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US5663976A Expired / Lapsed US ⏱️ 0.0 years remaining

Buried-ridge laser device

Assignee: MP Technologies LLC
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Filing: 1995-10-16
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Granted: 1997-09-02
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Expires: 2015-10-16
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Abstract

Abstract A buried-ridge structure of the quaternary/tertiary structures of In x Ga 1-x As y P 1-y /InGaP (x and y<1) are grown on a GaAs substrate by Low Pressure Metalorganic Chemical Vapor Deposition (LP-MOCVD) in a two-step process. The process comprises steps of growing and doping the requisite epitaxial layers, etching these layers so that stripes or mesas of material remain and then regrowing the material by gas molecular beam epitaxy (GSMBE). The structures are then processed into devices.

Inventors

  • 👤 Manijeh Razeghi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 17:57
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/20; H01S5/22; H01S5/227; H01S5/30; H01S5/32; H01S5/323; H01S5/32308; H01S5/32325; H01S2304/00; H01S2304/02; H01S2304/04; H01S5/04; H01S5/042; H01S5/0421; H01S5/2275

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 96 words
A buried-ridge structure consisting essentially of an Al-free heterostructure, said heterostructure comprising a lower cladding layer of an n + doped InGaP layer on an n + doped GaAs substrate; an undoped active layer of In x Ga 1-x As y P 1-y (X<1, Y<1) adjacent said lower cladding, an upper cladding layer of a p-doped InGaP layer adjacent said active layer; and a cap layer of p + doped GaAs; said active layer comprising a mesa surrounded on three sides by said upper cladding layer and on a fourth side by said lower cladding layer.
Claim 2
Dependent Claim 96 words
A buried-ridge structure consisting essentially of an Al-free heterostructure, said heterostructure comprising a lower cladding layer of an n + doped InGaP layer on an n + doped GaAs substrate; an undoped active layer of In x Ga 1-x As y P 1-y (X<1, Y<1) adjacent said lower cladding, an upper cladding layer of a p-doped InGaP layer adjacent said active layer; and a cap layer of p + doped GaAs; said active layer comprising a mesa surrounded on three sides by said upper cladding layer and on a fourth side by said lower cladding layer.
Claim 3
Dependent Claim 28 words
The buried-ridge structure of claim 1 wherein said active layer comprises an active layer between two waveguide layers, said active layer being stoichiometrically different from said waveguide layers.
Claim 4
Dependent Claim 19 words
The buried-ridge structure of claim 1 wherein said upper and lower cladding layers are each about 1.0 μm thick.
Claim 5
Dependent Claim 15 words
The buried-ridge structure of claim 1 wherein said active layer is about 0.4-0.5 μm thick.
Claim 6
Dependent Claim 23 words
The buried-ridge structure of claim 1 wherein said active layer comprises a raised stripe of about 1.0 μm width and 0.4 μm depth.
Claim 7
Dependent Claim 13 words
The buried-ridge structure of claim 2 wherein said third is 1.0 μm thick.
Claim 8
Dependent Claim 101 words
A buried-ridge structure formed by low pressure metallorganic chemical vapor deposition comprising a heterostructure on a silicon doped GaAs substrate and having first layer of Si doped GaInP adjacent said substrate; a second layer adjacent said first layer including an undoped Ga 0 .87 In 0 .13 As 0 .74 P 0 .26 layer between two undoped Ga 0 .63 In 0 .37 A 0 .25 P 0 .75 layers; a third layer adjacent said second layer of second doped InGaAs and second doped GaAs, where said second layer comprises a mesa surrounded by said first layer and said third layer.
Claim 9
Dependent Claim 101 words
A buried-ridge structure formed by low pressure metallorganic chemical vapor deposition comprising a heterostructure on a silicon doped GaAs substrate and having first layer of Si doped GaInP adjacent said substrate; a second layer adjacent said first layer including an undoped Ga 0 .87 In 0 .13 As 0 .74 P 0 .26 layer between two undoped Ga 0 .63 In 0 .37 A 0 .25 P 0 .75 layers; a third layer adjacent said second layer of second doped InGaAs and second doped GaAs, where said second layer comprises a mesa surrounded by said first layer and said third layer.
Claim 10
Dependent Claim 14 words
The buried-ridge structure of claim 7 wherein said first layer is 1.0 μm thick.
Claim 11
Dependent Claim 15 words
The buried-ridge structure of claim 7 wherein said second layer is about 0.4-0.5 μm thick.

References Cited (Backward Citations)

US5212704A Cited
US5321712A Cited

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