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US5626913A Expired / Lapsed US ⏱️ 0.0 years remaining

Resist processing method and apparatus

Assignee: Tokyo Electron Ltd
•
Filing: 1995-03-09
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Granted: 1997-05-06
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Expires: 2015-03-09
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Abstract

Abstract A invention provides a resist processing method for an object to be processed, including the processing step of supplying a process solution onto the object to be processed to perform a process on the object to be processed, and the cleaning step of supplying a cleaning solution onto the object to be processed to clean the object to be processed, wherein the processing step at least partially overlaps the cleaning step. The present invention also provides a resist processing method for an object to be processed, including the steps of positioning a process solution supply means for supplying a process solution above a quadrilateral object to be processed having a pair of opposing edges, moving the process solution supply means toward one edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means, and moving the process solution supply means from one edge of the object to be processed toward the other edge of the pair of edges of the object to be processed relative to the object to be processed while supplying the process solution onto the object to be processed by the process solution supply means.

Inventors

  • 👤 Takayuki Tomoeda
  • 👤 Masaaki Murakami
  • 👤 Kenichi Nishioka

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 00:50
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/162; H; H10; H10P; H10P95/00; G03F7/26; G03F7/30; G03F7/3021; Y; Y10; Y10S; Y10S134/00; Y10S134/902

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 84 words
A resist processing method comprising the steps of: supplying a resist processing solution onto an object and performing a process on said object; and supplying a cleaning solution onto said object to clean said object; wherein said processing step at least partially overlaps with the cleaning step, and resist processing solution is not a cleaning solution, and a supply amount of at least one of said resist processing solution and said cleaning solution is changed while said processing step overlaps with said cleaning step.
Claim 2
Dependent Claim 84 words
A resist processing method comprising the steps of: supplying a resist processing solution onto an object and performing a process on said object; and supplying a cleaning solution onto said object to clean said object; wherein said processing step at least partially overlaps with the cleaning step, and resist processing solution is not a cleaning solution, and a supply amount of at least one of said resist processing solution and said cleaning solution is changed while said processing step overlaps with said cleaning step.
Claim 3
Dependent Claim 62 words
A resist processing method, comprising sequential steps of: supplying a resist processing solution onto an object and performing a process on said object; supplying a cleaning solution onto said object while supplying said processing solution onto said object; stopping supplying said resist processing solution; and cleaning said object with said cleaning solution, wherein said resist processing solution is not a cleaning solution.
Claim 4
Dependent Claim 62 words
A resist processing method, comprising sequential steps of: supplying a resist processing solution onto an object and performing a process on said object; supplying a cleaning solution onto said object while supplying said processing solution onto said object; stopping supplying said resist processing solution; and cleaning said object with said cleaning solution, wherein said resist processing solution is not a cleaning solution.
Claim 5
Dependent Claim 41 words
A method according to claim 2, further comprising an initial step of supplying a first cleaning solution onto said object, cleaning said object and stopping supply of said cleaning solution all prior to the step of supplying said resist processing solution.
Claim 6
Dependent Claim 74 words
A method according to claim 2, further comprising a first step of supplying a first cleaning solution onto said object to clean said object prior to the step of supplying said resist processing solution, wherein said step of supplying said resist processing solution overlaps with the initial supplying of said a first cleaning solution, and wherein said initial supplying of a first cleaning solution is stopped while said resist processing solution is being supplied.
Claim 7
Dependent Claim 25 words
A method according to claim 1, wherein a supply amount of said process solution is gradually increased while the processing step overlaps the cleaning step.
Claim 8
Dependent Claim 25 words
A method according to claim 1, wherein a supply amount of said process solution is gradually decreased while the processing step overlaps the cleaning step.
Claim 9
Dependent Claim 25 words
A method according to claim 1, wherein a supply amount of said cleaning solution is gradually decreased while the processing step overlaps the cleaning step.
Claim 10
Dependent Claim 36 words
A method according to claim 1, wherein a supply amount of said process solution is gradually decreased and a supply amount of said cleaning solution is gradually increased while the processing step overlaps the cleaning step.

References Cited (Backward Citations)

US3793054A Cited
US3876450A Cited
US4340622A Cited
US5066616A Cited
JPH06120133A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-05-05 2000-11-04 2001-05-06 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-05-05 2004-11-04 2005-05-06 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-05-05 2008-11-04 2009-05-06 $7700.00 Window Closed / Lapsed

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