US5637180A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma processing method and plasma generator
Assignee: Sony Corp
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Filing: 1995-09-25
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Granted: 1997-06-10
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Expires: 2015-09-25
Abstract
Abstract A plasma-processing method used in processes for manufacturing semiconductor devices. During plasma processing, ultraviolet radiation is emitted from a region where a plasma is created. An ultraviolet radiation-blocking means blocks the ultraviolet radiation from impinging on the sample surface to protect it. The blocking means passes particles forming a plasma onto the sample surface. The particles passed through the ultraviolet radiation-blocking plates are implanted into the sample. Alternatively, the processed surface of the sample is etched, or a film is deposited on the processed surface of the sample.
Inventors
- 👤 Dharam P. Gosain
- 👤 Jonathan Westwater
- 👤 Setsuo Usui
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 21:51
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H01J37/32651; H01J37/32798; H01J37/32853; H01J37/32871; C; C23; C23C; C23C16/00; C23C16/44; C23C16/448; C23C16/452
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
137 words
A plasma generator comprising: a processing chamber including a bottom wall and at least one upstanding sidewall; a substrate holder for mounting a substrate to be processed disposed in a horizontal orientation parallel to and adjacent said bottom wall in a central location in said processing chamber; means for generating a plasma in at least one plasma region extending parallel to and adjacent said at least one sidewall; at least one ultraviolet radiation blocking assembly mounted in a vertical orientation in said chamber parallel to and adjacent said at least one sidewall and disposed intermediate a said plasma region and the substrate holder, each said blocking assembly including a plurality of apertured plates disposed in parallel spaced relation so that the apertures of a first plate are staggered with respect to the apertures of an adjacent plate.
Claim 2
Dependent Claim
137 words
A plasma generator comprising: a processing chamber including a bottom wall and at least one upstanding sidewall; a substrate holder for mounting a substrate to be processed disposed in a horizontal orientation parallel to and adjacent said bottom wall in a central location in said processing chamber; means for generating a plasma in at least one plasma region extending parallel to and adjacent said at least one sidewall; at least one ultraviolet radiation blocking assembly mounted in a vertical orientation in said chamber parallel to and adjacent said at least one sidewall and disposed intermediate a said plasma region and the substrate holder, each said blocking assembly including a plurality of apertured plates disposed in parallel spaced relation so that the apertures of a first plate are staggered with respect to the apertures of an adjacent plate.
Claim 3
Dependent Claim
131 words
A plasma generator comprising: a processing chamber including a bottom wall and at least one upstanding sidewall; a substrate holder for mounting a substrate to be processed disposed in a horizontal orientation parallel to and adjacent said bottom wall in a central location in said processing chamber; means for generating a plasma in at least one plasma region extending parallel to and adjacent said at least one sidewall; at least one ultraviolet radiation blocking assembly mounted in a vertical orientation in said chamber parallel to and adjacent said at least one sidewall and disposed intermediate a said plasma region and the substrate holder, each said blocking assembly including a linear array of parallel spaced apart blocking plates, each blocking plate being disposed at an angled orientation with respect to said sidewall.
Claim 4
Dependent Claim
131 words
A plasma generator comprising: a processing chamber including a bottom wall and at least one upstanding sidewall; a substrate holder for mounting a substrate to be processed disposed in a horizontal orientation parallel to and adjacent said bottom wall in a central location in said processing chamber; means for generating a plasma in at least one plasma region extending parallel to and adjacent said at least one sidewall; at least one ultraviolet radiation blocking assembly mounted in a vertical orientation in said chamber parallel to and adjacent said at least one sidewall and disposed intermediate a said plasma region and the substrate holder, each said blocking assembly including a linear array of parallel spaced apart blocking plates, each blocking plate being disposed at an angled orientation with respect to said sidewall.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-06-09 | 2000-12-09 | 2001-06-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-06-09 | 2004-12-09 | 2005-06-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-06-09 | 2008-12-09 | 2009-06-10 | $7700.00 | Window Closed / Lapsed |