Device for removing dissolved gas from a liquid

Claim 3

The method of claim 1 wherein said structure comprises a fluoro-polymer resin.

Claim 4

The method of claim 1 wherein said liquid comprises an organometallic liquid.

Claim 5

The method of claim 1 wherein said liquid is selected from the group consisting of tetra-ethyl-ortho-silicate, tri-methyl-phosphite, tri-methyl-borate, tri-ethyl-phosphite, tri-ethyl-borate, and tetrakis(diethyl)aminotitanium.

Claim 6

The method of claim 1 wherein said gas comprises an inert gas.

Claim 7

The method of claim 1 wherein said gas is selected from the group consisting of helium, nitrogen, neon, argon, carbon-dioxide and oxygen.

Claim 10

The method of claim 7 wherein said structure comprises a fluoro-polymer resin.

Claim 11

The method of claim 7 wherein said liquid comprises an organometallic liquid.

Claim 12

The method of claim 7 wherein said liquid is selected from the group consisting of tetra-ethyl-ortho-silicate, tri-methyl-phosphite, tri-methyl-borate, tri-ethyl-phosphite, tri-ethyl-borate, and tetrakis(diethyl)aminotitanium.

Claim 13

The method of claim 7 wherein said gas comprises an inert gas.

Claim 14

The method of claim 7 wherein said gas is selected from the group consisting of helium nitrogen, neon, argon, carbon-dioxide and oxygen.

Claim 17

The method of claim 13 wherein said gas permeable structure comprises a coiled tube and said step of removing comprises passing said liquid through said coiled tube.

Claim 18

A liquid delivery system for a chemical vapor deposition reactor comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a chemical vapor deposition reactor with a vaporizer resident inside said reactor, said reactor having an inlet connected internally to said vaporizer and externally to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said chemical vapor deposition reactor; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is connected to a low pressure source, said inlet of said second vessel is connected to said liquid outlet of said supply source, and said outlet of said second vessel is connected to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel, said structure having an inlet and an outlet, said inlet of said structure being in flow communication with said inlet of said second vessel and said outlet of said structure being in flow communication with said outlet of said second vessel, said degas module removing at least some of said dissolved gas from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller.

Claim 19

A liquid delivery system for a chemical vapor deposition reactor comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a chemical vapor deposition reactor with a vaporizer resident inside said reactor, said reactor having an inlet connected internally to said vaporizer and externally to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said chemical vapor deposition reactor; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is connected to a low pressure source, said inlet of said second vessel is connected to said liquid outlet of said supply source, and said outlet of said second vessel is connected to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel, said structure having an inlet and an outlet, said inlet of said structure being in flow communication with said inlet of said second vessel and said outlet of said structure being in flow communication with said outlet of said second vessel, said degas module removing at least some of said dissolved gas from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller.

Claim 20

The system of claim 15 wherein said liquid comprises an organometallic liquid.

Claim 21

The system of claim 15 wherein said liquid is selected from the group consisting of tetra-ethyl-ortho-silicate, tri-methyl-phosphite, tri-methyl-borate, tri-ethyl-phosphate, tri-ethyl-borate, and tetrakis(diethyl)aminotitanium.

Claim 22

The system of claim 15 wherein said gas comprises an inert gas.

Claim 23

The system of claim 15 wherein said gas is selected from the group consisting of helium, nitrogen, neon, argon, carbon-dioxide and oxygen.

Claim 24

The liquid delivery system of claim 15 wherein said structure comprises a coiled tube.

Claim 25

A liquid delivery system for a chemical vapor deposition reactor comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a chemical vapor deposition reactor and a vaporizer coupled to said reactor, said vaporizer being coupled to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said chemical vapor deposition reactor; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is connected to a low pressure source, said inlet of said second vessel is connected to said liquid outlet of said supply source, and said outlet of said second vessel is connected to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel, said structure having an inlet and an outlet, said inlet of said structure being in flow communication with said inlet of said second vessel and said outlet of said structure being in flow communication with said outlet of said second vessel, said degas module removing at least some of said dissolved Was from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller.

Claim 26

A liquid delivery system for a chemical vapor deposition reactor comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a chemical vapor deposition reactor and a vaporizer coupled to said reactor, said vaporizer being coupled to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said chemical vapor deposition reactor; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is connected to a low pressure source, said inlet of said second vessel is connected to said liquid outlet of said supply source, and said outlet of said second vessel is connected to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel, said structure having an inlet and an outlet, said inlet of said structure being in flow communication with said inlet of said second vessel and said outlet of said structure being in flow communication with said outlet of said second vessel, said degas module removing at least some of said dissolved Was from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller.

Claim 27

The system of claim 21 wherein said liquid comprises an organometallic liquid.

Claim 28

The system of claim 21 wherein said liquid is selected from the group consisting of tetra-ethyl-ortho-silicate, tri-methyl-phosphite, tri-methyl-borate, tri-ethyl-phosphite, tri-ethyl-borate, and tetrakis(diethyl)aminotitanium.

Claim 29

The system of claim 21 wherein said gas comprises an inert gas.

Claim 30

The system of claim 21 wherein said gas is selected from the group consisting of helium, nitrogen, neon, argon, carbon-dioxide and oxygen.

Claim 31

The system of claim 21 wherein said structure comprises a tube.

Claim 32

The system of claim 26 wherein said tube is coiled.

Claim 33

A liquid delivery system for dispensing a liquid through a vaporizer, said system comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a vaporizer coupled to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said vaporizer; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is couplable to a low pressure source, said inlet of said second vessel is coupled to said liquid outlet of said supply source, and said outlet of said second vessel is coupled to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel; wherein said degas module uses said structure to remove at least some of said dissolved gas from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller during dispensing of said liquid to said vaporizer.

Claim 34

A liquid delivery system for dispensing a liquid through a vaporizer, said system comprising: a supply source comprising a first vessel for containing said liquid, said first vessel comprising a gas inlet and a liquid outlet, wherein said gas inlet is connected to a source of pressurized gas, said first vessel comprising an interface between said liquid and said pressurized gas, said pressurized gas acting on said interface so as to force said liquid through said liquid outlet of said first vessel, some of said gas thereby becoming dissolved in said liquid; a liquid mass flow controller comprising an inlet and an outlet; a vaporizer coupled to said outlet of said liquid mass flow controller, said liquid mass flow controller dispensing said liquid in a precisely metered manner at a uniform pressure to said vaporizer; and a degas module comprising: a second vessel comprising a low pressure connection, an inlet and an outlet, wherein said low pressure connection is couplable to a low pressure source, said inlet of said second vessel is coupled to said liquid outlet of said supply source, and said outlet of said second vessel is coupled to said inlet of said liquid mass flow controller, and a structure comprising a material impermeable to said liquid and permeable to said gas, said structure being resident inside said second vessel; wherein said degas module uses said structure to remove at least some of said dissolved gas from said liquid so as to inhibit formation of bubbles of said gas in said liquid in said mass flow controller and thereby improve the accuracy of said liquid mass flow controller during dispensing of said liquid to said vaporizer.

Claim 35

The system of claim 28 wherein said structure comprises a coiled tube.