Package for semiconductor device

Claim 2

A packaging for mounting of a semiconductor device, which comprises a power layer, a ground layer and a signal layer, wherein: (a) the power layer, the ground layer and the signal layer are laminated via an intermediate layer including an insulating layer, (b) the power layer and the ground layer are each constituted by an inner lead area, an outer lead area and an electro-conductive area, the inner lead area and the outer lead area are not covered with the intermediate layer to be exposed and the electro-conductive area is interposed between the inner lead area and the outer lead area and covered with the intermediate layer, (c) substantially all of the electro-conductive area of each of the power layer and the ground layer is constituted by a planar electro-conductive member, and the electro-conductive area has substantially no throughhole, (d) the intermediate layer between the power layer and the ground layer comprises one of the following (1), (2), (3) and (4), (1) a ceramic insulating layer and an inorganic adhesive layer, (2) an organic adhesive layer and an insulating layer present therein, (3) an inorganic adhesive layer or an organic adhesive layer alone, (4) an inorganic adhesive layer or an organic adhesive layer and an insulating layer formed on the surface of at least either of the electro-conductive members present in the electro-conductive areas of the power layer and the ground layer, with a proviso that said inorganic adhesive layer consists essentially of a noble metal brazing alloy or a Cu--O 2 type eutectic crystal, (e) the power layer and the ground layer are laminated adjacently via the intermediate layer and adhesive strengths between the power layer and the intermediate layer and between the ground layer and the intermediate layer are each 1 kg/cm or more in terms of 90° peeling strength, and (f) the package is used substantially without being subjected to resin sealing after mounting of the semiconductor device.

Claim 3

The package set forth in claim 1, wherein at least 90% of the electro-conductive area of each of the power layer and the ground layer is constituted by an electro-conductive member.

Claim 4

The package set forth in claim 1, wherein the signal layer and the power layer each have a self-inductance of (2 nH or less).

Claim 5

The package set forth in claim 1, wherein the lamination is made in the order of: the ground layer, the power layer and the signal layer.

Claim 6

The package set forth in claim 1, wherein the intermediate layer between the power layer and the ground layer comprises a ceramic insulating layer and an inorganic adhesive layer.

Claim 7

The package set forth in claim 5, wherein the ceramic insulating layer has a thickness of (30 μm or more).

Claim 8

The package set forth in claim 1, wherein the intermediate layer between the power layer and the ground layer comprises an organic adhesive layer and an insulating layer present therein.

Claim 9

The package set forth in claim 7, wherein the insulating layer is a (thin ceramic plate or an insulating resin film).

Claim 10

The package set forth in claim 7, wherein the insulating layer is a metal plate whose both surfaces are covered with a (metal oxide film or an insulating resin film).

Claim 11

The package set forth in claim 7, wherein the power layer and the ground layer form a capacitor which has a capacity of 110 pF or more.

Claim 12

The package set forth in claim 1, wherein the intermediate layer between the power layer and the ground layer is constituted substantially by an adhesive layer alone.

Claim 13

The package set forth in claim 11, wherein the power layer and the ground layer form a capacitor which has a capacity of 110 pF or more.

Claim 14

The package set forth in claim 1, wherein the intermediate layer between the power layer and the ground layer comprises an adhesive layer and an insulating layer formed on the surface of at least either of the electro-conductive members present in the electro-conductive areas of the power layer and the ground layer.

Claim 15

The package set forth in claim 13, wherein the insulating layer is a metal oxide film or an insulating resin film.

Claim 16

The package set forth in claim 13, wherein the capacitor formed by the power layer and the ground layer has a capacity of 110 pF or more.

Claim 17

The package set forth in claim 1, wherein a substrate is provided and the power layer or the ground layer is laminated on at least one side of the substrate.

Claim 18

The package set forth in claim 1, which is used substantially without being subjected to resin sealing after mounting of semiconductor device.

Claim 19

The package set forth in claim 1, wherein the lamination is made in the order of: the power layer, the ground layer and the signal layer.

Claim 20

The package set forth in claim 1, wherein the lamination is made in the order of: the ground layer, the power layer and the signal layer.

Claim 21

A packaging for mounting of a semiconductor device, which comprises a power layer, a ground layer, a signal layer and a substrate, wherein: (a) the power layer, the ground layer and the signal layer are laminated via an intermediate layer including an insulating layer, (b) the power layer and the ground layer are each constituted by an inner lead area, an outer lead area and an electro-conductive area, the inner lead area and the outer lead area are not covered with the intermediate layer to be exposed and the electro-conductive area is interposed between the inner lead area and the outer lead area and covered with the intermediate layer, (c) substantially all of the electro-conductive area of each of the power layer and the ground layer is constituted by a planar electro-conductive member, and the electro-conductive area has substantially no throughhole, (d) the intermediate layer between the power layer and the ground layer comprises one of the following (1), (2), (3) and (4), (1) a ceramic insulating layer and an inorganic adhesive layer, (2) an organic adhesive layer and an insulating layer present therein, (3) an inorganic adhesive layer or an organic adhesive layer alone, (4) an inorganic adhesive layer or an organic adhesive layer and an insulating layer formed on the surface of at least either of the electro-conductive members present in the electro-conductive areas of the power layer and the ground layer, with a proviso that said inorganic adhesive layer consists essentially of a noble metal brazing alloy or a Cu--O 2 type eutectic crystal, (e) the power layer and the ground layer are laminated adjacently via the intermediate layer and adhesive strengths between the power layer and the intermediate layer and between the ground layer and the intermediate layer are each 1 kg/cm or more in terms of 90° peeling strength, and (f) the power layer or the ground layer is laminated on at least one side of the substrate and a portion for fixing the semiconductor device is provided on the same side.

Claim 22

A packaging for mounting of a semiconductor device, which comprises a power layer, a ground layer, a signal layer and a substrate, wherein: (a) the power layer, the ground layer and the signal layer are laminated via an intermediate layer including an insulating layer, (b) the power layer and the ground layer are each constituted by an inner lead area, an outer lead area and an electro-conductive area, the inner lead area and the outer lead area are not covered with the intermediate layer to be exposed and the electro-conductive area is interposed between the inner lead area and the outer lead area and covered with the intermediate layer, (c) substantially all of the electro-conductive area of each of the power layer and the ground layer is constituted by a planar electro-conductive member, and the electro-conductive area has substantially no throughhole, (d) the intermediate layer between the power layer and the ground layer comprises one of the following (1), (2), (3) and (4), (1) a ceramic insulating layer and an inorganic adhesive layer, (2) an organic adhesive layer and an insulating layer present therein, (3) an inorganic adhesive layer or an organic adhesive layer alone, (4) an inorganic adhesive layer or an organic adhesive layer and an insulating layer formed on the surface of at least either of the electro-conductive members present in the electro-conductive areas of the power layer and the ground layer, with a proviso that said inorganic adhesive layer consists essentially of a noble metal brazing alloy or a Cu--O 2 type eutectic crystal, (e) the power layer and the ground layer are laminated adjacently via the intermediate layer and adhesive strengths between the power layer and the intermediate layer and between the ground layer and the intermediate layer are each 1 kg/cm or more in terms of 90° peeling strength, and (f) the power layer or the ground layer is laminated on at least one side of the substrate and a portion for fixing the semiconductor device is provided on the same side.

Claim 23

The package set forth in claim 20, wherein the package is used substantially without being subjected to resin sealing after mounting of the semiconductor device.