US5691541A
Expired / Lapsed
US
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Maskless, reticle-free, lithography
Assignee: University of California
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Filing: 1996-05-14
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Granted: 1997-11-25
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Expires: 2016-05-14
Abstract
Abstract A lithography system in which the mask or reticle, which usually carries the pattern to be printed onto a substrate, is replaced by a programmable array of binary (i.e. on/off) light valves or switches which can be programmed to replicate a portion of the pattern each time an illuminating light source is flashed. The pattern of light produced by the programmable array is imaged onto a lithographic substrate which is mounted on a scanning stage as is common in optical lithography. The stage motion and the pattern of light displayed by the programmable array are precisely synchronized with the flashing illumination system so that each flash accurately positions the image of the pattern on the substrate. This is achieved by advancing the pattern held in the programmable array by an amount which corresponds to the travel of the substrate stage each time the light source flashes. In this manner the image is built up of multiple flashes and an isolated defect in the array will only have a small effect on the printed pattern. The method includes projection lithographies using radiation other than optical or ultraviolet light. The programmable array of binary switches would be used to control extreme ultraviolet (EUV), x-ray, or electron, illumination systems, obviating the need for stable, defect free masks for projection EUV, x-ray, or electron, lithographies.
Inventors
- 👤 Natale M. Ceglio
- 👤 David A. Markle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 20:52
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/70791; G03F7/70008; G03F7/70041; G03F7/70216; G03F7/70283; G03F7/70291; G03F7/70425; G03F7/70475; G03F7/70716; G03F7/70725
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
97 words
A maskless lithography system comprising; a programmable array of binary light switches (PABLS), said programmable array comprising active elements that can be digitally programmed to direct, or not direct, incident light into a fixed pupil location, a pulsed or strobed radiation source that illuminates the programmable array with a sequence of pulses, a projection system that images the array pattern onto a substrate, and a scanning substrate stage that is in motion during the sequence of pulses but which moves only a small fraction of a minimum feature size during the time duration of a single pulse.
Claim 2
Dependent Claim
97 words
A maskless lithography system comprising; a programmable array of binary light switches (PABLS), said programmable array comprising active elements that can be digitally programmed to direct, or not direct, incident light into a fixed pupil location, a pulsed or strobed radiation source that illuminates the programmable array with a sequence of pulses, a projection system that images the array pattern onto a substrate, and a scanning substrate stage that is in motion during the sequence of pulses but which moves only a small fraction of a minimum feature size during the time duration of a single pulse.
Claim 3
Dependent Claim
14 words
The lithography system of claim 1 wherein the PABLS comprises a digital micro-mirror device.
Claim 4
Dependent Claim
35 words
The lithography system of claim 1 further comprising a staggered collection of programmable arrays arranged so that the edges of the active element arrays are aligned with each other and with the direction of scanning.
Claim 5
Dependent Claim
36 words
The lithography system of claim 1 wherein said pulsed radiation source comprises a pulsed laser or photodiode array as a source of visible or ultraviolet radiation with an exposing wavelength between 7000 Å and 1200 Å.
Claim 6
Dependent Claim
25 words
The lithography system of claim 4 wherein the pulsed laser is an excimer laser, a copper vapor laser or a diode pumped solid state laser.
Claim 7
Dependent Claim
24 words
The lithography system of claim 1 wherein said pulsed radiation source comprises a continuous radiation emitter which is modulated by a high frequency shutter.
Claim 8
Dependent Claim
32 words
The lithography system of claim 1 wherein said pulsed radiation source comprises a pulsed source of extreme ultraviolet (EUV) or soft x-ray radiation with a wavelength between 50 Å and 200 Å.
Claim 9
Dependent Claim
16 words
The lithography system of claim 7 wherein the programmable array comprises EUV or soft x-ray mirrors.
Claim 10
Dependent Claim
93 words
The lithography system of claim 1 wherein the pulsed radiation source is a light source and the projection system includes a projection lens with a pupil, and further comprising an illumination system containing a relay lens to bring the light from the source into a light pipe or fly's eye lens array, a number of imaging lenses and/or mirrors to image light exiting the light pipe or fly's eye lens array in a uniform distribution onto the programmable array, and an illumination pupil which is imaged onto the pupil of the projection lens.
Claim 11
Dependent Claim
56 words
The lithography system of claim 1 further comprising an electronic control system that coordinates the transfer of digital image data from a memory to the programmable array between radiation pulses and the triggering of the radiation source when the substrate on the scanning stage is correctly positioned to receive the image stored in the programmable array.
Claim 12
Dependent Claim
19 words
The lithography system of claim 10 wherein said control system exposes each geometry on the substrate with multiple pulses.
Claim 13
Dependent Claim
50 words
The lithography system of claim 11 wherein said control system varies the position of the image edges on the substrate between pulses so as to achieve precise control of the position of each edge to within a small fraction (<0.5) of the projected size of a single programmable array pixel.
Claim 14
Dependent Claim
58 words
The lithography system of claim 10 wherein said control system electronically adjusts the scale and distortion of the image in the programmable array so as to compensate for distortion inherent in the projection system and/or distortion caused by process induced or other changes in the scale and overall geometrical fidelity of the previous patterns printed on the substrate.
Claim 15
Dependent Claim
51 words
The lithography system of claim 10 wherein said control system electronically introduces image distortions that are equal in magnitude and opposite in sign to the distortions caused by imperfections in the positioning of the programmable array elements with respect to each other so that the resulting, image contains no geometrical imperfections.
Claim 16
Dependent Claim
42 words
The lithography system of claim 1 wherein said programmable array is programmed to scan and align the position of the image in the programmable array so that it is optimally positioned and oriented with respect to previously printed patterns on the substrate.
Claim 17
Dependent Claim
33 words
The lithography system of claim 1 further comprising; a photocathode that receives the projected image of the programmable array and generates photoelectrons, and an electron lens which images the photoelectrons onto the substrate.
Claim 18
Dependent Claim
19 words
The lithography system of claim 16 wherein the photocathode comprises a negative electron affinity material or electron photoemissive material.
Claim 19
Independent Claim
87 words
A method for maskless lithography comprising; programming a programmable array of binary light switches (PABLS) to reflect a desired array pattern, said programmable array comprising active elements that can be digitally programmed to direct, or not direct, incident light into a fixed pupil location, illuminating the programmable array with a sequence of radiation pulses, imaging the array pattern onto a substrate, and moving the substrate during the sequence of pulses but only a small fraction of a minimum feature size during the time of a single pulse.
Claim 20
Independent Claim
87 words
A method for maskless lithography comprising; programming a programmable array of binary light switches (PABLS) to reflect a desired array pattern, said programmable array comprising active elements that can be digitally programmed to direct, or not direct, incident light into a fixed pupil location, illuminating the programmable array with a sequence of radiation pulses, imaging the array pattern onto a substrate, and moving the substrate during the sequence of pulses but only a small fraction of a minimum feature size during the time of a single pulse.
Claim 21
Dependent Claim
32 words
The method of claim 18 further comprising forming the programmable array of active elements that can be digitally programmed to direct, or not to direct, incident light into a fixed pupil location.
Claim 22
Dependent Claim
36 words
The method of claim 18 wherein the step of imaging the array pattern onto the substrate further comprises: receiving the array pattern image on a photocathode to generate photoelectrons, and imaging the photoelectrons onto the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-11-24 | 2001-05-26 | 2001-11-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-11-24 | 2005-05-26 | 2005-11-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-11-24 | 2009-05-26 | 2009-11-25 | $7700.00 | Window Closed / Lapsed |