US5664989A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Polishing pad, polishing apparatus and polishing method
Assignee: Toshiba Corp
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Filing: 1996-07-18
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Granted: 1997-09-09
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Expires: 2016-07-18
Abstract
Abstract A polishing pad comprises at least a first layer having a first main surface serving to polish a substrate to be polished and a second main surface, and a second layer positioned to face the second main surface of the first layer and having fine bags arranged therein, fluid being hermetically sealed in the fine bag.
Inventors
- 👤 Rempei Nakata
- 👤 Hisashi Kaneko
- 👤 Nobuo Hayasaka
- 👤 Takeshi Nishioka
- 👤 Yoshikuni Tateyama
- 👤 Yutaka Nakano
- 👤 Yasutaka Sasaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 16:22
CPC Classifications
B; B24; B24B; B24B7/00; B24B37/00; B24B37/11; B24B37/20; B24B37/22
Claims Analysis
Total Claims: 37
Claim 1
Independent Claim
64 words
A polishing pad, comprising at least: a first layer having a first main surface serving to polish a substrate and a second main surface; and a second layer arranged on said second main surface of the first layer and having fine bags therein, said fine bags being positionally fixed relative to each other and isolated from each other, said fine bags hermetically containing fluid.
Claim 2
Dependent Claim
64 words
A polishing pad, comprising at least: a first layer having a first main surface serving to polish a substrate and a second main surface; and a second layer arranged on said second main surface of the first layer and having fine bags therein, said fine bags being positionally fixed relative to each other and isolated from each other, said fine bags hermetically containing fluid.
Claim 3
Dependent Claim
12 words
The polishing pad according to claim 1, wherein said fluid is gaseous.
Claim 4
Dependent Claim
25 words
The polishing pad according to claim 1, wherein each of said fine bags has a substantially flat upper surface and a substantially flat lower surface.
Claim 5
Dependent Claim
27 words
The polishing pad according to claim 1, wherein a percentage of fine bag area based on the entire surface of the polishing pad is at least 50%.
Claim 6
Dependent Claim
31 words
The polishing pad according to claim 4, wherein a percentage of fine bag area based on the entire surface of the polishing pad falls within a range of 60% and 90%.
Claim 7
Dependent Claim
14 words
The polishing pad according to claim 1, wherein said fine bags are regularly arranged.
Claim 8
Dependent Claim
30 words
The polishing pad according to claim 1, wherein each of said fine bags has a volume falling within a range of between 0.1 cm 3 and 15 cm 3 .
Claim 9
Dependent Claim
30 words
The polishing pad according to claim 7, wherein each of said fine bags has a volume falling within a range of between 0.1 cm 3 and 10 cm 3 .
Claim 10
Dependent Claim
19 words
The polishing pad according to claim 1, wherein a reinforcing layer is interposed between said first and second layers.
Claim 11
Dependent Claim
48 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; a base body having fine bags fixed thereto, said fine bags being isolated from each other; and a polishing pad interposed between said means for holding or pressing said substrate and said base body.
Claim 12
Dependent Claim
48 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; a base body having fine bags fixed thereto, said fine bags being isolated from each other; and a polishing pad interposed between said means for holding or pressing said substrate and said base body.
Claim 13
Dependent Claim
15 words
The polishing apparatus according to claim 10, wherein said base body is a rotatable plate.
Claim 14
Dependent Claim
16 words
The polishing apparatus according to claim 10, wherein fluid is hermetically sealed in said fine bags.
Claim 15
Dependent Claim
12 words
The polishing apparatus according to claim 12, wherein said fluid is gaseous.
Claim 16
Dependent Claim
24 words
The polishing apparatus according to claim 10, wherein said base body is provided with means for hermetically sealing said fluid within the fine bags.
Claim 17
Dependent Claim
12 words
The polishing apparatus according to claim 14, wherein said fluid is gaseous.
Claim 18
Dependent Claim
25 words
The polishing apparatus according to claim 10, wherein each of said fine bags has a substantially flat upper surface and a substantially flat lower surface.
Claim 19
Dependent Claim
27 words
The polishing apparatus according to claim 10, wherein a percentage of fine bag area based on the entire surface of the polishing pad is at least 50%.
Claim 20
Dependent Claim
31 words
The polishing apparatus according to claim 17, wherein a percentage of fine bag area based on the entire surface of the polishing pad falls within a range of 60% and 90%.
Claim 21
Dependent Claim
14 words
The polishing apparatus according to claim 10, wherein said fine bags are regularly arranged.
Claim 22
Dependent Claim
73 words
A polishing method, comprising the steps of: allowing a substrate to be held on a substrate holding section; supplying a polishing agent onto a polishing surface positioned on fine bags fixed to a base body, said fine bags being isolated from each other; and rotating said base body to permit said substrate holding section to be pressed against the base body so as to polish a surface of the substrate to be polished.
Claim 23
Dependent Claim
73 words
A polishing method, comprising the steps of: allowing a substrate to be held on a substrate holding section; supplying a polishing agent onto a polishing surface positioned on fine bags fixed to a base body, said fine bags being isolated from each other; and rotating said base body to permit said substrate holding section to be pressed against the base body so as to polish a surface of the substrate to be polished.
Claim 24
Dependent Claim
15 words
The polishing method according to claim 20, wherein said base body is a rotatable plate.
Claim 25
Dependent Claim
60 words
A polishing pad comprising at least: a first layer having a first main surface serving to polish a substrate to be polished and a second main surface; and a second layer positioned to face said second surface of the first layer and having a fluid-retaining section filled with fluid, a number of reinforcing strings being arranged within said fluid-retaining section.
Claim 26
Dependent Claim
60 words
A polishing pad comprising at least: a first layer having a first main surface serving to polish a substrate to be polished and a second main surface; and a second layer positioned to face said second surface of the first layer and having a fluid-retaining section filled with fluid, a number of reinforcing strings being arranged within said fluid-retaining section.
Claim 27
Dependent Claim
12 words
The polishing pad according to claim 22, wherein said fluid is gaseous.
Claim 28
Dependent Claim
25 words
The polishing pad according to claim 22, wherein a gas of a pressure higher than the atmospheric pressure is hermetically sealed in said fluid-retaining section.
Claim 29
Dependent Claim
55 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; base body having a fluid-retaining section arranged on an upper surface thereof, a number of reinforcing strings being arranged within said fluid-retaining section; and a polishing pad interposed between said means for holding or pressing the substrate and said base body.
Claim 30
Dependent Claim
55 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; base body having a fluid-retaining section arranged on an upper surface thereof, a number of reinforcing strings being arranged within said fluid-retaining section; and a polishing pad interposed between said means for holding or pressing the substrate and said base body.
Claim 31
Dependent Claim
15 words
The polishing apparatus according to claim 25, wherein said base body is a rotatable plate.
Claim 32
Dependent Claim
73 words
A polishing method, comprising the steps of: allowing a substrate to be held on a substrate holding section; supplying a polishing agent onto a polishing surface positioned on a fluid-supporting section formed on a base body, a number of reinforcing strings being arranged within said fluid-supporting section; and rotating said base body to permit said substrate-holding section to be pressed against the base body so as to polish a surface of the substrate.
Claim 33
Dependent Claim
73 words
A polishing method, comprising the steps of: allowing a substrate to be held on a substrate holding section; supplying a polishing agent onto a polishing surface positioned on a fluid-supporting section formed on a base body, a number of reinforcing strings being arranged within said fluid-supporting section; and rotating said base body to permit said substrate-holding section to be pressed against the base body so as to polish a surface of the substrate.
Claim 34
Dependent Claim
15 words
The polishing method according to claim 27, wherein said base body is a rotatable plate.
Claim 35
Dependent Claim
75 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; a base body; a fluid cushion including a polishing pad interposed between said means for holding or pressing the substrate and said base body, said base body having a supporting frame for supporting said fluid cushion arranged to extend upward from the side surfaces of the base body; and a dummy pressurizing mechanism for preventing said fluid cushion from being damaged.
Claim 36
Dependent Claim
75 words
A polishing apparatus, comprising: means for holding or pressing a substrate to be polished; a base body; a fluid cushion including a polishing pad interposed between said means for holding or pressing the substrate and said base body, said base body having a supporting frame for supporting said fluid cushion arranged to extend upward from the side surfaces of the base body; and a dummy pressurizing mechanism for preventing said fluid cushion from being damaged.
Claim 37
Dependent Claim
15 words
The polishing apparatus according to claim 29, wherein said base body is a rotatable plate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-09-08 | 2001-03-10 | 2001-09-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-09-08 | 2005-03-10 | 2005-09-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-09-08 | 2009-03-10 | 2009-09-09 | $7700.00 | Window Closed / Lapsed |