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US5675691A Expired / Lapsed US ⏱️ 0.0 years remaining

Diffraction gratings in optical waveguide components and production method thereof

Assignee: Oerlikon Surface Solutions AG Pfaeffikon
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Filing: 1995-12-11
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Granted: 1997-10-07
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Expires: 2015-12-11
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Abstract

Abstract A diffraction grating structure for coupling light into or out of a high refractive index waveguide layer on a carrier substrate is formed by irradiating the carrier substrate and/or the layer with UV laser light that is subject to simultaneous, spatially periodic intensity modulation. The modulation may be achieved, for example, by a biprism. The modulated UV light has the effect of periodically modulating the local refractive index of the waveguide layer or of the surface of the substrate to form the diffraction grating.

Inventors

  • 👤 Johannes Edlinger
  • 👤 Helmut Rudigier

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 23:15
CPC Classifications
G; G02; G02B; G02B6/00; G02B6/10; G02B6/12; G02B6/13

Claims Analysis

Total Claims: 36
Claim 1
Independent Claim 58 words
A process for producing a diffraction grating structure for coupling light into and/or out of at least one dopant-free high refractive index dielectric layer on a dopant-free carrier substrate, consisting of the step of irradiating at least one of the high refractive index dielectric layer and carrier substrate with UV laser light with simultaneous spatially periodic intensity modulation.
Claim 2
Dependent Claim 58 words
A process for producing a diffraction grating structure for coupling light into and/or out of at least one dopant-free high refractive index dielectric layer on a dopant-free carrier substrate, consisting of the step of irradiating at least one of the high refractive index dielectric layer and carrier substrate with UV laser light with simultaneous spatially periodic intensity modulation.
Claim 3
Dependent Claim 21 words
The process according to claim 1, wherein the intensity modulation is generated by at least two mutually interfering UV laser beams.
Claim 4
Dependent Claim 14 words
The process according to claim 1, wherein the intensity modulation is mask structure generated.
Claim 5
Dependent Claim 19 words
The process according to claim 1, wherein the UV laser light is generated by at least one excimer laser.
Claim 6
Dependent Claim 16 words
The process according to claim 1, wherein the UV laser light is pulsed at least once.
Claim 7
Dependent Claim 20 words
The process according to claim 5, wherein a duration of the at least one pulse is less than 1 μs.
Claim 8
Dependent Claim 19 words
The process according to claim 5, wherein a duration of the at least one pulse is approximately 20 ns.
Claim 9
Dependent Claim 35 words
The process according to claim 1, wherein the refractive index of at least one of the high refractive index layer and a surface region of the carrier substrate is spatially modulated by the laser light.
Claim 10
Dependent Claim 23 words
The process according to claim 1, wherein the layer thickness of the high refractive index layer is ablation modulated by the laser light.
Claim 11
Dependent Claim 26 words
The process according to claim 1, wherein the surface of the substrate is ablation modulated by the laser light before applying the high refractive index layer.
Claim 12
Dependent Claim 66 words
The process according to claim 1, wherein materials used at least as one component of the high refractive index dielectric layer are selected from the group essentially consisting of Tio 2 , Ta 2 O 5 , HfO 2 , Al 2 O 3 , Nb 2 O 5 , Y 2 O 3 , ZrO 2 and the nitrides and oxynitrides of Al, Si, Hf.
Claim 13
Dependent Claim 29 words
The process according to claim 1, further comprising the step of mixing a low refractive index material into a high refractive index material of the high refractive index layer.
Claim 14
Dependent Claim 16 words
The process according to claim 12, wherein the low refractive index material is SiO 2 .
Claim 15
Dependent Claim 50 words
The process according to claim 1, further comprising the step of applying a layer of low refractive index material, with a thickness of no greater than 20 nm between at least one of the high refractive index layer and the substrate and the high refractive index layer and the environment.
Claim 16
Dependent Claim 16 words
The process according to claim 13, wherein the low refractive index material is SiO 2 .
Claim 17
Dependent Claim 26 words
The process according to claim 1, wherein the grating structure is produced on a generally flat substrate for coupling light of 490 nm ≦ λ1200 nm.
Claim 18
Dependent Claim 28 words
The process according to claim 1, wherein a carrier substrate material is selected from the group consisting essentially of a glass, a ceramic, and a predominantly organic material.
Claim 19
Dependent Claim 49 words
The process according to claim 1, further comprising the steps of applying a sacrificial layer of predetermined layer thickness with an ablation threshold lower than an ablation threshold of the carrier substrate to the carrier substrate, and ablating the sacrificial layer by the light irradiated to the carrier substrate.
Claim 20
Dependent Claim 55 words
The process according to claim 1, further comprising the steps of applying a sacrificial layer of predetermined layer thickness with an ablation threshold lower than an ablation threshold of the high refractive index layer to the high refractive index layer, and ablating the sacrificial layer by the light irradiated to the high refractive index layer.
Claim 21
Dependent Claim 19 words
The process according to claim 1, wherein the grating is produced with variable periods or as a curved grating.
Claim 22
Dependent Claim 23 words
The process according to claim 1, wherein the grating surface is determined by at least one aperture in the UV laser beam path.
Claim 23
Dependent Claim 90 words
A waveguide arrangement comprising a waveguide section and at least one light input/output area, said waveguide section and said area comprising a carrier substrate of a first material and thereon at least one dielectric high refractive index waveguide layer of a second material, said first and second materials being selected exclusively according to predetermined requirements for said waveguide section so as to be dopant-free, said input/output area comprising a diffraction grating structure formed by periodic modulation of a refractive index of at least one of said first and second materials.
Claim 24
Dependent Claim 90 words
A waveguide arrangement comprising a waveguide section and at least one light input/output area, said waveguide section and said area comprising a carrier substrate of a first material and thereon at least one dielectric high refractive index waveguide layer of a second material, said first and second materials being selected exclusively according to predetermined requirements for said waveguide section so as to be dopant-free, said input/output area comprising a diffraction grating structure formed by periodic modulation of a refractive index of at least one of said first and second materials.
Claim 25
Dependent Claim 46 words
A waveguide component comprising a dopant-free carrier substrate coated with at least one dopant-free dielectric high refractive index waveguide layer; and a diffraction grating structure formed by periodic modulation of the refractive index of at least one of the waveguide layer and of the carrier substrate.
Claim 26
Dependent Claim 46 words
A waveguide component comprising a dopant-free carrier substrate coated with at least one dopant-free dielectric high refractive index waveguide layer; and a diffraction grating structure formed by periodic modulation of the refractive index of at least one of the waveguide layer and of the carrier substrate.
Claim 27
Dependent Claim 14 words
The waveguide component according to claim 23, wherein material of the substrate is non-photosensitive.
Claim 28
Dependent Claim 36 words
The waveguide component according to claim 24, wherein a period of the diffraction grating is sized for coupling at least into and out of the waveguide layer light with a wave length of 400 nm≦λ≦1200 nm.
Claim 29
Dependent Claim 36 words
The waveguide component according to claim 23, wherein a period of the diffraction grating is sized for coupling at least into and out of the waveguide layer light with a wave length of 400 nm≦λ≦1200 nm.
Claim 30
Dependent Claim 23 words
The waveguide component according to claim 23, wherein the high refractive index layer has a refractive index of N≧1.65 for 633 nm light.
Claim 31
Dependent Claim 63 words
The waveguide component according to claim 23, wherein material of the high refractive index layer comprises TiO 2 , Ta 2 O 5 , HfO 2 , Al 2 O 3 , Nb 2 O 5 , Y 2 O 3 , ZrO 2 , the nitrides and oxynitrides of Al, Si, Hf and mixtures of one or more of the foregoing compounds.
Claim 32
Dependent Claim 38 words
The waveguide component according to claim 23, wherein a low refractive index layer is arranged at least one of between the high refractive index layer and the carrier substrate, and the high refractive index layer and the environment.
Claim 33
Dependent Claim 26 words
The waveguide component according to claim 29, wherein the low refractive index layer is SiO 2 and has a thickness of no greater than 20 nm.
Claim 34
Dependent Claim 22 words
The waveguide component according to claim 23, wherein the carrier substrate consists of one of a glass, a ceramic and a plastic.
Claim 35
Dependent Claim 92 words
A process for producing a waveguide arrangement with a waveguide section and at least one light input/output area, comprising the steps of: providing a carrier of a first undoped material for said section and for said area; applying a layer of undoped high-refractive-index, dielectric second material on said carrier and along said section and said area; selecting said first and said second undoped materials exclusively according to predetermined requirements for said waveguide section; and generating a diffraction grating structure by applying simultaneously and spatially periodic intensity modulated UV-laser light to said area.
Claim 36
Dependent Claim 92 words
A process for producing a waveguide arrangement with a waveguide section and at least one light input/output area, comprising the steps of: providing a carrier of a first undoped material for said section and for said area; applying a layer of undoped high-refractive-index, dielectric second material on said carrier and along said section and said area; selecting said first and said second undoped materials exclusively according to predetermined requirements for said waveguide section; and generating a diffraction grating structure by applying simultaneously and spatially periodic intensity modulated UV-laser light to said area.

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3.5 Years (Year 4) 2000-10-06 2001-04-07 2001-10-07 $2000.00 Window Closed / Lapsed
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