US5667433A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Keyed end effector for CMP pad conditioner
Assignee: Bell Semiconductor LLC
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Filing: 1995-06-07
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Granted: 1997-09-16
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Expires: 2015-06-07
Abstract
Abstract A polishing pad conditioner has a grid with an abrasive surface for conditioning a polishing pad. Opposite the abrasive side of the grid, there is a back surface, having at least one key way, which extends at least partially into the back surface. A grid holder has a number of keys equal to the number of key ways in the back surface of the grid. The grid holder keys engage the grid key ways, thereby eliminating slippage between the grid and the grid holder. A mechanized arm is attached to the grid holder, and imparts a rotational and translational motion to the grid holder. A magnet may be used as an attachment means between the grid and the grid holder. The key ways of the grid and the keys of the grid holder may be arranged such that the grid holder can only receive the grid with the back surface of the grid facing the grid holder.
Inventors
- 👤 Thomas G. Mallon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 09:36
CPC Classifications
B; B24; B24B; B24B53/00; B24B53/017
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
299 words
A conditioner for being rotated relative to, and for being applied to, a polishing pad to condition the polishing pad for chemical mechanical polishing of a semiconductor wafer, comprising: an abrasive conditioning implement having an abrasive front surface for being rotated in a rotation plane and applied to the polishing pad to condition the polishing pad, the abrasive conditioning implement having a back surface disposed in a spaced apart, oppositely facing, relationship with the abrasive front surface; an abrasive conditioning implement holder system for receiving and holding the abrasive conditioning implement with the back surface oriented toward the abrasive conditioning implement holder system and exposing the front surface for conditioning the polishing pad, the abrasive conditioning implement holder system for rotating the abrasive conditioning implement in the rotation plane so that the front surface remains in the rotation plane during the rotation; an interlock system for locking the abrasive conditioning implement to the abrasive conditioning implement holder system to prevent relative rotation between the abrasive conditioning implement and the abrasive conditioning implement holder system while the abrasive conditioning implement is being rotated, and the abrasive conditioning implement holder system and the interlock system having; a holder for holding the abrasive conditioning implement; a key formed in the periphery of one of the abrasive conditioning implement and the abrasive conditioning implement holder system; a key way formed in the periphery of the other of the abrasive conditioning implement and the abrasive conditioning implement holder system and being configured to matingly receive the key when the abrasive conditioning implement is being held by the abrasive conditioning implement holder system; and a magnet disposed between the holder and the abrasive conditioning implement, and having a key way configured to matingly receive the key, for holding the abrasive conditioning implement to the holder.
Claim 2
Dependent Claim
299 words
A conditioner for being rotated relative to, and for being applied to, a polishing pad to condition the polishing pad for chemical mechanical polishing of a semiconductor wafer, comprising: an abrasive conditioning implement having an abrasive front surface for being rotated in a rotation plane and applied to the polishing pad to condition the polishing pad, the abrasive conditioning implement having a back surface disposed in a spaced apart, oppositely facing, relationship with the abrasive front surface; an abrasive conditioning implement holder system for receiving and holding the abrasive conditioning implement with the back surface oriented toward the abrasive conditioning implement holder system and exposing the front surface for conditioning the polishing pad, the abrasive conditioning implement holder system for rotating the abrasive conditioning implement in the rotation plane so that the front surface remains in the rotation plane during the rotation; an interlock system for locking the abrasive conditioning implement to the abrasive conditioning implement holder system to prevent relative rotation between the abrasive conditioning implement and the abrasive conditioning implement holder system while the abrasive conditioning implement is being rotated, and the abrasive conditioning implement holder system and the interlock system having; a holder for holding the abrasive conditioning implement; a key formed in the periphery of one of the abrasive conditioning implement and the abrasive conditioning implement holder system; a key way formed in the periphery of the other of the abrasive conditioning implement and the abrasive conditioning implement holder system and being configured to matingly receive the key when the abrasive conditioning implement is being held by the abrasive conditioning implement holder system; and a magnet disposed between the holder and the abrasive conditioning implement, and having a key way configured to matingly receive the key, for holding the abrasive conditioning implement to the holder.
Claim 3
Dependent Claim
142 words
The conditioner of claim 1 wherein the interlock system further comprises: an asymmetric pattern of keys formed in one of the abrasive conditioning implement and the abrasive conditioning implement holder system; and an asymmetric pattern of key ways formed in the other of the abrasive conditioning implement and the abrasive conditioning implement holder system and being configured to matingly receive the asymmetric pattern of keys when the abrasive conditioning implement is being held by the abrasive conditioning implement holder system, the asymmetric pattern being configured to allow the abrasive conditioning implement to be held in the abrasive conditioning implement holder system with the back surface oriented toward the abrasive conditioning implement holder system and to prevent the abrasive conditioning implement from being received by the abrasive conditioning implement holder system with the front face oriented toward the abrasive conditioning implement holder system.
Claim 4
Dependent Claim
85 words
A conditioner for conditioning a polishing pad comprising: a grid having: an abrasive surface for conditioning the polishing pad, a back surface opposite the abrasive surface, and, at least one key way extending at least partially into the back surface; a grid holder having a number of keys equal to the number of key ways in the back surface of the grid, the keys being configured and positioned for engagement into the grid key ways; and attachment means between the grid and the grid holder.
Claim 5
Dependent Claim
85 words
A conditioner for conditioning a polishing pad comprising: a grid having: an abrasive surface for conditioning the polishing pad, a back surface opposite the abrasive surface, and, at least one key way extending at least partially into the back surface; a grid holder having a number of keys equal to the number of key ways in the back surface of the grid, the keys being configured and positioned for engagement into the grid key ways; and attachment means between the grid and the grid holder.
Claim 6
Dependent Claim
31 words
The apparatus of claim 3 wherein the key ways of the grid extend completely through the grid, from the back surface of the grid to the abrasive surface of the grid.
Claim 7
Dependent Claim
42 words
The apparatus of claim 3 wherein the key ways of the grid and the keys of the grid holder are arranged such that the grid holder can only receive the grid with the back surface of the grid facing the grid holder..
Claim 8
Dependent Claim
13 words
The apparatus of claim 3 wherein the grid has a generally circular shape.
Claim 9
Dependent Claim
34 words
The apparatus of claim 3 wherein the grid further forms a honeycomb pattern of voids extending completely through the grid, from the back surface of the grid to the abrasive surface of the grid.
Claim 10
Dependent Claim
20 words
The apparatus of claim 3 wherein the abrasive surface of the grid further comprises an abrasive element in a binder.
Claim 11
Dependent Claim
11 words
The apparatus of claim 8 wherein the abrasive element comprises diamond.
Claim 12
Dependent Claim
10 words
The apparatus of claim 8 wherein the binder comprises nickel.
Claim 13
Dependent Claim
103 words
A conditioner for conditioning a polishing pad comprising: a grid having; an abrasive surface for conditioning the polishing pad, a back surface opposite the abrasive surface, and at least one key way extending at least partially into the back surface; the grid forming a honeycomb pattern of voids extending completely through the grid, from the back surface of the grid to the abrasive surface of the grid; and a grid holder having a number of keys equal to the number of key ways in the back surface of the grid, the keys being configured and positioned for engagement into the grid key ways.
Claim 14
Dependent Claim
103 words
A conditioner for conditioning a polishing pad comprising: a grid having; an abrasive surface for conditioning the polishing pad, a back surface opposite the abrasive surface, and at least one key way extending at least partially into the back surface; the grid forming a honeycomb pattern of voids extending completely through the grid, from the back surface of the grid to the abrasive surface of the grid; and a grid holder having a number of keys equal to the number of key ways in the back surface of the grid, the keys being configured and positioned for engagement into the grid key ways.
References Cited (Backward Citations)
US1380370A
Cited
US2099179A
Cited
US2541912A
Cited
US2662519A
Cited
US3623276A
Cited
US5472371A
Cited
US5486131A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-09-15 | 2001-03-17 | 2001-09-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-09-15 | 2005-03-17 | 2005-09-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-09-15 | 2009-03-17 | 2009-09-16 | $7700.00 | Window Closed / Lapsed |