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US5641364A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing high-temperature shape memory alloys

Assignee: Furukawa Electric Co Ltd
•
Filing: 1995-10-27
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Granted: 1997-06-24
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Expires: 2015-10-27
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Abstract

Abstract A method of manufacturing a high-temperature shape memory alloy includes the steps of cold-working a high-temperature shape memory alloy, in which a reverse martensite transformation start temperature (As) in a first heating after cold working reaches 350° C. or above. Thereafter, the cold-worked alloy undergoes a first heat treatment for a period of time within the incubation time required for recrystallization or less, and at a temperature higher than a reverse martensite transformation finish temperature (Af). Finally, the resultant alloy is annealed with a second heat treatment, at a temperature which is not less than the plastic strain recovery temperature and not more than the recrystallization temperature. Specifically, the first heat treatment is performed for a period of three minutes or less at a temperature which exceeds 500° C. and which is lower than the melting point of the alloy. The composition of the high-temperature shape memory alloy is Ti 50 Ni 50-x Pd x (x being 35 to 50 at %), Ti 50-x Ni 50 Zr x (x being 22 to 30 at %), Ti 50-x Ni 50 Hf x (x being 20 to 30 at %) or the like.

Inventors

  • 👤 Dmitrii Victorovich Golberg
  • 👤 Kazuhiro Otsuka
  • 👤 Tatsuhiko Ueki
  • 👤 Hiroshi Horikawa
  • 👤 Kengo Mitose

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 02:12
CPC Classifications
C; C22; C22F; C22F1/00; C22F1/006

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 135 words
A method of manufacturing a high-temperature shape memory alloy, comprising the steps of: cold-working a high-temperature shape memory alloy, so that a reverse martensite transformation start temperature (As) of the alloy reaches 350° C. or above and a reverse martensite transformation finish temperature (A F ) of the alloy exceeds the recrystallization temperature of the alloy; thereafter subjecting the cold-worked alloy to a first heat treatment at a first temperature above the recrystallization temperature, for a period of time sufficiently short to prevent the start of recrystallization, said first temperature being higher than the A f temperature; and then annealing the resultant alloy in a second heat treatment, at a second temperature which is not less than the plastic strain recovery temperature of the alloy and not more than the recrystallization temperature of the alloy.
Claim 2
Independent Claim 135 words
A method of manufacturing a high-temperature shape memory alloy, comprising the steps of: cold-working a high-temperature shape memory alloy, so that a reverse martensite transformation start temperature (As) of the alloy reaches 350° C. or above and a reverse martensite transformation finish temperature (A F ) of the alloy exceeds the recrystallization temperature of the alloy; thereafter subjecting the cold-worked alloy to a first heat treatment at a first temperature above the recrystallization temperature, for a period of time sufficiently short to prevent the start of recrystallization, said first temperature being higher than the A f temperature; and then annealing the resultant alloy in a second heat treatment, at a second temperature which is not less than the plastic strain recovery temperature of the alloy and not more than the recrystallization temperature of the alloy.
Claim 3
Dependent Claim 46 words
A method of manufacturing a high-temperature shape memory alloy according to claim 1, wherein the first heat treatment is performed for a period of three minutes or less and wherein said first temperature exceeds 500° C. and is less than a melting point of the alloy.
Claim 4
Dependent Claim 80 words
A method of manufacturing a high-temperature shape memory alloy according to claim 1, wherein the composition of said high-temperature shape memory alloy is expressed, with numerical values representing at %, as Ti 50 Ni 50-x Pd x , in which X is 35 to 50 at %, Ti 50-x Ni 50 Zr x , in which X is 22 to 30 at %, or Ti 50-x Ni 50 Hf x , in which X is 20 to 30 at %.

References Cited (Backward Citations)

JPS6260836A Cited
JPS62284047A Cited
US4865663A Cited
US4935068A Cited
US5114504A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-06-23 2000-12-23 2001-06-24 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-06-23 2004-12-23 2005-06-24 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-06-23 2008-12-23 2009-06-24 $7700.00 Window Closed / Lapsed

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