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US5637889A Expired / Lapsed US ⏱️ 0.0 years remaining

Composite power transistor structures using semiconductor materials with different bandgaps

Assignee: STMicroelectronics lnc USA
•
Filing: 1995-06-07
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Granted: 1997-06-10
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Expires: 2015-06-07
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Abstract

Abstract A power device structure which is formed of two merged device structures: an FET control device is located in a surface layer of narrower-bandgap material, and a blocking device which provides high-voltage-withstand capability is located deeper in the device, in a substrate of wider-bandgap material.

Inventors

  • 👤 Robert O. Groover
  • 👤 Richard A. Blanchard

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 20:28
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/60; H10D30/64; H10D30/66; H10D30/668; H10D12/00; H10D12/411; H10D12/441; H10D12/461; H10D12/481; H10D30/751; H10D84/00; H10D84/01; H10D84/0123; H10D84/0126; H10D84/0158; H10D84/101; H10D84/121; H10D84/141; H10D84/40; H10D84/401; H10D84/403; H10D84/406; H10D84/80; H10D84/82; H10D84/83; H10D62/00; H10D62/10; H10D62/13; H10D62/149; H10D62/151; H10D62/156; H10D62/157; Y; Y10; Y10S; Y10S148/00; Y10S148/126

Claims Analysis

Total Claims: 36
Claim 1
Independent Claim 80 words
A solid-state electronic device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material; and a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said first and second transistor portions being connected in series to provide a combined power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 2
Dependent Claim 80 words
A solid-state electronic device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material; and a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said first and second transistor portions being connected in series to provide a combined power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 3
Dependent Claim 14 words
The composite device structure of claim 1, wherein said first semiconductor material is SiGe.
Claim 4
Dependent Claim 21 words
The composite device structure of claim 1, wherein said first semiconductor material is SiGe, and said second semiconductor material is Si.
Claim 5
Dependent Claim 23 words
The composite device structure of claim 1, wherein said first and second semiconductor materials are both SiGe alloys, and have different Ge fractions.
Claim 6
Dependent Claim 14 words
The composite device structure of claim 1, wherein said second semiconductor material is Si.
Claim 7
Dependent Claim 19 words
The composite device structure of claim 1, wherein said first and second transistor portions form a VDMOS composite device.
Claim 8
Dependent Claim 16 words
The composite device structure of claim 1, wherein said first transistor portion is a trench transistor.
Claim 9
Dependent Claim 19 words
The composite device structure of claim 1, wherein said first and second transistor portions form a switched-emitter composite device.
Claim 10
Dependent Claim 84 words
A solid-state electronic composite device structure, comprising: a first field-effect transistor portion having a channel thereof formed in a first semiconductor material; and a second bipolar transistor portion which has a base portion thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said first and second transistor portions being connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 11
Dependent Claim 84 words
A solid-state electronic composite device structure, comprising: a first field-effect transistor portion having a channel thereof formed in a first semiconductor material; and a second bipolar transistor portion which has a base portion thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said first and second transistor portions being connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 12
Dependent Claim 14 words
The composite device structure of claim 9, wherein said first semiconductor material is SiGe.
Claim 13
Dependent Claim 21 words
The composite device structure of claim 9, wherein said first semiconductor material is SiGe, and said second semiconductor material is Si.
Claim 14
Dependent Claim 23 words
The composite device structure of claim 9, wherein said first and second semiconductor materials are both SiGe alloys, and have different Ge fractions.
Claim 15
Dependent Claim 14 words
The composite device structure of claim 9, wherein said second semiconductor material is Si.
Claim 16
Dependent Claim 19 words
The composite device structure of claim 9, wherein said first and second transistor portions form a VDMOS composite device.
Claim 17
Dependent Claim 16 words
The composite device structure of claim 9, wherein said first transistor portion is a trench transistor.
Claim 18
Dependent Claim 19 words
The composite device structure of claim 9, wherein said first and second transistor portions form a switched-emitter composite device.
Claim 19
Dependent Claim 144 words
A solid-state electronic composite device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material, said current-control portions controlling current flow between upper and lower first-conductivity-type diffusions of said first transistor portion; and a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said current control portions of said second transistor portion controlling current flow between upper and lower first-conductivity-type diffusions of said second transistor portion; said lower first-conductivity-type diffusion of said first transistor portion being merged with said upper first-conductivity-type diffusion of said second transistor portion, and said first and second transistor portions being thereby connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 20
Dependent Claim 144 words
A solid-state electronic composite device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material, said current-control portions controlling current flow between upper and lower first-conductivity-type diffusions of said first transistor portion; and a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said current control portions of said second transistor portion controlling current flow between upper and lower first-conductivity-type diffusions of said second transistor portion; said lower first-conductivity-type diffusion of said first transistor portion being merged with said upper first-conductivity-type diffusion of said second transistor portion, and said first and second transistor portions being thereby connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 21
Dependent Claim 14 words
The composite device structure of claim 17, wherein said first semiconductor material is SiGe.
Claim 22
Dependent Claim 21 words
The composite device structure of claim 17, wherein said first semiconductor material is SiGe, and said second semiconductor material is Si.
Claim 23
Dependent Claim 23 words
The composite device structure of claim 17, wherein said first and second semiconductor materials are both SiGe alloys, and have different Ge fractions.
Claim 24
Dependent Claim 14 words
The composite device structure of claim 17, wherein said second semiconductor material is Si.
Claim 25
Dependent Claim 19 words
The composite device structure of claim 17, wherein said first and second transistor portions form a VDMOS composite device.
Claim 26
Dependent Claim 16 words
The composite device structure of claim 17, wherein said first transistor portion is a trench transistor.
Claim 27
Dependent Claim 19 words
The composite device structure of claim 17, wherein said first and second transistor portions form a switched-emitter composite device.
Claim 28
Dependent Claim 110 words
A solid-state electronic composite device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material; a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said current control portions of said second transistor portion controlling bipolar current flow in a predominantly vertical direction; said first semiconductor material being epitaxially overlaid on said second semiconductor material; said first and second transistor portions being connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 29
Dependent Claim 110 words
A solid-state electronic composite device structure, comprising: a first transistor portion having current-control portions thereof formed in a first semiconductor material; a second transistor portion which has current-control portions thereof formed in a second semiconductor material which has a wider bandgap than said first semiconductor material; said current control portions of said second transistor portion controlling bipolar current flow in a predominantly vertical direction; said first semiconductor material being epitaxially overlaid on said second semiconductor material; said first and second transistor portions being connected in series to provide a composite power device structure in which said first transistor portion regulates current while said second transistor portion provides high-voltage withstand capability.
Claim 30
Dependent Claim 14 words
The composite device structure of claim 25, wherein said first semiconductor material is SiGe.
Claim 31
Dependent Claim 21 words
The composite device structure of claim 25, wherein said first semiconductor material is SiGe, and said second semiconductor material is Si.
Claim 32
Dependent Claim 23 words
The composite device structure of claim 25, wherein said first and second semiconductor materials are both SiGe alloys, and have different Ge fractions.
Claim 33
Dependent Claim 14 words
The composite device structure of claim 25, wherein said second semiconductor material is Si.
Claim 34
Dependent Claim 19 words
The composite device structure of claim 25, wherein said first and second transistor portions form a VDMOS composite device.
Claim 35
Dependent Claim 16 words
The composite device structure of claim 25, wherein said first transistor portion is a trench transistor.
Claim 36
Dependent Claim 19 words
The composite device structure of claim 25, wherein said first and second transistor portions form a switched-emitter composite device.

References Cited (Backward Citations)

US4487639A Cited
US4868626A Cited
US4881119A Cited
US4935799A Cited
US5065213A Cited
US5118635A Cited
US5247200A Cited
US5380670A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-06-09 2000-12-09 2001-06-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-06-09 2004-12-09 2005-06-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-06-09 2008-12-09 2009-06-10 $7700.00 Window Closed / Lapsed

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