← Back to Patent Explorer
US5609925A Expired / Lapsed US ⏱️ 0.0 years remaining

Curing hydrogen silsesquioxane resin with an electron beam

Assignee: National Semiconductor Corp
•
Filing: 1995-12-04
•
Granted: 1997-03-11
•
Expires: 2015-12-04
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A low temperature method of forming silica-containing ceramic coatings on substrates in which a coating containing hydrogen silsesquioxane resin is applied on a substrate and exposed to an electron beam for a time sufficient to convert the hydrogen silsesquioxane resin to the silica-containing ceramic coating. This method is especially valuable for forming protective and dielectric coatings on electronic devices.

Inventors

  • 👤 Robert C. Camilletti
  • 👤 Irfan Saadat
  • 👤 Michael Thomas

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 21:53
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; H10P14/6925; B; B05; B05D; B05D3/00; B05D3/06; B05D3/068; C; C04; C04B; C04B41/00; C04B41/0045; C04B41/45; C04B41/50; C04B41/5025; C04B41/5035; C09; C09D; C09D183/00; C09D183/04; H10P14/65; H10P14/6516; H10P14/6536; H10P14/6539; C04B2111/00; C04B2111/00474; C04B2111/00844; H10P14/63; H10P14/6326; H10P14/6342; H10P14/66; H10P14/668; H10P14/6681; H10P14/6684; H10P14/6686

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 51 words
A method of forming a silica-containing ceramic coating on a substrate comprising: applying a coating comprising hydrogen silsesquioxane resin on a substrate; and exposing the coated substrate to an electron beam for a time and at a dose effective to convert the hydrogen silsesquioxane resin coating to a silica-containing ceramic coating.
Claim 2
Independent Claim 51 words
A method of forming a silica-containing ceramic coating on a substrate comprising: applying a coating comprising hydrogen silsesquioxane resin on a substrate; and exposing the coated substrate to an electron beam for a time and at a dose effective to convert the hydrogen silsesquioxane resin coating to a silica-containing ceramic coating.
Claim 3
Dependent Claim 12 words
The method of claim 1 wherein the substrate is an electronic device.
Claim 4
Dependent Claim 22 words
The method of claim 1 wherein the electron beam dose is in the range of 100 microcoulomb to 100 coulomb/cm 2 .
Claim 5
Dependent Claim 21 words
The method of claim 1 wherein the electron beam dose is in the range of 1 to 10 coulombs/cm 2 .
Claim 6
Dependent Claim 22 words
The method of claim 1 wherein the time for electron beam exposure is in the range of 10 seconds to 1 hour.
Claim 7
Dependent Claim 79 words
The method of claim 1 wherein the hydrogen silsesquioxane resin coating also contains ceramic oxide precursors comprising a compound containing an element selected from the group consisting of titanium, zirconium, aluminum, tantalum, vanadium, niobium, boron and phosphorous wherein the compound contains at least one hydrolyzable substituent selected from the group consisting of alkoxy or acyloxy and the compound is present in an amount such that the silica-containing ceramic coating contains 0.1 to 30 percent by weight ceramic oxide precursor.
Claim 8
Dependent Claim 40 words
The method of claim 1 wherein the hydrogen silsesquioxane resin coating also contains a platinum or rhodium catalyst in an amount of between about 5 and about 1000 ppm platinum or rhodium based on the weight of hydrogen silsesquioxane resin.
Claim 9
Dependent Claim 21 words
The method of claim 1 wherein the coated substrate is selectively exposed to the electron beam to form a patterned coating.
Claim 10
Dependent Claim 40 words
The method of claim 1 wherein the coated substrate exposed to the electron beam is annealed for up to 72 hours at 50°-500° C. in an atmosphere selected from the group consisting of inert gas, oxidizing gas and reducing gas.
Claim 11
Dependent Claim 24 words
The method of claim 1 wherein the coating is heated before or during the electron beam exposure to cause it to melt and flow.

References Cited (Backward Citations)

US4571349A Cited
US4756977A Cited
US4847162A Cited
US5336532A Cited
US5116637A Cited
US5262201A Cited
US5059448A Cited
US5436029A Cited
US5481135A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2000-03-10 2000-09-09 2001-03-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2004-03-10 2004-09-09 2005-03-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2008-03-10 2008-09-09 2009-03-11 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag