal treatment at a temperature within the range of 1150°-1400° C.
References Cited (Backward Citations)
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Cited
US4749660A
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Cited
US4975126A
Cited
US5238858A
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US5080730A
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US5143858A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2001-01-12 | 2001-07-14 | 2002-01-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2005-01-12 | 2005-07-14 | 2006-01-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2009-01-12 | 2009-07-14 | 2010-01-13 | $7700.00 | Window Closed / Lapsed |