US5630872A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Formation of thin-film patterns of a metal oxide
Assignee: Mitsubishi Materials Corp
•
Filing: 1995-12-11
•
Granted: 1997-05-20
•
Expires: 2015-12-11
Abstract
Abstract A composition for formation of thin-film patterns of a metal oxide which comprises a metal alkoxide and one or more nitro compounds selected from the group consisting of nitrobenzyl alcohol derivatives, nitrobenzaldehyde derivatives, nitrostyrol derivatives, nitroacetophenone derivatives, nitroanisole derivatives and nitrofuran derivatives. This composition is applied to a substrate which is then irradiated with light to perform patterning by utilizing the difference in solubility between the light-irradiated portion and the non-light-irradiated portion, attributed to the photodecomposition reaction of the irradiated portion. A photoreactive compound is added to a starting solution which contains an organic solvent and an organic metal compound, the solution is misted, and the resulting mist is deposited on a substrate while irradiating with light.
Inventors
- 👤 Katsumi Ogi
- 👤 Tadashi Yonezawa
- 👤 Nobuyuki Soyama
- 👤 Kensuke Kageyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; C; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/25; C23; C23C; C23C18/00; C23C18/14; C23C18/143; C23C26/00; H; H10; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/69; H10P14/692; H10P14/6938; H10P14/69398; C03C2218/00; C03C2218/10; C03C2218/11; C03C2218/30; C03C2218/32; C03C2218/328
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
43 words
A composition for formation of thin-film patterns of metal oxide by irradiation with light, comprising: one or more metal alkoxides; and one of more nitro compounds selected from the group consisting of nitrobenzyl alcohols, nitrobenzaldehydes, nitrostyrols, nitroacetophenones, nitroanisoles, nitrofurans, and photoreactive derivatives thereof.
Claim 2
Dependent Claim
43 words
A composition for formation of thin-film patterns of metal oxide by irradiation with light, comprising: one or more metal alkoxides; and one of more nitro compounds selected from the group consisting of nitrobenzyl alcohols, nitrobenzaldehydes, nitrostyrols, nitroacetophenones, nitroanisoles, nitrofurans, and photoreactive derivatives thereof.
Claim 3
Dependent Claim
35 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitro compound(s) are present in a proportion of 0.05 to 6 mole per mole of the metal alkoxide(s).
Claim 4
Dependent Claim
35 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 2, wherein the nitro compound(s) are present in a proportion of 0.3 to 2 mole per mole of the metal alkoxide(s).
Claim 5
Dependent Claim
23 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrobenzyl alcohol used is 2-nitrobenzyl alcohol.
Claim 6
Dependent Claim
21 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrobenzaldehyde used is 2-nitrobenzaldehyde.
Claim 7
Dependent Claim
22 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrobenzaldehyde derivative used is 2,4-dinitrobenzaldehyde.
Claim 8
Dependent Claim
21 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrostyrol used is β-nitrostyrol.
Claim 9
Dependent Claim
21 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitroacetophenone used is o-nitroacetophenone.
Claim 10
Dependent Claim
21 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitroanisole used is o-nitroanisole.
Claim 11
Dependent Claim
21 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrofuran used is 2-nitrofuran.
Claim 12
Dependent Claim
22 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrofuran derivative used is anti-5-nitro-2-furaldoxime.
Claim 13
Dependent Claim
23 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrofuran derivative used is 5-nitro-2-furoic acid.
Claim 14
Dependent Claim
22 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, wherein the nitrofuran derivative used is 5-nitro-2-furaldehyde.
Claim 15
Dependent Claim
39 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, which further contains a stabilizer for the metal alkoxide(s) which does not strongly absorb light in the same wavelength range as the irradiated light.
Claim 16
Dependent Claim
38 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 14, wherein the stabilizer comprises one of more compounds selected from the group consisting of ethanolamines, β-diketones, β-ketoesters, carboxylic acids, glycols and glycol esters.
Claim 17
Dependent Claim
54 words
A process for preparation of a composition for formation of thin-film patterns of metal oxide as claimed in claim 14, comprising; preforming a complex of the metal alkoxide(s) and the nitro compound(s) by heating to reflux the metal alkoxide(s) and the nitro compound(s) in a solvent, and then adding the stabilizer to the composition.
Claim 18
Dependent Claim
45 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, which contains a complex of the metal alkoxide(s) and the nitro compound(s) formed by heating to reflux a solution of the metal alkoxide(s) and the nitro compound(s) in a solvent.
Claim 19
Dependent Claim
22 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 1, which contains two or more metal alkoxides.
Claim 20
Dependent Claim
28 words
A composition for formation of thin-film patterns of metal oxide as claimed in claim 18, wherein the two or more metal alkoxides are contained as a composite alkoxide.
Claim 21
Dependent Claim
53 words
A process for preparation of a composition for formation of thin-film patterns of metal oxide as claimed in claim 19, which composition further contains another component, comprising: preforming a composite alkoxide by heating to reflux the two or more metal alkoxides in a solvent, and then adding the other component to the composition.
Claim 22
Dependent Claim
83 words
A process for preparation of a composition for formation of thin-film patterns of metal oxide as claimed in claim 19, which composition further contains a stabilizer for the metal alkoxide, comprising: preforming a composition alkoxide by heating to reflux the two or more metal alkoxides in a solvent, and then adding the nitro compound(s) to the composition which is then heated to reflux to form a complex of the composite alkoxide and the nitro compound(s), and thereafter adding the stabilizer to the composition.
Claim 23
Dependent Claim
54 words
A process for preparation of a composition for formation of thin-film patterns of metal oxide as claimed in claim 1, comprising: preforming a complex of the metal alkoxide(s) and the nitro compound(s) by heating to reflux the metal alkoxide(s) and the nitro compound(s) in a solvent, and then adding another component to the composition.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-05-19 | 2000-11-18 | 2001-05-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-05-19 | 2004-11-18 | 2005-05-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-05-19 | 2008-11-18 | 2009-05-20 | $7700.00 | Window Closed / Lapsed |